Mark Lawliss
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 10 May 2016 Paper
Thomas Faure, Yoshifumi Sakamoto, Yusuke Toda, Karen Badger, Kazunori Seki, Mark Lawliss, Takeshi Isogawa, Amy Zweber, Masayuki Kagawa, Richard Wistrom, Yongan Xu, Granger Lobb, Ramya Viswanathan, Lin Hu, Yukio Inazuki, Kazuhiro Nishikawa
Proceedings Volume 9984, 998402 (2016) https://doi.org/10.1117/12.2241480
KEYWORDS: Photomasks, Phase shifts, Logic, Lithography, Chromium, Inspection, Opacity, SRAF, Etching, Attenuators

SPIE Journal Paper | 12 April 2016 Open Access
JM3, Vol. 15, Issue 02, 023502, (April 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.023502
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Semiconducting wafers, Metals, Extreme ultraviolet lithography, Multilayers, Etching, Deep ultraviolet, Scanning electron microscopy

SPIE Journal Paper | 18 March 2016
Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Zhengqing Qi, Jed Rankin, Shinji Akima
JM3, Vol. 15, Issue 02, 021010, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021010
KEYWORDS: Extreme ultraviolet, Photomasks, Semiconducting wafers, Multilayers, Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Microscopes, Scanning electron microscopy, Manufacturing

SPIE Journal Paper | 1 February 2016
Kazunori Seki, Takeshi Isogawa, Masayuki Kagawa, Shinji Akima, Yutaka Kodera, Karen Badger, Zhengqing John Qi, Mark Lawliss, Jed Rankin, Ravi Bonam
JM3, Vol. 15, Issue 02, 021004, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021004
KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Defect detection, Scanning electron microscopy, Extreme ultraviolet lithography, Wafer inspection, Multilayers, Visibility, Overlay metrology

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96350L (2015) https://doi.org/10.1117/12.2197476
KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Manufacturing, Deep ultraviolet, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Scanning electron microscopy, EUV optics

Proceedings Article | 23 October 2015 Paper
Takeshi Isogawa, Kazunori Seki, Mark Lawliss, Zhengqing John Qi, Jed Rankin, Shinji Akima
Proceedings Volume 9635, 963518 (2015) https://doi.org/10.1117/12.2197761
KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Multilayers, Manufacturing, Microscopes, Lithography, Airborne remote sensing, Reflectivity

Proceedings Article | 9 July 2015 Paper
Kazunori Seki, Takeshi Isogawa, Masayuki Kagawa, Shinji Akima, Yutaka Kodera, Karen Badger, Zhengqing John Qi, Mark Lawliss, Jed Rankin, Ravi Bonam
Proceedings Volume 9658, 96580G (2015) https://doi.org/10.1117/12.2197763
KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Scanning electron microscopy, Defect detection, Phase contrast, Extreme ultraviolet, Optical lithography, Visibility, Overlay metrology

Proceedings Article | 9 July 2015 Paper
Christina Turley, Jed Rankin, Louis Kindt, Mark Lawliss, Luke Bolton, Kevin Collins, Lin Cheong, Ravi Bonam, Richard Poro, Takeshi Isogawa, Eisuke Narita, Masayuki Kagawa
Proceedings Volume 9658, 965811 (2015) https://doi.org/10.1117/12.2197383
KEYWORDS: Photomasks, Extreme ultraviolet, Manufacturing, Resistance, Particles, Scanners, Extreme ultraviolet lithography, Optical inspection, Inspection, Reflectivity

Proceedings Article | 8 October 2014 Paper
Proceedings Volume 9235, 923516 (2014) https://doi.org/10.1117/12.2069787
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Image processing, Inspection, Printing, Scanning electron microscopy, Multilayers, Lithography, Mask making

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560N (2014) https://doi.org/10.1117/12.2070251
KEYWORDS: Etching, Extreme ultraviolet, Lawrencium, Photomasks, Semiconducting wafers, Microscopes, Critical dimension metrology, Bridges, Electron beams, Reflectivity

Proceedings Article | 28 July 2014 Paper
Emily Gallagher, Alfred Wagner, Mark Lawliss, Gregory McIntyre, Kazunori Seki, Takeshi Isogawa, Steven Nash
Proceedings Volume 9256, 92560K (2014) https://doi.org/10.1117/12.2070871
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Microscopes, Semiconducting wafers, Atomic force microscopy, Scanning electron microscopy, Defect inspection, Printing, Diamond

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86791I (2013) https://doi.org/10.1117/12.2014935
KEYWORDS: Photomasks, Extreme ultraviolet, Atomic force microscopy, Inspection, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts, Manufacturing, Calibration

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85221L (2012) https://doi.org/10.1117/12.974749
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Extreme ultraviolet, Atomic force microscopy, Near field, Manufacturing, Reflectivity, Inspection, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71221B (2008) https://doi.org/10.1117/12.801945
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Finite-difference time-domain method, Wafer inspection, Manufacturing, Printing, Lithography, Reticles, Optical proximity correction

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71220A (2008) https://doi.org/10.1117/12.801951
KEYWORDS: Inspection, Photomasks, Opacity, Optical proximity correction, Attenuators, SRAF, Defect inspection, Defect detection, Reticles, Semiconducting wafers

Proceedings Article | 16 November 2007 Paper
Sajan Marokkey, Edward Conrad, Emily Gallagher, Hidehiro Ikeda, James Bruce, Mark Lawliss
Proceedings Volume 6730, 67302Q (2007) https://doi.org/10.1117/12.746685
KEYWORDS: Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Photomasks, SRAF, Data modeling, Failure analysis, Image processing, Lithography, Photoresist materials

Proceedings Article | 15 May 2007 Paper
Proceedings Volume 6607, 66072E (2007) https://doi.org/10.1117/12.728997
KEYWORDS: Inspection, Photomasks, Opacity, Optical proximity correction, SRAF, Semiconducting wafers, Defect inspection, Defect detection, Image quality, Manufacturing

Proceedings Article | 10 May 2005 Paper
Emily Fisch, Colin Brodsky, Philip Flanigan, Mark Lawliss, Jed Rankin, David Thibault
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600101
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Carbon, SRAF, Scanning electron microscopy, Opacity, Resolution enhancement technologies, Manufacturing, Modulation

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517513
KEYWORDS: Critical dimension metrology, Chemically amplified resists, Cadmium, Scanning electron microscopy, Electron beam lithography, Mask making, Photomasks, Electron beams, Beam shaping, Quartz

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490136
KEYWORDS: Photomasks, Reticles, Silicon, Semiconducting wafers, Mask making, Metrology, Electron beam lithography, Optical alignment, Projection lithography, Lithography

Proceedings Article | 16 June 2003 Paper
Carey Thiel, Kenneth Racette, Emily Fisch, Mark Lawliss, Louis Kindt, Chester Huang, Robin Ackel, Max Levy
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484988
KEYWORDS: Chromium, Etching, Reflectivity, Oxides, Photomasks, Extreme ultraviolet lithography, Dry etching, Multilayers, Wet etching, Silicon

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467756
KEYWORDS: Silicon, Photomasks, Boron, Line edge roughness, Electron beam lithography, Etching, Semiconducting wafers, Image quality, Scanning electron microscopy, Projection lithography

Proceedings Article | 16 August 2002 Paper
Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479342
KEYWORDS: Photomasks, Inspection, Lithography, Extreme ultraviolet lithography, X-rays, Etching, Chromium, Image processing, Multilayers, Reflectivity

Proceedings Article | 1 August 2002 Paper
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477008
KEYWORDS: Photomasks, Image processing, Mask making, Metals, Optical lithography, Line edge roughness, Lithography, Electron beam lithography, Semiconducting wafers, Data centers

Proceedings Article | 1 July 2002 Paper
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472286
KEYWORDS: Chromium, Extreme ultraviolet lithography, Etching, Photomasks, Inspection, Line edge roughness, Silicon, Metrology, Reflectivity, Quartz

Proceedings Article | 5 September 2001 Paper
Wu-Song Huang, Ranee Kwong, Wayne Moreau, Robert Lang, Christopher Robinson, David Medeiros, Karen Petrillo, Ari Aviram, Arpan Mahorowala, Marie Angelopoulos, Christopher Magg, Mark Lawliss, Thomas Faure
Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438350
KEYWORDS: Etching, Silicon, Resistance, Mask making, Dry etching, Lithography, Photoresist processing, Chromium, Photomasks, Image resolution

Proceedings Article | 20 August 2001 Paper
Wu-Song Huang, Ranee Kwong, Wayne Moreau, Robert Lang, Christopher Robinson, David Medeiros, Karen Petrillo, Ari Aviram, Arpan Mahorowala, Marie Angelopoulos, Christopher Magg, Mark Lawliss, Thomas Faure
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436656
KEYWORDS: Etching, Silicon, Resistance, Photomasks, Mask making, Lithography, Dry etching, Photoresist processing, Chromium, Image resolution

Proceedings Article | 20 August 2001 Paper
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436664
KEYWORDS: Photomasks, Image processing, Electron beam lithography, Projection lithography, Silicon, Scattering, Etching, Lithography, Finite element methods, Image analysis

Proceedings Article | 22 January 2001 Paper
Christopher Magg, Michael Lercel, Mark Lawliss, Ranee Kwong, Wu-Song Huang, Marie Angelopoulos
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410750
KEYWORDS: Photomasks, Critical dimension metrology, X-rays, Image processing, Silicon, Photoresist processing, Silicon carbide, Lithography, Mask making, Temperature metrology

Proceedings Article | 22 January 2001 Paper
Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410699
KEYWORDS: Photomasks, Inspection, Charged-particle lithography, Extreme ultraviolet, Reticles, Reflectivity, Semiconducting wafers, Silicon, Ultraviolet radiation, Chromium

Proceedings Article | 21 July 2000 Paper
Ranee Kwong, Wu-Song Huang, John Hartley, Wayne Moreau, Christopher Robinson, Marie Angelopoulos, Christopher Magg, Mark Lawliss
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390071
KEYWORDS: Photomasks, Mask making, Lithography, Electron beam lithography, Charged-particle lithography, Silicon, Electron beams, Beam shaping, Printing, Photoresist processing

Proceedings Article | 19 July 2000 Paper
Michael Lercel, Kenneth Racette, Christopher Magg, Mark Lawliss, Kevin Collins, Monica Barrett, Michael Trybendis, Lucien Bouchard
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392049
KEYWORDS: Photomasks, Etching, X-rays, Image processing, Silicon, Scattering, Photoresist processing, Lithography, Diamond, Extreme ultraviolet lithography

Proceedings Article | 19 July 2000 Paper
Wu-Song Huang, Ranee Kwong, John Hartley, Wayne Moreau, Marie Angelopoulos, Christopher Magg, Mark Lawliss
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392026
KEYWORDS: Photomasks, Mask making, Etching, Lithography, Semiconducting wafers, Chromium, Beam shaping, Electron beam lithography, Optical proximity correction, Photoresist processing

Proceedings Article | 30 December 1999 Paper
Neal Caldwell, Raymond Jeffer, Mark Lawliss, John Hartley
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373344
KEYWORDS: Photomasks, Glasses, Reticles, Image processing, X-rays, Etching, Control systems, Dry etching, Lithography, Photoresist processing

Proceedings Article | 30 December 1999 Paper
Michael Lercel, Cameron Brooks, Kenneth Racette, Christopher Magg, Mark Lawliss, Neal Caldwell, Raymond Jeffer, Kevin Collins, Monica Barrett, Steven Nash, Michael Trybendis, Lucien Bouchard
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373374
KEYWORDS: Photomasks, X-rays, Critical dimension metrology, Etching, Semiconducting wafers, Electron beam lithography, Silicon, Lithography, X-ray lithography, Extreme ultraviolet

Proceedings Article | 27 May 1996 Paper
Denise Puisto, Mark Lawliss, Thomas Faure, Janet Rocque, Kurt Kimmel, Douglas Benoit
Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240472
KEYWORDS: Photomasks, X-rays, Silicon, X-ray imaging, Plating, Image processing, Photoresist processing, Metrology, Electroplating, Silicon carbide

Proceedings Article | 7 December 1994 Paper
Denise Puisto, Mark Lawliss
Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195806
KEYWORDS: Photomasks, X-rays, Distortion, X-ray lithography, Lithography, X-ray imaging, Mask making, Photomask technology, Semiconducting wafers, Silicon

Showing 5 of 37 publications
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