Structural design of ketal and acetal blocking groups in two-component chemically amplified positive DUV resists

Carlo Mertesdorf; Norbert Muenzel; Heinz E. Holzwarth; Pasquale A. Falcigno; Hans-Thomas Schacht; Ottmar Rohde; Reinhard Schulz; Sydney G. Slater; David Frey; Omkaram Nalamasu; Allen G. Timko; Thomas X. Neenan

doi:10.1117/12.210382

9 June 1995 Structural design of ketal and acetal blocking groups in two-component chemically amplified positive DUV resists

Carlo Mertesdorf, Norbert Muenzel, Heinz E. Holzwarth, Pasquale A. Falcigno, Hans-Thomas Schacht, Ottmar Rohde, Reinhard Schulz, Sydney G. Slater, David Frey, Omkaram Nalamasu, Allen G. Timko, Thomas X. Neenan

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Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210382
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

In the present study, protecting groups of moderate stability, such as acetals and ketals, were investigated as pendant blocking groups in polyvinyl phenols. Polymers were obtained by reacting enol ethers with the phenolic side groups to form acetal or ketal blocked phenols. Decomposition temperatures, glass transition temperatures, and molecular weights of the resulting polymers were monitored and correlated with the protecting group structure. Stability of the protecting groups can be explained by protonation occurring at either of the two oxygen sites, making two cleavage routes possible. Secondary reactions of the released protecting groups in the resist film were investigated and discussed. The structure of the protecting group was designed in order to meet basic resist properties such as resolution/linearity, DOF, post exposure delay latitude and thermal stability. A Canon FPA 4500 (NA equals 0.37) and a GCA XLS exposure tool (NA equals 0.53) were used for the optimization process. A preoptimized resist formulation based on the above criteria exhibits 0.23 micrometers line/space resolution, 0.8 micrometers focus latitude at 0.25 micrometers resolution and approximately two hours post exposure delay latitude.

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Carlo Mertesdorf, Norbert Muenzel, Heinz E. Holzwarth, Pasquale A. Falcigno, Hans-Thomas Schacht, Ottmar Rohde, Reinhard Schulz, Sydney G. Slater, David Frey, Omkaram Nalamasu, Allen G. Timko, and Thomas X. Neenan "Structural design of ketal and acetal blocking groups in two-component chemically amplified positive DUV resists", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210382

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