Dr. Mark H. Somervell
Director of Technology and SMTS at Tokyo Electron America Inc
SPIE Involvement:
Conference Program Committee | Author | Editor
Publications (42)

Proceedings Article | 1 May 2023 Paper
Cong Que Dinh, Seiji Nagahara, Yuhei Kuwahara, Arnaud Dauendorffer, Soichiro Okada, Seiji Fujimoto, Shinichiro Kawakami, Satoru Shimura, Makoto Muramatsu, Kayoko Cho, Xiang Liu, Kathleen Nafus, Michael Carcasi, Ankur Agarwal, Mark Somervell, Lior Huli, Kanzo Kato, Michael Kocsis, Peter De Schepper, Stephen Meyers, Lauren McQuade, Kazuki Kasahara, Jara Garcia Santaclara, Rik Hoefnagels, Chris Anderson, Patrick Naulleau
Proceedings Volume 12498, 1249806 (2023) https://doi.org/10.1117/12.2655928
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Line edge roughness, Lithography, Etching

Proceedings Article | 22 February 2021 Presentation + Paper
Ryan Burns, Yuanyi Zhang, Colton D'Ambra, Mark Somervell, Sean Berglund, Michael Carcasi, Lior Huli, Muramatsu Makoto, Rachel Segalman, Craig Hawker, Christopher Bates
Proceedings Volume 11612, 1161205 (2021) https://doi.org/10.1117/12.2583086

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479
KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

Proceedings Article | 22 March 2016 Paper
Hari Pathangi, Varun Vaid, Boon Teik Chan, Nadia Vandenbroeck, Jin Li, Sung Eun Hong, Yi Cao, Baskaran Durairaj, Guanyang Lin, Mark Somervell, Takahiro Kitano, Ryota Harukawa, Kaushik Sah, Andrew Cross, Hareen Bayana, Lucia D’Urzo, Roel Gronheid
Proceedings Volume 9777, 97770G (2016) https://doi.org/10.1117/12.2219936
KEYWORDS: Directed self assembly, Metrology, Optical lithography, Silicon, Semiconducting wafers, Etching, Bridges, Polymers, Manufacturing, Scanning electron microscopy, Epitaxy, Lithography, Thin film coatings

Proceedings Article | 22 March 2016 Paper
Makoto Muramatsu, Takanori Nishi, Gen You, Yusuke Saito, Yasuyuki Ido, Kiyohito Ito, Toshikatsu Tobana, Masanori Hosoya, Weichien Chen, Satoru Nakamura, Mark Somervell, Takahiro Kitano
Proceedings Volume 9777, 97770F (2016) https://doi.org/10.1117/12.2218595
KEYWORDS: Directed self assembly, Line edge roughness, High volume manufacturing, Bridges, Critical dimension metrology, Semiconductor manufacturing, Particles, Etching, Lithography, Oxides, Semiconducting wafers, Line width roughness, System on a chip, Optical lithography, Picosecond phenomena

Showing 5 of 42 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 18 April 2013

SPIE Conference Volume | 27 April 2012

SPIE Conference Volume | 18 April 2011

SPIE Conference Volume | 3 March 2010

Conference Committee Involvement (20)
Advances in Patterning Materials and Processes XLII
23 February 2025 | San Jose, California, United States
Advances in Patterning Materials and Processes XLI
26 February 2024 | San Jose, California, United States
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Showing 5 of 20 Conference Committees
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