Sustainable solutions to PFAS photoacid generators used in chemically amplified resists

Daniela Carja; Hung-Yang Chen; Takayuki Sao; Hiroshi Hitokawa; Philipp-Hans Fackler; Chunwei Chen; Ralph Dammel

doi:10.1117/12.3010645

10 April 2024 Sustainable solutions to PFAS photoacid generators used in chemically amplified resists

Daniela Carja, Hung-Yang Chen, Takayuki Sao, Hiroshi Hitokawa, Philipp-Hans Fackler, Chunwei Chen, Ralph Dammel

Proceedings Volume 12957, Advances in Patterning Materials and Processes XLI; 1295703 (2024) https://doi.org/10.1117/12.3010645
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

The study investigates a new platform of PFAS-free PAGs and evaluates their lithographic efficiency in comparison to PFAS-containing counterparts in multiple model photoresists, including both negative and positive tones, across a broad range of optical exposure wavelengths. PFAS-free photoresists materials demonstrate comparable / superior lithographic performance in resolution, depth-of-focus (DOF), and exposure latitude (EL) compared with their non-degradable counterparts.

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Citation Download Citation

Daniela Carja, Hung-Yang Chen, Takayuki Sao, Hiroshi Hitokawa, Philipp-Hans Fackler, Chunwei Chen, and Ralph Dammel "Sustainable solutions to PFAS photoacid generators used in chemically amplified resists", Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 1295703 (10 April 2024); https://doi.org/10.1117/12.3010645

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