Mr. Michael D. Archuletta Profile

Michael D. Archuletta

Manager, Sales & Marketing

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Author

Publications (16)

Proceedings Article | 1 April 2013 Paper

Through-focus EUV multilayer defect repair with nanomachining

Gregory McIntyre, Emily Gallagher, Tod Robinson, Adam Smith, Mark Lawliss, Jeffrey LeClaire, Ron Bozak, Roy White, Michael Archuletta

Proceedings Volume 8679, 86791I (2013) https://doi.org/10.1117/12.2014935

KEYWORDS: Photomasks, Extreme ultraviolet, Atomic force microscopy, Inspection, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts, Manufacturing, Calibration

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Proceedings Article | 30 June 2012 Paper

Applications and development of BitClean technology including selective nanoparticle manipulation

Tod Robinson, David Brinkley, Roy White, Jeff LeClaire, Michael Archuletta, Ron Bozak, Daniel Yi

Proceedings Volume 8441, 84410E (2012) https://doi.org/10.1117/12.964959

KEYWORDS: Nanoparticles, Photomasks, Particles, Inspection, Atomic force microscopy, Contamination, Mathematical modeling, Nanotechnology, Defect inspection, Metrology

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Proceedings Article | 17 April 2012 Paper

Through pellicle management of haze formation in a wafer fabrication environment

Alexander Figliolini, Michael Archuletta, Jeff LeClaire, David Brinkley, David Doerr, Roy White, Ron Bozak, David Lee

Proceedings Volume 8352, 83520R (2012) https://doi.org/10.1117/12.918378

KEYWORDS: Air contamination, Photomasks, Pellicles, Particles, Reticles, Semiconducting wafers, Image processing, Lithography, Inspection, Quartz

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Proceedings Article | 14 October 2011 Paper

Nanomachining repair for the latest reticle enhancement technologies

Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, Bernie Arruza

Proceedings Volume 8166, 81662Y (2011) https://doi.org/10.1117/12.898504

KEYWORDS: Photomasks, Atomic force microscopy, Source mask optimization, Manufacturing, Reticles, Lithography, Computational lithography, Optimization (mathematics), Opacity, Resolution enhancement technologies

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Proceedings Article | 14 October 2011 Paper

Productivity of femtosecond DUV laser photomask repair in a real world mask house

Jin-Hong Lin, C. Chen, F. G. Tsai, Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta

Proceedings Volume 8166, 81662X (2011) https://doi.org/10.1117/12.898502

KEYWORDS: Photomasks, Deep ultraviolet, Opacity, Pellicles, Femtosecond phenomena, Quartz, Image transmission, Critical dimension metrology, Manufacturing, Chromium

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Proceedings Article | 14 October 2011 Paper

Clean and repair of EUV photomasks

Tod Robinson, Daniel Yi, David Brinkley, Ken Roessler, Roy White, Ron Bozak, Mike Archuletta, David Lee

Proceedings Volume 8166, 81661J (2011) https://doi.org/10.1117/12.898503

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Lithography, Cryogenics, Data modeling, Nanoparticles, Nanotechnology, Autoregressive models

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Proceedings Article | 25 September 2010 Paper

Qualification of BitClean technology in photomask production

Tod Robinson, Roy White, Ron Bozak, Mike Archuletta, David Brinkley, Daniel Yi

Proceedings Volume 7823, 782326 (2010) https://doi.org/10.1117/12.864381

KEYWORDS: Particles, Photomasks, Atomic force microscopy, Contamination, Nanoparticles, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Inspection

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Proceedings Article | 25 September 2010 Paper

Advanced laser mask repair in the current wafer foundry environment

Tod Robinson, Daniel Yi, Jeff LeClaire, Roy White, Ron Bozak, Mike Archuletta

Proceedings Volume 7823, 782320 (2010) https://doi.org/10.1117/12.864426

KEYWORDS: Photomasks, Deep ultraviolet, Pellicles, Particles, Laser applications, Inspection, Semiconducting wafers, Femtosecond phenomena, Critical dimension metrology, Contamination

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Proceedings Article | 27 May 2010 Paper

Nanomachining of non-orthogonal mask patterns

Tod Robinson, Daniel Yi, Roy White, Ron Bozak, Mike Archuletta, David Lee

Proceedings Volume 7748, 77481H (2010) https://doi.org/10.1117/12.865198

KEYWORDS: Photomasks, Autoregressive models, Lithography, Bridges, Quartz, Nanotechnology, Standards development, Edge detection, Software development, Human-machine interfaces

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Proceedings Article | 25 May 2010 Paper

Through-pellicle defect repair for advanced photomasks

Tod Robinson, Roy White, Ron Bozak, Jeff LeClaire, Mike Archuletta, David Lee

Proceedings Volume 7748, 77480G (2010) https://doi.org/10.1117/12.865197

KEYWORDS: Photomasks, Pellicles, Chromium, Deep ultraviolet, Nanoparticles, Inspection, Scanning electron microscopy, Laser development, Particles, Defect inspection

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Proceedings Article | 2 April 2010 Paper

Preliminary results for photomask haze mitigation in a fab environment

Thomas Ku, Jeff LeClaire, Sia Kim Tan, Gek Soon Chua, Ron Bozak, Roy White, Tod Robinson, Michael Archuletta, David Lee

Proceedings Volume 7638, 763817 (2010) https://doi.org/10.1117/12.848283

KEYWORDS: Photomasks, Air contamination, Semiconducting wafers, Reticles, Inspection, Pellicles, Contamination, Manufacturing, Deep ultraviolet, Critical dimension metrology

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Proceedings Article | 23 September 2009 Paper

New tools to enable photomask repair to the 32nm node

Tod Robinson, Roy White, Ron Bozak, Ken Roessler, Bernie Arruza, Dennis Hogle, Mike Archuletta, David Lee

Proceedings Volume 7488, 74880F (2009) https://doi.org/10.1117/12.847238

KEYWORDS: Photomasks, Atomic force microscopy, Nanotechnology, Chromium, Binary data, Extreme ultraviolet, Cryogenics, Molecular bridges, Environmental monitoring

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Proceedings Article | 11 May 2009 Paper

Selective removal of persistent particles with no photomask damage

Tod Robinson, Ron Bozak, Roy White, Mike Archuletta, David Lee

Proceedings Volume 7379, 73791J (2009) https://doi.org/10.1117/12.824296

KEYWORDS: Particles, Photomasks, Contamination, Nanoparticles, Atomic force microscopy, Manufacturing, Inspection, Quartz, Scanning electron microscopy, Air contamination

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Proceedings Article | 17 October 2008 Paper

Nanomachining photomask repair of complex patterns

Tod Robinson, Andrew Dinsdale, Mike Archuletta, Ron Bozak, Roy White

Proceedings Volume 7122, 71221I (2008) https://doi.org/10.1117/12.801297

KEYWORDS: Photomasks, Optical proximity correction, Atomic force microscopy, Extreme ultraviolet, Cryogenics, Scanning electron microscopy, Lithography, Nanotechnology, Metrology, Autoregressive models

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Proceedings Article | 17 October 2008 Paper

Practical laser mask repair in the contemporary production environment

Tod Robinson, Roy White, Mike Archuletta, Ron Bozak

Proceedings Volume 7122, 71221J (2008) https://doi.org/10.1117/12.801301

KEYWORDS: Pellicles, Deep ultraviolet, Photomasks, Scanning electron microscopy, Bridges, Particles, Airborne remote sensing, Quartz, Inspection, Metrology

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Proceedings Article | 19 May 2008 Paper

Nanomachining processes for 45, 32 nm node mask repair and beyond

Tod Robinson, Andrew Dinsdale, Ron Bozak, Roy White, Michael Archuletta

Proceedings Volume 7028, 70281A (2008) https://doi.org/10.1117/12.793052

KEYWORDS: Particles, Photomasks, Cryogenics, Chromium, Scanning electron microscopy, Atomic force microscopy, Binary data, Image processing, Optical proximity correction, Particle contamination

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Showing 5 of 16 publications

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