Prof. Seong-Sue Kim
Professor at Seoul National University
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanopatterning, Materials, and Metrology | Editor | Author
Area of Expertise:
EUV Lithography , EUV Source , EUV Blank , EUV Mask , Optics of EUV , EUV Mask Infra
Publications (35)

Proceedings Article | 24 March 2017 Open Access Presentation + Paper
Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam
Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 28 July 2014 Paper
Proceedings Volume 9256, 92560I (2014) https://doi.org/10.1117/12.2069991
KEYWORDS: Ruthenium, Silicon, Extreme ultraviolet, Finite element methods, Interfaces, Oxides, Oxygen, Neodymium, Photomasks, Oxidation

Proceedings Article | 17 April 2014 Paper
Suyoung Lee, Jungyoup Kim, Soo-Wan Koh, Ilyong Jang, Jaehyuck Choi, Hyungho Ko, Hwan-Seok Seo, Seong-Sue Kim, Byung Gook Kim, Chan-Uk Jeon
Proceedings Volume 9048, 90480J (2014) https://doi.org/10.1117/12.2046556
KEYWORDS: Ruthenium, Ultraviolet radiation, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Photomasks, Silica, Scanning electron microscopy, Annealing, Oxygen

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482V (2014) https://doi.org/10.1117/12.2046623
KEYWORDS: Pellicles, Critical dimension metrology, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Ruthenium, Lithography, Carbon, Computer simulations

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90482D (2014) https://doi.org/10.1117/12.2046202
KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Photomasks, Extreme ultraviolet lithography, Silicon, Thin films, Absorption, Optical simulations, Lithography

Proceedings Article | 17 April 2014 Paper
Chang-Min Park, Insung Kim, Sang-Hyun Kim, Dong-Wan Kim, Myung-Soo Hwang, Soon-Nam Kang, Cheolhong Park, Hyun-Woo Kim, Jeong-Ho Yeo, Seong-Sue Kim
Proceedings Volume 9048, 90480S (2014) https://doi.org/10.1117/12.2046132
KEYWORDS: Deep ultraviolet, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scanners, Pellicles, Reflectivity, Semiconducting wafers, Particles, Etching

Proceedings Article | 18 March 2014 Paper
Proceedings Volume 9048, 90482A (2014) https://doi.org/10.1117/12.2046171
KEYWORDS: Pellicles, Contamination, Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Carbon, Extreme ultraviolet, Lithography, Absorption, Silicon

Proceedings Article | 28 June 2013 Paper
Proceedings Volume 8701, 870111 (2013) https://doi.org/10.1117/12.2028069
KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Critical dimension metrology, Data modeling, Calibration, Extreme ultraviolet, Extreme ultraviolet lithography, Printing, Inspection

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 867903 (2013) https://doi.org/10.1117/12.2011076
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Cadmium, Neodymium, Ions, Wafer-level optics

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86790H (2013) https://doi.org/10.1117/12.2011493
KEYWORDS: Semiconducting wafers, Double positive medium, Photomasks, Printing, Extreme ultraviolet, Extreme ultraviolet lithography, Transmission electron microscopy, Critical dimension metrology, Inspection, Software development

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86791M (2013) https://doi.org/10.1117/12.2013209
KEYWORDS: Data modeling, Reflectivity, Diffraction, Photomasks, Scatter measurement, Calibration, Extreme ultraviolet, Molybdenum, Silicon, Ruthenium

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83220A (2012) https://doi.org/10.1117/12.916052
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Scanning electron microscopy, Scanners, Lithography, Photoresist processing, Semiconductors

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83220K (2012) https://doi.org/10.1117/12.916021
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Bismuth, Defect inspection, High volume manufacturing, Defect detection, Semiconductors

Proceedings Article | 26 March 2011 Paper
Sungmin Huh, In-Yong Kang, Sang-Hyun Kim, Hwan-seok Seo, Dongwan Kim, Jooon Park, Seong-Sue Kim, Han-Ku Cho, Kenneth Goldberg, Iacopo Mochi, Tsutomu Shoki, Gregg Inderhees
Proceedings Volume 7969, 796902 (2011) https://doi.org/10.1117/12.879384
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Wafer inspection, Semiconducting wafers, Defect detection, Defect inspection, Extreme ultraviolet lithography, Manufacturing, Particles

Proceedings Article | 26 May 2010 Paper
Han-Shin Lee, Jaehyuck Choi, DonGun Lee, Hyungho Ko, SeongSu Kim, Chan-Uk Jeon, HanKu Cho
Proceedings Volume 7748, 774804 (2010) https://doi.org/10.1117/12.868292
KEYWORDS: Carbon, Extreme ultraviolet lithography, Ions, Extreme ultraviolet, Contamination, Photomasks, Reflectivity, Ruthenium, Air contamination, Optical lithography

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76362K (2010) https://doi.org/10.1117/12.846895
KEYWORDS: Surface roughness, Extreme ultraviolet lithography, Reflectivity, Photomasks, Carbon, Extreme ultraviolet, Ruthenium, Image processing, Contamination, Optical lithography

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76361B (2010) https://doi.org/10.1117/12.847956
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet lithography, Defect inspection, Extreme ultraviolet, Critical dimension metrology, Visibility, Ion beams, Atomic force microscopy, Semiconducting wafers

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360X (2010) https://doi.org/10.1117/12.847955
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Lithography, Inspection, Line width roughness, Scanners, Critical dimension metrology, Electroluminescence

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72732D (2009) https://doi.org/10.1117/12.814108
KEYWORDS: Line edge roughness, Line width roughness, Photoresist processing, Lithography, Polymers, Surface roughness, Diffusion, Glasses, Extreme ultraviolet lithography, Monte Carlo methods

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72732E (2009) https://doi.org/10.1117/12.814055
KEYWORDS: Line edge roughness, Monte Carlo methods, Extreme ultraviolet lithography, Diffusion, Molecules, Extreme ultraviolet, Image processing, Lithography, Polymers, Line width roughness

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727143 (2009) https://doi.org/10.1117/12.814031
KEYWORDS: Lithographic illumination, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Optical lithography, Lithography, Reflectivity, Coherence (optics), Resolution enhancement technologies

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72710D (2009) https://doi.org/10.1117/12.813932
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Silicon, Semiconducting wafers, Ruthenium, Extreme ultraviolet, Reflectivity, Phase shifts, Refractive index

Proceedings Article | 17 October 2008 Paper
Su-Young Lee, Geun-Bae Kim, Hong-Seok Sim, Sang-Hyeon Lee, Hwa-Sung Kim, Jung-Hwan Lee, Hwan-Seok Seo, Hak-Seung Han, Seong-Sue Kim, Seong-Yong Moon, Sang-Gyun Woo, Ron Bozak, Andrew Dinsdale, Tod Robinson, David Lee, HanKu Cho
Proceedings Volume 7122, 71222I (2008) https://doi.org/10.1117/12.801415
KEYWORDS: Photomasks, Extreme ultraviolet, Error analysis, Extreme ultraviolet lithography, Scanning electron microscopy, Semiconducting wafers, Diffractive optical elements, Image processing, Critical dimension metrology, Factor analysis

Proceedings Article | 27 March 2008 Paper
Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412
KEYWORDS: Photomasks, Carbon, Contamination, Ruthenium, Extreme ultraviolet lithography, Silicon, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Semiconducting wafers

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65182U (2007) https://doi.org/10.1117/12.711389
KEYWORDS: Photomasks, Overlay metrology, Semiconducting wafers, Optical alignment, Image processing, Photoresist materials, Semiconductors, Image quality, Scanners, Lithography

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65182D (2007) https://doi.org/10.1117/12.711277
KEYWORDS: Overlay metrology, Optical alignment, Antireflective coatings, Image analysis, Coating, Semiconductors, Image quality, Finite-difference time-domain method, Optical lithography, Semiconducting wafers

Proceedings Article | 21 March 2007 Paper
Hwan-Seok Seo, Jinhong Park, Seung-Yoon Lee, Joo-On Park, Hun Kim, Seong-Sue Kim, Han-Ku Cho
Proceedings Volume 6517, 65171G (2007) https://doi.org/10.1117/12.713301
KEYWORDS: Reflectivity, Silicon, Ruthenium, Photomasks, Extreme ultraviolet lithography, Extreme ultraviolet, Molybdenum, Multilayers, Refractive index, Ion beams

Proceedings Article | 20 March 2007 Paper
Proceedings Volume 6517, 651723 (2007) https://doi.org/10.1117/12.713303
KEYWORDS: Stray light, Photomasks, Image quality, Light scattering, Extreme ultraviolet lithography, Extreme ultraviolet, Line width roughness, Reticles, Lithography, Reflectivity

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63491K (2006) https://doi.org/10.1117/12.688623
KEYWORDS: Critical dimension metrology, Scatterometry, Polarization, Diffraction, Diffraction gratings, Metrology, Scatter measurement, Overlay metrology, Magnetism, Light scattering

Proceedings Article | 20 May 2006 Paper
Jinhong Park, Seong-Sue Kim, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 6283, 62833E (2006) https://doi.org/10.1117/12.681833
KEYWORDS: Inspection, Photomasks, Confocal microscopy, Extreme ultraviolet, Semiconducting wafers, Reflectivity, Defect detection, Deep ultraviolet, Visible radiation, Imaging systems

Proceedings Article | 23 March 2006 Paper
Seong-Sue Kim, Jinhong Park, Roman Chalykh, Jiehun Kang, SukJoo Lee, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 6151, 61511C (2006) https://doi.org/10.1117/12.656221
KEYWORDS: Confocal microscopy, Photomasks, Extreme ultraviolet, Smoothing, Defect inspection, Microscopes, Data modeling, Molybdenum, Silicon, Extreme ultraviolet lithography

Proceedings Article | 12 May 2005 Paper
Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598655
KEYWORDS: Fiber optic illuminators, Reticles, Semiconducting wafers, Image sensors, Photoresist materials, Overlay metrology, Optical lithography, Scanners, Optics manufacturing, Metrology

Proceedings Article | 10 May 2005 Paper
Roman Chalykh, Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601142
KEYWORDS: Optical alignment, Diffraction, Diffraction gratings, Overlay metrology, Image quality, Silica, Finite-difference time-domain method, Near field, Extreme ultraviolet, Signal processing

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600459
KEYWORDS: Photomasks, Defect inspection, Extreme ultraviolet lithography, Confocal microscopy, Near field, Inspection, Fourier optics, Near field optics, Projection systems, Light sources

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534836
KEYWORDS: Immersion lithography, Lithography, Polarization, Scattering, Wavefronts, Reflectivity, Water, Wave propagation, Photomasks, Infrared imaging

Showing 5 of 35 publications
Proceedings Volume Editor (2)

SPIE Conference Volume | 2 December 2024

SPIE Conference Volume | 4 December 2023

Conference Committee Involvement (14)
Photomask Technology 2024
30 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Extreme Ultraviolet (EUV) Lithography XII
22 February 2021 | Online Only, California, United States
Extreme Ultraviolet (EUV) Lithography XI
24 February 2020 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Showing 5 of 14 Conference Committees
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