Dr. Tonmoy Chakraborty Profile

Dr. Tonmoy Chakraborty

Postdoc at Univ of Texas Southwestern Medical Ctr at Dallas

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Publications (5)

Proceedings Article | 1 May 2017 Presentation + Paper

Source diversity for contrast transfer function imaging

Tonmoy Chakraborty, Jonathan Petruccelli

Proceedings Volume 10222, 102220R (2017) https://doi.org/10.1117/12.2262692

KEYWORDS: Glasses, Refractive index, Liquid crystal on silicon, Spatial light modulators, Signal to noise ratio, Phase measurement, Distance measurement

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Proceedings Article | 20 May 2016 Paper

Transport of intensity phase imaging using Bessel sources

Jonathan Petruccelli, Tonmoy Chakraborty

Proceedings Volume 9870, 98700C (2016) https://doi.org/10.1117/12.2222157

KEYWORDS: Phase imaging, Spatial frequencies, Phase measurement, Phase retrieval, Convolution, Bessel functions, Sensors, Spatial light modulators, Fourier transforms, Cameras

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Proceedings Article | 16 March 2015 Paper

First results of outgas resist family test and correlation between outgas specifications and EUV resist development

Yu-Jen Fan, Ken Maruyama, Ramakrishnan Ayothi, Takehiko Naruoka, Tonmoy Chakraborty, Dominic Ashworth, Jun Sung Chun, Cecilia Montgomery, Shih-Hui Jen, Mark Neisser, Kevin Cummings

Proceedings Volume 9422, 942211 (2015) https://doi.org/10.1117/12.2087424

KEYWORDS: Extreme ultraviolet, Contamination, Extreme ultraviolet lithography, Chemically amplified resists, Line edge roughness, Semiconducting wafers, Line width roughness, Reflectivity, Hydrogen, Critical dimension metrology

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Proceedings Article | 17 April 2014 Paper

Resist outgassing contamination on EUV multilayer mirror analogues

Diego Alvarado, Yudhishthir Kandel, Jaewoong Sohn, Tonmoy Chakraborty, Dominic Ashworth, Gregory Denbeaux

Proceedings Volume 9048, 90481A (2014) https://doi.org/10.1117/12.2046613

KEYWORDS: Contamination, Hydrogen, Extreme ultraviolet lithography, Photoresist materials, Ruthenium, Semiconducting wafers, Extreme ultraviolet, Sulfur, Mirrors, Photoresist processing

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Proceedings Article | 17 April 2012 Paper

Advanced metrology techniques for the characterization of EUV mask blank defects

Jenah Harris-Jones, Vibhu Jindal, C. C. Lin, Tonmoy Chakraborty, Emilio Stinzianni, Ranganath Teki, Hyuk Joo Kwon

Proceedings Volume 8352, 83520Y (2012) https://doi.org/10.1117/12.922909

KEYWORDS: Extreme ultraviolet, Photomasks, Transmission electron microscopy, Metrology, Scanning electron microscopy, Deposition processes, Spectroscopy, Atomic force microscopy, Extreme ultraviolet lithography, Ions

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