Dr. Chunwei Chen Profile

Dr. Chunwei Chen

at EMD Electronics

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 10 April 2024 Presentation

Sustainable solutions to PFAS photoacid generators used in chemically amplified resists

Daniela Carja, Hung-Yang Chen, Takayuki Sao, Hiroshi Hitokawa, Philipp-Hans Fackler, Chunwei Chen, Ralph Dammel

Proceedings Volume 12957, 1295703 (2024) https://doi.org/10.1117/12.3010645

KEYWORDS: Photoacid generators, Sustainability, Chemically amplified resists, Photoresist materials, Transparency, Photoresist developing, Lithography, Toxicity, Thermal stability, Structural design

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Proceedings Article | 9 April 2024 Poster + Paper

PFAS-free I-line strong photoacid generator for positive-tone and negative-tone thick-film photoresists

Hung-Yang Chen, Ionela-Daniela Carja, Chunwei Chen, Ashley Moore, Philipp Hans Fackler, Ralph Dammel

Proceedings Volume 12957, 129571H (2024) https://doi.org/10.1117/12.3009506

KEYWORDS: Photoresist materials, Photoacid generators, Copper, Silicon, Film thickness, Lithography, Semiconductors, Semiconducting wafers, Fabrication, Photoresist developing

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Proceedings Article | 9 April 2024 Poster + Paper

Negative tone i-line photoresist with controlled undercut profile designed for metal deposition to form metal interconnects

Anupama Mukherjee, Medhat Toukhy, Ping-Hung Lu, Chunwei Chen, Tomotsugu Yano

Proceedings Volume 12957, 129571N (2024) https://doi.org/10.1117/12.3009919

KEYWORDS: Metals, Photoresist materials, Sputter deposition, Ions, Quenching, Photoresist processing, Photoacid generators, Industry, Polymers, Semiconducting wafers

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Proceedings Article | 1 May 2023 Poster + Paper

Positive tone i-line photoresist with controlled undercut profile for advanced packaging

Walter Weihong Liu, Chunwei Chen, Ping-Hung Lu, SookMee Lai, Yoshiharu Sakurai

Proceedings Volume 12498, 124981K (2023) https://doi.org/10.1117/12.2657694

KEYWORDS: Photoresist materials, Copper, Semiconducting wafers, Film thickness, Advanced packaging, Metals, Plating, Baking, Silicon, Photoresist processing

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Proceedings Article | 1 May 2023 Poster + Paper

Profile control in conductor metal wet etch with advanced photoresists

Ashley Moore, Julia Modl, Zhong Li, Hung-Yang Chen, Chunwei Chen, Andreas Behrendt, Katharina Schmoelzer

Proceedings Volume 12498, 124981J (2023) https://doi.org/10.1117/12.2657687

KEYWORDS: Photoresist materials, Etching, Adhesion, Wet etching, Copper, Metals, Semiconducting wafers, Coating, Lithography, Photoresist developing

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Proceedings Article | 16 April 2011 Paper

A study on post-exposure delay of negative tone resist and its chemistry

Medhat Toukhy, Margareta Paunescu, Chunwei Chen

Proceedings Volume 7972, 79721L (2011) https://doi.org/10.1117/12.882072

KEYWORDS: Critical dimension metrology, Contamination, Photoresist processing, Semiconducting wafers, Chemistry, Polymers, Inspection, Diffusion, Lithography, Deep ultraviolet

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Proceedings Article | 26 March 2008 Paper

Development of thick negative photoresists for electroplating applications

Chunwei Chen, Robert Plass, Edward Ng, Sam Lee, Stephen Meyer, Georg Pawlowski, Rozalia Beica

Proceedings Volume 6923, 69233E (2008) https://doi.org/10.1117/12.773986

KEYWORDS: Photoresist materials, Electroplating, Copper, Lithography, Semiconducting wafers, Photoresist developing, Solids, Plating, Gold, Thin film coatings

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Proceedings Article | 26 March 2008 Paper

Performance comparison of negative resists for copper rerouting and other electroplating applications

Medhat Toukhy, Chunwei Chen, Margareta Paunescu, Georg Pawlowski

Proceedings Volume 6923, 69233I (2008) https://doi.org/10.1117/12.773965

KEYWORDS: Copper, Semiconducting wafers, Photoresist processing, Electroplating, Plating, Thin film coatings, Oxygen, Lithography, Silicon, Chemistry

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Proceedings Article | 2 April 2007 Paper

PAG distribution and acid thermal diffusion study in ultra-thick chemically amplified resist films

Medhat Toukhy, Margareta Paunescu, Chunwei Chen, Georg Pawlowski

Proceedings Volume 6519, 65192M (2007) https://doi.org/10.1117/12.711621

KEYWORDS: Copper, Diffusion, Semiconducting wafers, Silicon, Coating, Polymers, Chemically amplified resists, Polymer thin films, Molecules, Fluorine

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Proceedings Article | 23 March 2007 Paper

Development of nanocomposite resists with high plasma etch resistance

Chunwei Chen, Hong Zhuang, Ping-Hung Lu, Mark Neisser, Georg Pawlowski

Proceedings Volume 6519, 65192E (2007) https://doi.org/10.1117/12.711601

KEYWORDS: Silica, Etching, Nanocomposites, Photoresist materials, Plasma etching, Nanoparticles, Plasma, Resistance, Deep reactive ion etching, Particles

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Proceedings Article | 29 March 2006 Paper

Chemically amplified thick film i-line positive resist for electroplating and redistribution applications

Medhat Toukhy, Salem Mullen, Margareta Paunescu, Chunwei Chen, Stephen Meyer, Georg Pawlowski, Yoshio Murakami, Clifford Hamel

Proceedings Volume 6153, 61534H (2006) https://doi.org/10.1117/12.656595

KEYWORDS: Copper, Semiconducting wafers, Silicon, Plating, Electroplating, Photoresist processing, Chemistry, Polymers, Temperature metrology, Optical coatings

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Showing 5 of 11 publications

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