Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko; Guk-Jin Kim; Michael Yeung; Eytan Barouch; Mun-Ja Kim; Seung-Sue Kim; Hye-Keun Oh

doi:10.1117/12.2046202

17 April 2014 Aerial image of mesh supported extreme ultraviolet pellicle

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, Hye-Keun Oh

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90482D (2014) https://doi.org/10.1117/12.2046202
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

We report the effect of the mesh support for the EUV pellicle on the wafer pattern image. The intensity distribution passing through the meshed pellicle was simulated with a partially coherent EUV beam showing that its non-uniformity and the CD uniformity are increased with the mesh width. In order to reduce a non-uniformity of the intensity distribution and CD uniformity, the mesh width should be narrower and the height becomes smaller as well. Thus, the image deformation on the wafer due to the mesh can be avoided by optimizing the mesh structure and thus the pellicle with the mesh support can be used for the EUV lithography.

Citation Download Citation

Ki-ho Ko, Guk-Jin Kim, Michael Yeung, Eytan Barouch, Mun-Ja Kim, Seung-Sue Kim, and Hye-Keun Oh "Aerial image of mesh supported extreme ultraviolet pellicle", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90482D (17 April 2014); https://doi.org/10.1117/12.2046202

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