Dr. Ron R. Bozak
Applications Manager at Bruker Corp
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86791I (2013) https://doi.org/10.1117/12.2014935
KEYWORDS: Photomasks, Extreme ultraviolet, Atomic force microscopy, Inspection, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts, Manufacturing, Calibration

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85221L (2012) https://doi.org/10.1117/12.974749
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Multilayers, Extreme ultraviolet, Atomic force microscopy, Near field, Manufacturing, Reflectivity, Inspection, Semiconducting wafers

Proceedings Article | 30 June 2012 Paper
Proceedings Volume 8441, 84410E (2012) https://doi.org/10.1117/12.964959
KEYWORDS: Nanoparticles, Photomasks, Particles, Inspection, Atomic force microscopy, Contamination, Mathematical modeling, Nanotechnology, Defect inspection, Metrology

Proceedings Article | 17 April 2012 Paper
Alexander Figliolini, Michael Archuletta, Jeff LeClaire, David Brinkley, David Doerr, Roy White, Ron Bozak, David Lee
Proceedings Volume 8352, 83520R (2012) https://doi.org/10.1117/12.918378
KEYWORDS: Air contamination, Photomasks, Pellicles, Particles, Reticles, Semiconducting wafers, Image processing, Lithography, Inspection, Quartz

Proceedings Article | 14 October 2011 Paper
Jin-Hong Lin, C. Chen, F. G. Tsai, Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta
Proceedings Volume 8166, 81662X (2011) https://doi.org/10.1117/12.898502
KEYWORDS: Photomasks, Deep ultraviolet, Opacity, Pellicles, Femtosecond phenomena, Quartz, Image transmission, Critical dimension metrology, Manufacturing, Chromium

Proceedings Article | 14 October 2011 Paper
Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, Bernie Arruza
Proceedings Volume 8166, 81662Y (2011) https://doi.org/10.1117/12.898504
KEYWORDS: Photomasks, Atomic force microscopy, Source mask optimization, Manufacturing, Reticles, Lithography, Computational lithography, Optimization (mathematics), Opacity, Resolution enhancement technologies

Proceedings Article | 14 October 2011 Paper
Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, David Lee
Proceedings Volume 8166, 81661J (2011) https://doi.org/10.1117/12.898503
KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Lithography, Cryogenics, Data modeling, Nanoparticles, Nanotechnology, Autoregressive models

Proceedings Article | 25 September 2010 Paper
Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta
Proceedings Volume 7823, 782320 (2010) https://doi.org/10.1117/12.864426
KEYWORDS: Photomasks, Deep ultraviolet, Pellicles, Particles, Laser applications, Inspection, Semiconducting wafers, Femtosecond phenomena, Critical dimension metrology, Contamination

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 782326 (2010) https://doi.org/10.1117/12.864381
KEYWORDS: Particles, Photomasks, Atomic force microscopy, Contamination, Nanoparticles, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Inspection

Proceedings Article | 27 May 2010 Paper
Tod Robinson, Daniel Yi, Roy White, Ron Bozak, Mike Archuletta, David Lee
Proceedings Volume 7748, 77481H (2010) https://doi.org/10.1117/12.865198
KEYWORDS: Photomasks, Autoregressive models, Lithography, Bridges, Quartz, Nanotechnology, Standards development, Edge detection, Software development, Human-machine interfaces

Proceedings Article | 25 May 2010 Paper
Tod Robinson, Roy White, Ron Bozak, Jeff LeClaire, Mike Archuletta, David Lee
Proceedings Volume 7748, 77480G (2010) https://doi.org/10.1117/12.865197
KEYWORDS: Photomasks, Pellicles, Chromium, Deep ultraviolet, Nanoparticles, Inspection, Scanning electron microscopy, Laser development, Particles, Defect inspection

Proceedings Article | 2 April 2010 Paper
Thomas Ku, Jeff LeClaire, Sia Kim Tan, Gek Soon Chua, Ron Bozak, Roy White, Tod Robinson, Michael Archuletta, David Lee
Proceedings Volume 7638, 763817 (2010) https://doi.org/10.1117/12.848283
KEYWORDS: Photomasks, Air contamination, Semiconducting wafers, Reticles, Inspection, Pellicles, Contamination, Manufacturing, Deep ultraviolet, Critical dimension metrology

Proceedings Article | 23 September 2009 Paper
Tod Robinson, Roy White, Ron Bozak, Ken Roessler, Bernie Arruza, Dennis Hogle, Mike Archuletta, David Lee
Proceedings Volume 7488, 74880F (2009) https://doi.org/10.1117/12.847238
KEYWORDS: Photomasks, Atomic force microscopy, Nanotechnology, Chromium, Binary data, Extreme ultraviolet, Cryogenics, Molecular bridges, Environmental monitoring

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73791J (2009) https://doi.org/10.1117/12.824296
KEYWORDS: Particles, Photomasks, Contamination, Nanoparticles, Atomic force microscopy, Manufacturing, Inspection, Quartz, Scanning electron microscopy, Air contamination

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71221I (2008) https://doi.org/10.1117/12.801297
KEYWORDS: Photomasks, Optical proximity correction, Atomic force microscopy, Extreme ultraviolet, Cryogenics, Scanning electron microscopy, Lithography, Nanotechnology, Metrology, Autoregressive models

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71221J (2008) https://doi.org/10.1117/12.801301
KEYWORDS: Pellicles, Deep ultraviolet, Photomasks, Scanning electron microscopy, Bridges, Particles, Airborne remote sensing, Quartz, Inspection, Metrology

Proceedings Article | 17 October 2008 Paper
Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho
Proceedings Volume 7122, 71222I (2008) https://doi.org/10.1117/12.801415
KEYWORDS: Photomasks, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers, Diffractive optical elements, Image processing, Critical dimension metrology, Factor analysis

Proceedings Article | 19 May 2008 Paper
Proceedings Volume 7028, 70281A (2008) https://doi.org/10.1117/12.793052
KEYWORDS: Particles, Photomasks, Cryogenics, Chromium, Scanning electron microscopy, Atomic force microscopy, Binary data, Image processing, Optical proximity correction, Particle contamination

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67301Y (2007) https://doi.org/10.1117/12.746748
KEYWORDS: Particles, Photomasks, Cryogenics, Particle contamination, Atomic force microscopy, Scanning electron microscopy, Chromium, Lithography, Inspection, Quartz

Proceedings Article | 20 October 2006 Paper
Roy White, Jeff LeClaire, Tod Robinson, Andrew Dinsdale, Ron Bozak, David Lee
Proceedings Volume 6349, 63494F (2006) https://doi.org/10.1117/12.686361
KEYWORDS: Deep ultraviolet, Laser ablation, Femtosecond phenomena, Chromium, Quartz, Critical dimension metrology, Photomasks, Pulsed laser operation, Microscopes, Image transmission

Proceedings Article | 20 May 2006 Paper
Tod Robinson, John Lewellen, Ron Bozak, David Lee, Peter Brooker
Proceedings Volume 6283, 62832B (2006) https://doi.org/10.1117/12.681782
KEYWORDS: Photomasks, Quartz, Data modeling, Refractive index, Atomic force microscopy, Calibration, Error analysis, Phase shifts, Bridges, Etching

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 628329 (2006) https://doi.org/10.1117/12.681779
KEYWORDS: Laser ablation, Deep ultraviolet, Electrons, Photomasks, Femtosecond phenomena, Chromium, Pulsed laser operation, Microscopes, Critical dimension metrology, Absorption

Proceedings Article | 9 November 2005 Paper
Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, David Lee, Ken Roessler
Proceedings Volume 5992, 59924Z (2005) https://doi.org/10.1117/12.634758
KEYWORDS: Photomasks, Chromium, Atomic force microscopy, Statistical analysis, Binary data, Quartz, Feedback control, Control systems, Extreme ultraviolet lithography, Lithography

Proceedings Article | 5 November 2005 Paper
Tod Robinson, Peter Brooker, Ron Bozak, David Lee
Proceedings Volume 5992, 59921D (2005) https://doi.org/10.1117/12.633160
KEYWORDS: Photomasks, Atomic force microscopy, Chromium, Quartz, Semiconducting wafers, Lithography, Image processing, Computer simulations, Binary data, Solids

Proceedings Article | 28 June 2005 Paper
Peter Brooker, Tod Robinson, John Lewellen, Bob Naber, Ron Bozak, David Lee
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617346
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Reticles, Quartz, Phase shifts, Image enhancement, Phase shifting, Image transmission, Chromium

Proceedings Article | 20 August 2004 Paper
Jeffrey Csuy, Ron Bozak, Lee Terrill, Roy White, Naoki Nishida
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557736
KEYWORDS: Photomasks, Inspection, Scanning electron microscopy, Atomic force microscopy, Image analysis, Optical testing, Metrology, Manufacturing, Atomic force microscope, Optics manufacturing

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518025
KEYWORDS: Binary data, Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Cadmium, Quartz, Scanning electron microscopy, NOx, Printing

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504213
KEYWORDS: Quartz, Scanning electron microscopy, Photomasks, Binary data, Printing, Bridges, Cadmium, Image transmission, 193nm lithography, Manufacturing

Proceedings Article | 27 December 2002 Paper
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468275
KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Phase shifts, Wafer testing, Cadmium, Semiconductors, Atomic force microscope, Head, Ion beams

Proceedings Article | 1 August 2002 Paper
David Brinkley, Roy White, Ron Bozak, Ted Liang, Gang Liu
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476998
KEYWORDS: Photomasks, Extreme ultraviolet, Carbon, Contamination, Atomic force microscopy, Image processing, Quartz, Etching, Reflectivity, Phase shifts

Proceedings Article | 11 March 2002 Paper
Roy White, Martin Verbeek, Ron Bozak, Marty Klos
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458294
KEYWORDS: Photomasks, Quartz, Atomic force microscopy, Bridges, Image processing, Phase shifts, Carbon, Image transmission, Semiconductors, Head

Showing 5 of 31 publications
Conference Committee Involvement (11)
Photomask Technology
12 September 2016 | San Jose, California, United States
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Photomask Technology
13 September 2010 | Monterey, California, United States
Photomask Technology
15 September 2009 | Monterey, California, United States
Photomask Technology
7 October 2008 | Monterey, California, United States
Photomask Technology
18 September 2007 | Monterey, California, United States
Photomask Technology
19 September 2006 | Monterey, California, United States
Showing 5 of 11 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top