Mr. Plamen Tzviatkov Profile

Plamen Tzviatkov

Manager/Business Development at Fujifilm Electronic Materials USA Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 12 June 2003 Paper

Photoresist reflow for 193-nm low-K1 lithography contacts

Patrick Montgomery, Kevin Lucas, Kirk Strozewski, Lena Zavyalova, Grozdan Grozev, Mario Reybrouck, Plamen Tzviatkov, Mireille Maenhoudt

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485186

KEYWORDS: Lithography, Semiconducting wafers, Etching, Optical lithography, Photoresist processing, Photomasks, Cadmium, Binary data, Polymers, 193nm lithography

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Proceedings Article | 24 July 2002 Paper

100-nm generation contact patterning by low temperature 193-nm resist reflow process

Veerle Van Driessche, Kevin Lucas, Frieda Van Roey, Grozdan Grozev, Plamen Tzviatkov

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474204

KEYWORDS: Etching, Photomasks, Semiconducting wafers, Binary data, Photoresist processing, Reticles, Oxides, Electroluminescence, Lithography, Temperature metrology

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Proceedings Article | 26 April 2001 Paper

Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning

Veerle Van Driessche, Kevin Lucas, Frieda Van Roey, Grozdan Grozev, Plamen Tzviatkov

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425231

KEYWORDS: Etching, Oxides, Reticles, Photoresist processing, Photomasks, Semiconducting wafers, Phase shifts, Electroluminescence, Imaging systems, Binary data

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