Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Roman Chalykh; Seong-Sue Kim; Sang-Gyun Woo; Han-Ku Cho; Joo-Tae Moon

doi:10.1117/12.601142

10 May 2005 Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)

Roman Chalykh, Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.601142
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Simulation works are reported for the optimization of alignment mark geometries to enhance the magnitude of alignment signal and to improve precision of alignment and overlay process. Modeling of diffraction of electromagnetic wave on alignment mark is based on rigorous coupled-wave analysis (RCWA). This simulation allows calculating of overlay signal and optimizing of alignment mark. Using of RCWA approach significantly decreases computational time and required memory size comparing with FDTD. Overlay signal is usually measured using one of the diffraction orders. Thus the great advantage of using RCWA instead of FDTD is possibility to find amplitude of this diffracted order directly.

Citation Download Citation

Roman Chalykh, Seong-Sue Kim, Sang-Gyun Woo, Han-Ku Cho, and Joo-Tae Moon "Optimization of geometry of alignment mark using rigorous coupled-wave analysis (RCWA)", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.601142

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