Dr. Anthony E. Novembre
Associate Director at Princeton Univ
SPIE Involvement:
Author
Publications (39)

Proceedings Article | 28 December 2023 Paper
A. Novembre, L. Kowalski, J. Frackoviak, D. Mixon, L. Thompson
Proceedings Volume 12811, 1281108 (2023) https://doi.org/10.1117/12.3011932
KEYWORDS: Photomasks, Etching, Line edge roughness, Film thickness, Process control, Plasma, Fabrication, Dry etching, Chromium, Vacuum chambers

Proceedings Article | 24 July 2002 Paper
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474245
KEYWORDS: Polymers, FT-IR spectroscopy, Absorbance, Photoresist materials, Lithography, Polymethylmethacrylate, Polymer thin films, Distributed interactive simulations, Absorption, Silicon

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410699
KEYWORDS: Photomasks, Inspection, Charged-particle lithography, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Chromium

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410751
KEYWORDS: Photomasks, Etching, Charged-particle lithography, Silicon, Semiconducting wafers, Refraction, Silicon films, Scattering, Low pressure chemical vapor deposition, Chromium

Proceedings Article | 21 July 2000 Paper
Leonidas Ocola, Myrtle Blakey, Paul Orphanos, Wai-Yi Li, Anthony Novembre, Robert Brainard, Joseph Mackevich, Gary Taylor
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390055
KEYWORDS: Charged-particle lithography, Deep ultraviolet, Monte Carlo methods, Absorption, Electrons, Polymers, Chemically amplified resists, Lithography, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 21 July 2000 Paper
Ian Johnston, Huma Ashraf, Jy Bhardwaj, Janet Hopkins, Alan Hynes, Glenn Nicholls, Serrita McAuley, Stephen Hall, Lilian Atabo, Gregory Bogart, Avi Kornblit, Anthony Novembre
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390054
KEYWORDS: Etching, Semiconducting wafers, Photomasks, Silicon, Charged-particle lithography, Helium, Plasma etching, Wet etching, Plasma, Photoresist materials

Proceedings Article | 30 December 1999 Paper
Darren Taylor, William Howard, Richard Kasica, Reginald Farrow, Anthony Novembre, Carlos Caminos, Chester Knurek
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373300
KEYWORDS: Charged-particle lithography, Photomasks, Inspection, Lithography, Semiconducting wafers, Calibration, Silicon, Electron beams, Prototyping, Reticles

Proceedings Article | 30 December 1999 Paper
John Festa, Anthony Novembre, Darryl Bennett, Richard Kasica, Brad Bailey, Myrtle Blakey
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373296
KEYWORDS: Photomasks, Particles, Charged-particle lithography, Semiconducting wafers, Plasma, Silicon, Lithography, Pellicles, Chromium, Mask cleaning

Proceedings Article | 30 August 1999 Paper
Thomas Saunders, Myrtle Blakey, Carlos Caminos, Gregory Bogart, Reginald Farrow, Chester Knurek, Avi Kornblit, James Liddle, Anthony Novembre, Milton Peabody
Proceedings Volume 3874, (1999) https://doi.org/10.1117/12.361228
KEYWORDS: Photomasks, Etching, Silicon, Charged-particle lithography, Semiconducting wafers, Electron beam lithography, Lithography, Scattering, Crystals, Dry etching

Proceedings Article | 25 June 1999 Paper
Chris Newport, Jeffrey Parker, K. Smith, Albert Benveniste, Nam-Wook Kim, David Reyland, Reginald Farrow, Anthony Novembre, Richard Kasica, Chester Knurek, Milton Peabody, Len Rutberg
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351088
KEYWORDS: Photomasks, Charged-particle lithography, Optical alignment, Semiconducting wafers, Metrology, Electron beam lithography, Metals, Manufacturing, Image processing, Scanning electron microscopy

Proceedings Article | 25 June 1999 Paper
James Liddle, Myrtle Blakey, Gregg Gallatin, Chester Knurek, Masis Mkrtchyan, Anthony Novembre, Warren Waskiewicz
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351090
KEYWORDS: Charged-particle lithography, Stochastic processes, Image processing, Photomasks, Systems modeling, Semiconducting wafers, Lithography, Particles, Error analysis, Image quality

Proceedings Article | 25 June 1999 Paper
Michael Schlax, Roxann Engelstad, Edward Lovell, James Liddle, Anthony Novembre
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351087
KEYWORDS: Composites, Charged-particle lithography, Photomasks, Sensors, Prototyping, Temperature metrology, Radiation effects, Electrodes, Lithography, Metals

Proceedings Article | 25 June 1999 Paper
Mitsuru Sato, Katsumi Omori, Kiyoshi Ishikawa, Toshimasa Nakayama, Anthony Novembre, Leonidas Ocola
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351094
KEYWORDS: Charged-particle lithography, Electron beams, Electron beam lithography, Lithography, Critical dimension metrology, Standards development, Optical lithography, Photoresist materials, Light sources, Semiconducting wafers

Proceedings Article | 25 June 1999 Paper
Roxann Engelstad, Edward Lovell, Gerald Dicks, Carl Martin, Michael Schlax, William Semke, James Liddle, Anthony Novembre
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351085
KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Finite element methods, Silicon, 3D modeling, Data modeling, Radiation effects, Mechanics, Device simulation

Proceedings Article | 25 June 1999 Paper
Steven Spector, Ping Luo, Anthony Novembre, Leonidas Ocola, Donald White, Donald Tennant, Obert Wood
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351134
KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Contamination, Photoresist materials, Floods, Multilayers, Semiconducting wafers

Proceedings Article | 25 June 1999 Paper
Gregory Bogart, Anthony Novembre, Avi Kornblit, Milton Peabody, Reginald Farrow, Myrtle Blakey, Richard Kasica, James Liddle, Thomas Saunders, Chester Knurek, Ian Johnston
Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351089
KEYWORDS: Etching, Photomasks, Semiconducting wafers, Charged-particle lithography, Silicon, Crystals, Dry etching, Plasma, Wet etching, Photoresist materials

Proceedings Article | 23 April 1999 Paper
Gregory Bogart, Anthony Novembre, Avi Kornblit, Milton Peabody, Reginald Farrow, Myrtle Blakey, Richard Kasica, James Liddle, Thomas Saunders, Chester Knurek
Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346223
KEYWORDS: Photomasks, Semiconducting wafers, Silicon, Charged-particle lithography, Etching, Electron beam lithography, Crystals, Wet etching, Electron beams, Dry etching

Proceedings Article | 18 December 1998 Paper
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332873
KEYWORDS: SRAF, Lithography, Photoresist processing, Optical proximity correction, Critical dimension metrology, Scanning electron microscopy, Image processing, Lithographic illumination, Tolerancing, Reticles

Proceedings Article | 1 September 1998 Paper
Anthony Novembre, Milton Peabody, Myrtle Blakey, Reginald Farrow, Richard Kasica, James Liddle, Thomas Saunders, Donald Tennant
Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328847
KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Inspection, Silicon, Tungsten, Electron beam lithography, Photoresist processing, Etching, Image processing

Proceedings Article | 29 June 1998 Paper
Gary Dabbagh, Richard Hutton, Raymond Cirelli, Elsa Reichmanis, Anthony Novembre, Omkaram Nalamasu
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312398
KEYWORDS: Oxygen, Plasma, Etching, Polymers, Plasma etching, Image processing, Diffusion, Lithography, Infrared spectroscopy, Refractive index

Proceedings Article | 8 June 1998 Paper
Reginald Farrow, Myrtle Blakey, Richard Kasica, James Liddle, Masis Mkrtchyan, Anthony Novembre, Milton Peabody, Thomas Saunders, David Windt, Larry Zurbrick, James Wiley, Christopher Aquino, Steve Hentschel, Larry Davis, B. Boyer
Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308730
KEYWORDS: Photomasks, Charged-particle lithography, Inspection, Defect inspection, Scanning electron microscopy, Defect detection, Transmittance, Optical testing, Integrated optics, Optical inspection

Proceedings Article | 5 June 1998 Paper
Stuart Stanton, James Liddle, Warren Waskiewicz, Masis Mkrtchyan, Anthony Novembre, Lloyd Harriott
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309631
KEYWORDS: Charged-particle lithography, Semiconducting wafers, Lithography, Photomasks, Error analysis, Critical dimension metrology, Image segmentation, Diffraction, Ultraviolet radiation, Optical design

Proceedings Article | 7 July 1997 Paper
Warren Waskiewicz, Christopher Biddick, Myrtle Blakey, Kevin Brady, Ron Camarda, Wayne Connelly, A. Crorken, J. Custy, R. DeMarco, Reginald Farrow, Joseph Felker, Linus Fetter, Richard Freeman, Lloyd Harriott, Leslie Hopkins, Harold Huggins, Richard Kasica, Chester Knurek, Joseph Kraus, James Liddle, Masis Mkrtchyan, Anthony Novembre, Milton Peabody, Len Rutberg, Harry Wade, Pat Watson, Kurt Werder, David Windt, Regine Tarascon-Auriol, Steven Berger, Stephen Bowler
Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275786
KEYWORDS: Photomasks, Charged-particle lithography, Lithography, Printing, Semiconducting wafers, Etching, Silicon, Scanning electron microscopy, Photomicroscopy, Backscatter

Proceedings Article | 12 February 1997 Paper
Milton Peabody, Myrtle Blakey, Reginald Farrow, Richard Kasica, James Liddle, Anthony Novembre, Thomas Saunders, Donald Tennant, David Windt
Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301190
KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Inspection, Metrology, Etching, Plasma etching, Electron beam lithography, Defect inspection, Silicon

Proceedings Article | 27 December 1996 Paper
Linus Fetter, Christopher Biddick, Myrtle Blakey, James Liddle, Milton Peabody, Anthony Novembre, Donald Tennant
Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262810
KEYWORDS: Photomasks, Electron beam lithography, Charged-particle lithography, Lithography, Reticles, Scattering, Silicon, Metrology, Semiconducting wafers, Distortion

Proceedings Article | 8 December 1995 Paper
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228161
KEYWORDS: Reticles, Photoresist processing, Inspection, Electron beams, Tolerancing, Manufacturing, Opacity, Polymers, Coating, Photomasks

Proceedings Article | 9 June 1995 Paper
Bruce Smith, David Mixon, Anthony Novembre, Shahid Butt
Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210400
KEYWORDS: Absorbance, Absorption, Curium, Etching, Polymers, Information operations, Reactive ion etching, Lithography, Resistance, Silicon

Proceedings Article | 9 June 1995 Paper
Louis Poli, Christine Kondek, Anthony Novembre, George McLane
Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210415
KEYWORDS: Etching, Gallium arsenide, Photoresist processing, Electron beam lithography, Lithography, Semiconducting wafers, Photomicroscopy, Lenses, Reactive ion etching, Scanning electron microscopy

Proceedings Article | 19 May 1995 Paper
Anthony Novembre, Regine Tarascon-Auriol, Omkaram Nalamasu, Linus Fetter, Kevin Bolan, Chester Knurek, Norbert Muenzel, Heinz Holzwarth
Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209189
KEYWORDS: X-rays, Lithography, X-ray lithography, Deep ultraviolet, Electron beam lithography, Photoresist processing, Semiconducting wafers, Photomasks, Scanning electron microscopy, X-ray optics

Proceedings Article | 19 May 1995 Paper
Jerry Guo, Anthony Novembre, Herschel Marchman, Joseph Abate, John Frackoviak, David Tomes, Allen Timko, George Celler
Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209180
KEYWORDS: X-rays, Printing, X-ray lithography, Lithography, Chemically amplified resists, Photomasks, X-ray sources, Photoresist processing, Image quality, Semiconducting wafers

Proceedings Article | 7 December 1994 Paper
Steven Berger, Christopher Biddick, Myrtle Blakey, Kevin Bolan, Stephen Bowler, Kevin Brady, Ron Camarda, Wayne Connelly, Reginald Farrow, Joseph Felker, Linus Fetter, Lloyd Harriott, Harold Huggins, Joseph Kraus, James Liddle, Masis Mkrtchyan, Anthony Novembre, Milton Peabody, Thomas Russell, Wayne Simpson, Regine Tarascon-Auriol, Harry Wade, Warren Waskiewicz, Pat Watson
Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195843
KEYWORDS: Charged-particle lithography, Photomasks, Semiconducting wafers, Electron beam lithography, Photomask technology, Charged particle optics, Wafer-level optics, Electron beams, Scattering, Lithography

Proceedings Article | 16 May 1994 Paper
Regine Tarascon-Auriol, Anthony Novembre, Woon Tai, Linus Fetter, Janet Kometani, Omkaram Nalamasu
Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175343
KEYWORDS: Absorption, Deep ultraviolet, Lithography, Chemically amplified resists, Temperature metrology, Spectroscopy, Edge roughness, Manufacturing, Semiconducting wafers, Direct write lithography

Proceedings Article | 15 February 1994 Paper
Anthony Novembre, David Mixon, Christophe Pierrat, Chester Knurek, Michael Stohl
Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167248
KEYWORDS: Etching, Photomasks, Plasma, Electron beams, Plasma etching, Electron beam lithography, Scanning electron microscopy, Dry etching, Chromium, Glasses

Proceedings Article | 24 June 1993 Paper
John Frackoviak, George Celler, Charles Jurgensen, R. Kola, Anthony Novembre, Lee Trimble, David Tomes
Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146508
KEYWORDS: Semiconducting wafers, X-rays, Photomasks, Instrument modeling, Control systems, Optical alignment, Critical dimension metrology, Photoresist processing, Metrology, X-ray lithography

Proceedings Article | 26 March 1993 Paper
Anthony Novembre, Regine Tarascon, Larry Thompson, Wallace Tang, C. Tange, R. Bostic, D. Ahn
Proceedings Volume 1809, (1993) https://doi.org/10.1117/12.142152
KEYWORDS: Photoresist processing, Calibration, Head, Photomasks, Manufacturing, Active optics, Control systems, Process control, Sensing systems, Signal processing

Proceedings Article | 9 July 1992 Paper
George Celler, John Frackoviak, Richard Freeman, Charles Jurgensen, R. Kola, Anthony Novembre, Larry Thompson, Lee Trimble, David Tomes
Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136015
KEYWORDS: Semiconducting wafers, X-rays, Photomasks, Optical alignment, X-ray sources, Plasma, Silicon, X-ray lithography, Lithography, Pulsed laser operation

Proceedings Article | 1 June 1991 Paper
Anthony Novembre, Woon Tai, Janet Kometani, James Hanson, Omkaram Nalamasu, Gary Taylor, Elsa Reichmanis, Larry Thompson
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46361
KEYWORDS: X-rays, X-ray lithography, Sulfur, Polymers, Lithography, Scanning electron microscopy, Chemically amplified resists, Silicon, Absorbance, X-ray fluorescence spectroscopy

Proceedings Article | 1 March 1991 Paper
Wen-Chih Chen, Anthony Novembre
Proceedings Volume 1496, (1991) https://doi.org/10.1117/12.46759
KEYWORDS: Photomasks, Etching, Data modeling, Cadmium, Critical dimension metrology, Electron beams, Manufacturing, Modeling, Photoresist processing, Reticles

Proceedings Article | 1 June 1990 Paper
Charles Jurgensen, Anthony Novembre, Eric Shaqfeh
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20093
KEYWORDS: Etching, Photomasks, Lithography, Anisotropy, Interfaces, Sputter deposition, Polymers, Particles, Plasma, Oxides

Showing 5 of 39 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 1 June 1992

Conference Committee Involvement (7)
Emerging Lithographic Technologies XII
26 February 2008 | San Jose, California, United States
Emerging Lithographic Technologies XI
27 February 2007 | San Jose, California, United States
Emerging Lithographic Technologies X
21 February 2006 | San Jose, California, United States
Emerging Lithographic Technologies IX
1 March 2005 | San Jose, California, United States
Emerging Lithographic Technologies VIII
24 February 2004 | Santa Clara, California, United States
Emerging Lithographic Technologies VII
25 February 2003 | Santa Clara, California, United States
Advances in Resist Technology and Processing IX
9 March 1992 | San Jose, CA, United States
Showing 5 of 7 Conference Committees
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