Dr. David W. Brinkley Profile

Dr. David W. Brinkley

at RAVE LLC

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 13 October 2020 Poster + Presentation + Paper

Tip wear improvements in advanced nanomachining

Maria Cadena, Marino Romanello, Daniel Yi, Tod Robinson, David Brinkley, Marty Klos

Proceedings Volume 11518, 1151811 (2020) https://doi.org/10.1117/12.2573094

KEYWORDS: Chemistry, Molecular machines, Extreme ultraviolet

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Proceedings Article | 4 October 2016 Paper

Identification of a new source of reticle contamination

Brian Grenon, David Brinkley

Proceedings Volume 9985, 998516 (2016) https://doi.org/10.1117/12.2247576

KEYWORDS: Reticles, Contamination, Pellicles, Adhesives, Air contamination, FT-IR spectroscopy, Ions, Semiconducting wafers, Fluorine, Photomasks

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Proceedings Article | 30 June 2012 Paper

Applications and development of BitClean technology including selective nanoparticle manipulation

Tod Robinson, David Brinkley, Roy White, Jeff LeClaire, Michael Archuletta, Ron Bozak, Daniel Yi

Proceedings Volume 8441, 84410E (2012) https://doi.org/10.1117/12.964959

KEYWORDS: Nanoparticles, Photomasks, Particles, Inspection, Atomic force microscopy, Contamination, Mathematical modeling, Nanotechnology, Defect inspection, Metrology

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Proceedings Article | 17 April 2012 Paper

Through pellicle management of haze formation in a wafer fabrication environment

Alexander Figliolini, Michael Archuletta, Jeff LeClaire, David Brinkley, David Doerr, Roy White, Ron Bozak, David Lee

Proceedings Volume 8352, 83520R (2012) https://doi.org/10.1117/12.918378

KEYWORDS: Air contamination, Photomasks, Pellicles, Particles, Reticles, Semiconducting wafers, Image processing, Lithography, Inspection, Quartz

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Proceedings Article | 14 October 2011 Paper

Nanomachining repair for the latest reticle enhancement technologies

Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, Bernie Arruza

Proceedings Volume 8166, 81662Y (2011) https://doi.org/10.1117/12.898504

KEYWORDS: Photomasks, Atomic force microscopy, Source mask optimization, Manufacturing, Reticles, Lithography, Computational lithography, Optimization (mathematics), Opacity, Resolution enhancement technologies

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Proceedings Article | 14 October 2011 Paper

Clean and repair of EUV photomasks

Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, David Lee

Proceedings Volume 8166, 81661J (2011) https://doi.org/10.1117/12.898503

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Lithography, Cryogenics, Data modeling, Nanoparticles, Nanotechnology, Autoregressive models

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Proceedings Article | 25 September 2010 Paper

Qualification of BitClean technology in photomask production

Tod Robinson, Roy White, Ron Bozak, Mike Archuletta, David Brinkley, Daniel Yi

Proceedings Volume 7823, 782326 (2010) https://doi.org/10.1117/12.864381

KEYWORDS: Particles, Photomasks, Atomic force microscopy, Contamination, Nanoparticles, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Inspection

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Proceedings Article | 30 October 2007 Paper

Repairing 45 nm node defects through nano-machining

Roy White, Andrew Dinsdale, Tod Robinson, David Brinkley, Jeffrey Csuy, David Lee

Proceedings Volume 6730, 673021 (2007) https://doi.org/10.1117/12.748668

KEYWORDS: Diamond, Atomic force microscopy, Image processing, Quartz, Scanning electron microscopy, Photomasks, Diamond machining, Standards development, Autoregressive models, Chromium

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Proceedings Article | 27 December 2002 Paper

Investigation of nanomachining as a technique for geometry reconstruction

David Brinkley, Ron Bozak, Bin Chiu, Chanh Ly, Vikram Tolani, Roy White

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468275

KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Phase shifts, Wafer testing, Cadmium, Semiconductors, Atomic force microscope, Head, Ion beams

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Showing 5 of 9 publications

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