Dr. Omkaram Nalamasu
CTO at Applied Materials Inc
SPIE Involvement:
Author
Publications (38)

Proceedings Article | 30 March 2021 Presentation
Proceedings Volume 11764, 117640B (2021) https://doi.org/10.1117/12.2597456

Proceedings Article | 24 August 2001 Paper
Francis Houlihan, Donna Person, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov, Elsa Reichmanis
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436912
KEYWORDS: Lithography, Hassium, Chemically amplified resists, Polymers, Chromophores, Information operations, Picosecond phenomena, Standards development, Calcium, Nomenclature

Proceedings Article | 24 August 2001 Paper
Francis Houlihan, Zhenglin Yan, Elsa Reichmanis, Gary Dabbagh, Kevin Bolan, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436904
KEYWORDS: Lithography, Polymers, Molecules, Solids, Semiconducting wafers, Image resolution, Silicon films, Prototyping, Chemically amplified resists, Analog electronics

Proceedings Article | 5 July 2000 Paper
Stanley Pau, Raymond Cirelli, Kevin Bolan, Allen Timko, John Frackoviak, Pat Watson, Lee Trimble, James Blatchford, Omkaram Nalamasu
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389015
KEYWORDS: Photomasks, Photoresist materials, Phase shifts, Lithography, Binary data, Manufacturing, Critical dimension metrology, Printing, Microelectronics, Integrated circuits

Proceedings Article | 23 June 2000 Paper
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388300
KEYWORDS: Diffusion, Data modeling, FT-IR spectroscopy, Chemically amplified resists, Semiconducting wafers, Absorbance, Photolysis, Polymers, Lithography, Interfaces

Proceedings Article | 23 June 2000 Paper
Gary Dabbagh, Francis Houlihan, Ilya Rushkin, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Zhenglin Yan, Arnost Reiser
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388265
KEYWORDS: Distributed interactive simulations, Clouds, Polymers, Hydrogen, FT-IR spectroscopy, Spectroscopy, Medium wave, Photoresist materials, Bismuth, Silver

Proceedings Article | 23 June 2000 Paper
Zhenglin Yan, Francis Houlihan, Elsa Reichmanis, Omkaram Nalamasu, Arnost Reiser, Gary Dabbagh, Richard Hutton, Dan Osei, Jose Sousa, Kevin Bolan
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388275
KEYWORDS: Ions, Polymers, Clouds, Polymer thin films, Switches, Medium wave, Molecules, Imaging systems, Spectroscopy, Hydrogen

Proceedings Article | 23 June 2000 Paper
Ilya Rushkin, Francis Houlihan, Janet Kometani, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Ognian Dimov, Arturo Medina, Ulrike Varlemann, Allen Gabor, T. Sarrubi, Murrae Bowden
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388305
KEYWORDS: Polymers, Polymerization, Lithography, Molecules, Standards development, Photoresist processing, Dry etching, Resistance, Printing, Modulation

Proceedings Article | 26 July 1999 Paper
Pat Watson, Armen Kroyan, Raymond Cirelli, H. Maynard, James Sweeney, Fred Klemens, G. Timp, Omkaram Nalamasu
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354345
KEYWORDS: Etching, Lithography, Scanning electron microscopy, Oxides, Lithographic illumination, Critical dimension metrology, SRAF, Photoresist processing, Printing, Semiconducting wafers

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354377
KEYWORDS: SRAF, Lithography, Lithographic illumination, Computer simulations, Optical proximity correction, Tolerancing, Scanning electron microscopy, Critical dimension metrology, Environmental sensing, Photomasks

Proceedings Article | 11 June 1999 Paper
Raymond Cirelli, J. Bude, William Mansfield, G. Timp, Fred Klemens, Pat Watson, Gary Weber, James Sweeney, Francis Houlihan, Allen Gabor, Fred Baumann, M. Buonanno, G. Forsyth, D. Barr, T. Lee, C. Rafferty, Richard Hutton, Allen Timko, J. Hergenrother, Elsa Reichmanis, Lloyd Harriott, S. Hillenius, Omkaram Nalamasu
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350213
KEYWORDS: Etching, Photomasks, Lithography, Diffusion, Semiconducting wafers, Phase shifts, 193nm lithography, Photoresist materials, Silicon, Chemically amplified resists

Proceedings Article | 11 June 1999 Paper
Gary Dabbagh, Francis Houlihan, Ilya Rushkin, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Allen Gabor, Arturo Medina
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350155
KEYWORDS: Polymers, Hydrogen, FT-IR spectroscopy, Absorption, Molecules, Molecular interactions, Spectroscopy, Polymer thin films, Fourier spectroscopy, Lithography

Proceedings Article | 11 June 1999 Paper
Francis Houlihan, Ilya Rushkin, Richard Hutton, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis, Allen Gabor, Arturo Medina, Sanjay Malik, M. Neiser, Roderick Kunz, Deanna Downs
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350209
KEYWORDS: Lithography, Chromophores, Photolysis, NOx, Polymers, Diffusion, Quartz, Electron beam lithography, Deep ultraviolet, Ultraviolet radiation

Proceedings Article | 11 June 1999 Paper
Ilya Rushkin, Francis Houlihan, Janet Kometani, Richard Hutton, Allen Timko, Elsa Reichmanis, Omkaram Nalamasu, Allen Gabor, Arturo Medina, Sydney Slater, Mark Neisser
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350241
KEYWORDS: Polymers, Lithography, Etching, Polymerization, Plasma etching, Silicon, Resistance, Ultraviolet radiation, Plasma, Argon

Proceedings Article | 11 June 1999 Paper
Allen Gabor, Ognian Dimov, Arturo Medina, Mark Neisser, Sydney Slater, Ruey Wang, Francis Houlihan, Raymond Cirelli, Gary Dabbagh, Richard Hutton, Ilya Rushkin, James Sweeney, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350205
KEYWORDS: Polymers, Lithography, Binary data, Distributed interactive simulations, Etching, Resistance, Photomasks, Diffusion, Silicon, Semiconducting wafers

Proceedings Article | 18 December 1998 Paper
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332873
KEYWORDS: SRAF, Lithography, Photoresist processing, Optical proximity correction, Critical dimension metrology, Scanning electron microscopy, Image processing, Lithographic illumination, Tolerancing, Reticles

Proceedings Article | 29 June 1998 Paper
Raymond Cirelli, Masis Mkrtchyan, Pat Watson, Lee Trimble, Gary Weber, David Windt, Omkaram Nalamasu
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310739
KEYWORDS: Lithographic illumination, Carbon, Photomasks, Fiber optic illuminators, Lithography, Quartz, Diffraction, Transmittance, Tolerancing, Software development

Proceedings Article | 29 June 1998 Paper
Janet Kometani, Francis Houlihan, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis, Sharon Heffner, Mary Galvin-Donoghue
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312466
KEYWORDS: Polymers, Lithography, Solids, Resistance, Ion exchange, Lithium, Deep ultraviolet, Liquids, Scanning electron microscopy, Matrices

Proceedings Article | 29 June 1998 Paper
Francis Houlihan, Janet Kometani, Allen Timko, Richard Hutton, Raymond Cirelli, Elsa Reichmanis, Omkaram Nalamasu, Allen Gabor, Arturo Medina, John Biafore, Sydney Slater
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312462
KEYWORDS: Diffusion, Lithography, Scanning electron microscopy, Polymers, Photoresist materials, Solids, Crystals, Semiconducting wafers, Chemically amplified resists, Sodium

Proceedings Article | 29 June 1998 Paper
Gary Dabbagh, Richard Hutton, Raymond Cirelli, Elsa Reichmanis, Anthony Novembre, Omkaram Nalamasu
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312398
KEYWORDS: Oxygen, Plasma, Etching, Polymers, Plasma etching, Image processing, Diffusion, Lithography, Infrared spectroscopy, Refractive index

Proceedings Article | 29 June 1998 Paper
Pat Watson, Raymond Cirelli, Allen Timko, Omkaram Nalamasu, Carl Lockstamphor, Steven Berger, Neil Bassom, Ganesh Sundaram
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310743
KEYWORDS: Lithographic illumination, Photomasks, Optical proximity correction, Scanning electron microscopy, SRAF, Lithography, Mask making, Manufacturing, Photoresist processing, Optical calibration

Proceedings Article | 7 July 1997 Paper
Francis Houlihan, Omkaram Nalamasu, Elsa Reichmanis, Allen Timko, Ulrike Varlemann, Thomas Wallow, N. Bantu, John Biafore, Thomas Sarubbi, Pasquale Falcigno, H. Kirner, Norbert Muenzel, Klaus Petschel, Hans-Thomas Schacht, Reinhard Schulz
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275848
KEYWORDS: Lithography, Quantum efficiency, Absorbance, Polymers, Microelectronics, Chemically amplified resists, Semiconducting wafers, Chromophores, Silver, Chemistry

Proceedings Article | 7 July 1997 Paper
Francis Houlihan, Thomas Wallow, Allen Timko, E. Neria, Richard Hutton, Raymond Cirelli, Omkaram Nalamasu, Elsa Reichmanis
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275856
KEYWORDS: Polymers, Resistance, Photoresist materials, Lithography, Standards development, Analog electronics, Deep ultraviolet, Spectroscopy, Solids, Scanning electron microscopy

Proceedings Article | 7 July 1997 Paper
N. Bantu, Brian Maxwell, Arturo Medina, Thomas Sarubbi, Medhat Toukhy, Hans-Thomas Schacht, Pasquale Falcigno, Norbert Muenzel, Klaus Petschel, Francis Houlihan, Omkaram Nalamasu, Allen Timko
Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275833
KEYWORDS: Polymers, Photoresist materials, Deep ultraviolet, Lithography, Photoresist processing, Chemistry, Photoresist developing, Scanning electron microscopy, Glasses, Resolution enhancement technologies

Proceedings Article | 14 June 1996 Paper
Thomas Wallow, Francis Houlihan, Omkaram Nalamasu, Edwin Chandross, Thomas Neenan, Elsa Reichmanis
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241834
KEYWORDS: Lithography, Photoresist materials, Distributed interactive simulations, Optical lithography, Resistance, Etching, Polymers, Silicon, Carbon, Deep ultraviolet

Proceedings Article | 9 June 1995 Paper
Carlo Mertesdorf, Norbert Muenzel, Heinz Holzwarth, Pasquale Falcigno, Hans-Thomas Schacht, Ottmar Rohde, Reinhard Schulz, Sydney Slater, David Frey, Omkaram Nalamasu, Allen Timko, Thomas Neenan
Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210382
KEYWORDS: Polymers, Carbon, Deep ultraviolet, Lithography, Structural design, Glasses, Oxygen, Analog electronics, Diffusion, Staring arrays

Proceedings Article | 19 May 1995 Paper
Anthony Novembre, Regine Tarascon-Auriol, Omkaram Nalamasu, Linus Fetter, Kevin Bolan, Chester Knurek, Norbert Muenzel, Heinz Holzwarth
Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209189
KEYWORDS: X-rays, Lithography, X-ray lithography, Deep ultraviolet, Electron beam lithography, Photoresist processing, Semiconducting wafers, Photomasks, Scanning electron microscopy, X-ray optics

Proceedings Article | 16 May 1994 Paper
Ulrich Schaedeli, Norbert Muenzel, Heinz Holzwarth, Sydney Slater, Omkaram Nalamasu
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175403
KEYWORDS: Polymers, Lithography, Deep ultraviolet, Photoresist processing, Standards development, Etching, Chemistry, Semiconducting wafers, Absorption, Scanning electron microscopy

Proceedings Article | 16 May 1994 Paper
Francis Houlihan, Evelyn Chin, Omkaram Nalamasu, Janet Kometani, Thomas Neenan, A. Pangborne
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175331
KEYWORDS: Chromophores, Lithography, Quantum efficiency, Absorbance, Oxygen, Ultraviolet radiation, Resistance, Tolerancing, Temperature metrology, Polymers

Proceedings Article | 16 May 1994 Paper
Norbert Muenzel, Heinz Holzwarth, Pasquale Falcigno, Hans-Thomas Schacht, Reinhard Schulz, Omkaram Nalamasu, Allen Timko, Elsa Reichmanis, Janet Kometani, Douglas Stone, Thomas Neenan, Edwin Chandross, Sydney Slater, M. Frey, Andrew Blakeney
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175381
KEYWORDS: Deep ultraviolet, Lithography, Photoresist processing, Polymers, Staring arrays, Critical dimension metrology, Photoresist materials, Photomasks, Picosecond phenomena, Information operations

Proceedings Article | 16 May 1994 Paper
Marcia Schilling, Howard Katz, Francis Houlihan, Janet Kometani, Susan Stein, Omkaram Nalamasu
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175335
KEYWORDS: Polymers, Metals, Zirconium, Lithography, Nickel, Ions, Spectroscopy, Silicon, Semiconducting wafers, Etching

Proceedings Article | 16 May 1994 Paper
Regine Tarascon-Auriol, Anthony Novembre, Woon Tai, Linus Fetter, Janet Kometani, Omkaram Nalamasu
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175343
KEYWORDS: Absorption, Deep ultraviolet, Lithography, Chemically amplified resists, Temperature metrology, Spectroscopy, Edge roughness, Manufacturing, Semiconducting wafers, Direct write lithography

Proceedings Article | 15 September 1993 Paper
Omkaram Nalamasu, Allen Timko, May Cheng, Janet Kometani, Mary Galvin-Donoghue, Sharon Heffner, Sydney Slater, Andrew Blakeney, Norbert Muenzel, Reinhard Schulz, Heinz Holzwarth, Carlo Mertesdorf, Hans-Thomas Schacht
Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154748
KEYWORDS: Polymers, Lithography, Deep ultraviolet, Photoresist processing, Chemically amplified resists, Spectroscopy, Infrared spectroscopy, Semiconducting wafers, Microelectronics, Solid state physics

Proceedings Article | 15 September 1993 Paper
Takeshi Ohfuji, Allen Timko, Omkaram Nalamasu, Douglas Stone
Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154755
KEYWORDS: Systems modeling, FT-IR spectroscopy, Chemical analysis, Chemically amplified resists, Rubidium, Lithography, Diffusion, Deep ultraviolet, Photoresist processing, Solids

Proceedings Article | 1 June 1992 Paper
Ivan Daraktchiev, Dirk Goossens, P. Matthijs, Mark Thirsk, Andrew Blakeney, Omkaram Nalamasu, May Cheng
Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59748
KEYWORDS: Etching, Plasma, Dry etching, Deep ultraviolet, Plasma etching, Photoresist processing, Semiconducting wafers, Lithography, Scanning electron microscopy, Optical lithography

Proceedings Article | 1 June 1991 Paper
Omkaram Nalamasu, Elsa Reichmanis, May Cheng, Victor Pol, Janet Kometani, Francis Houlihan, Thomas Neenan, M. Bohrer, David Mixon, Larry Thompson, Clifford Takemoto
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46355
KEYWORDS: Deep ultraviolet, Lithography, Chemically amplified resists, Photoresist processing, Polymers, Image enhancement, Head-mounted displays, Prototyping, Environmental sensing, Scanning electron microscopy

Proceedings Article | 1 June 1991 Paper
Anthony Novembre, Woon Tai, Janet Kometani, James Hanson, Omkaram Nalamasu, Gary Taylor, Elsa Reichmanis, Larry Thompson
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46361
KEYWORDS: X-rays, X-ray lithography, Sulfur, Polymers, Lithography, Scanning electron microscopy, Chemically amplified resists, Silicon, Absorbance, X-ray fluorescence spectroscopy

Proceedings Article | 1 June 1990 Paper
Omkaram Nalamasu, May Cheng, Janet Kometani, Sheila Vaidya, Elsa Reichmanis, Larry Thompson
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20136
KEYWORDS: Lithography, Deep ultraviolet, Etching, Polymers, Absorbance, Photoresist processing, Scanning electron microscopy, Semiconducting wafers, Prototyping, Sulfur

Showing 5 of 38 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 16 May 1994

Conference Committee Involvement (2)
Nanofabrication: Technologies, Devices, and Applications II
23 October 2005 | Boston, MA, United States
Advances in Resist Technology and Processing XI
28 February 1994 | San Jose, CA, United States
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