Dr. Mark Neisser
Technology Director at Tsinghua Univ
SPIE Involvement:
Author
Publications (68)

SPIE Journal Paper | 4 October 2021 Open Access
JM3, Vol. 20, Issue 04, 044601, (October 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.044601
KEYWORDS: Lithography, Extreme ultraviolet, Logic, Stochastic processes, Optical lithography, Image processing, Extreme ultraviolet lithography, Photoresist processing, Nanoimprint lithography, Double patterning technology

Proceedings Article | 23 March 2020 Presentation + Paper
Proceedings Volume 11323, 113231N (2020) https://doi.org/10.1117/12.2551311
KEYWORDS: Extreme ultraviolet, Stochastic processes, Extreme ultraviolet lithography, Logic, Lithography, Line edge roughness, Nanoimprint lithography, Absorbance, Line width roughness

Proceedings Article | 25 March 2016 Paper
Amrit Narasimhan, Steven Grzeskowiak, Jonathan Ostrander, Jonathon Schad, Eliran Rebeyev, Mark Neisser, Leonidas Ocola, Gregory Denbeaux, Robert Brainard
Proceedings Volume 9779, 97790F (2016) https://doi.org/10.1117/12.2219850
KEYWORDS: Electrons, Luminescence, Extreme ultraviolet lithography, Extreme ultraviolet, Molecules, Photons, Lithography, Photoresist materials, Ionization, Molecular interactions, Polymers, Photodiodes, Polymethylmethacrylate, Phase modulation, Quantum efficiency

Proceedings Article | 21 March 2016 Paper
Steven Grzeskowiak, Amrit Narasimhan, Liam Wisehart, Jonathon Schad, Mark Neisser, Leonidas Ocola, Robert Brainard, Greg Denbeaux
Proceedings Volume 9779, 97790C (2016) https://doi.org/10.1117/12.2219851
KEYWORDS: Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist materials, Photochemistry, Ionization, Chemically amplified resists, Mass spectrometry, Electron beams, Absorption, Polymers, Molecular interactions

Proceedings Article | 18 March 2016 Paper
Liam Wiseheart, Amrit Narasimhan, Steven Grzeskowiak, Mark Neisser, Leonidas Ocola, Greg Denbeaux, Robert Brainard
Proceedings Volume 9776, 97762O (2016) https://doi.org/10.1117/12.2219849
KEYWORDS: Electrons, Extreme ultraviolet lithography, Extreme ultraviolet, Monte Carlo methods, Solid modeling, Photons, Ionization, Copper, Silicon, Particles

Showing 5 of 68 publications
Conference Committee Involvement (2)
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
SPIE Lithography Asia - Taiwan
18 November 2009 | Taipei, Taiwan
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top