Prof. Hiroo Kinoshita Profile

Prof. Hiroo Kinoshita

at Univ of Hyogo

SPIE Involvement:

Author

Publications (55)

Proceedings Article | 11 September 2020 Presentation

Presentation

Pulse width dependence of laser-induced damage thresholds on silica glasses by soft X-ray lasers

Katsuhiro Mikami, Masahiko Ishino, Thanh-Hung Dinh, Shinji Motokoshi, Noboru Hasegawa, Akira Kon, Yuichi Inubushi, Shigeki Owada, Hiroo Kinoshita, Masaharu Nishikino

Proceedings Volume 11514, 115141E (2020) https://doi.org/10.1117/12.2570991

KEYWORDS: Silica, Glasses, X-ray lasers, Laser induced damage, X-rays, Laser damage threshold, Femtosecond phenomena, Dielectrics, High power lasers, Laser systems engineering

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Proceedings Article | 18 March 2016 Paper

Paper

EUV resist outgassing analysis for the new platform resists at EIDEC

Eishi Shiobara, Yukiko Kikuchi, Shinji Mikami, Takeshi Sasami, Takashi Kamizono, Shinya Minegishi, Takakazu Kimoto, Toru Fujimori, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita, Satoshi Tanaka

Proceedings Volume 9776, 97762H (2016) https://doi.org/10.1117/12.2219424

KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Metals, Hydrogen, Chemical elements, Mirrors, Reflectivity, Zirconium, Aluminum, Silicon, Germanium

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The suppression of outgassing from the EUV resist is one of the significant challenges, which has to be addressed for realizing EUV lithography (EUVL). The outgassing might be the main contributor involved in the contamination of the mirror optics in scanners. This may result in reflectivity losses. The pragmatic outgassing test that utilizes the witness sample (WS) was used as a general method to quantify the outgassing level for commercially available chemically amplified resists (CAR). There are two types of contaminations. The first type of contamination involves a cleanable contamination that mainly comprises hydrocarbons that can be removed by the hydrogen radical cleaning. Another type of contamination includes the noncleanable contamination that remains on the WS even after hydrogen radical cleaning. Several outgas qualification results were evaluated at the EIDEC [1, 2]. The data indicated that contaminations by the CAR mainly comprised the cleanable contaminations. The data also indicated that there were almost negligible noncleanable contaminations from the CAR. EUV resist communities accelerate the development of high sensitivity resists to compensate the low power of the EUV source. Nonchemically amplified resist (nonCAR) with a new platform is a candidate for high sensitivity resists. The nonCAR includes some types of metal elements with high absorbance for EUV light. There is very limited research on the outgassing characteristics of the nonCAR. In this study, we considered an EUV exposure process in the actual EUV scanner and EUV resists were exposed in a hydrogen environment. A potential risk could result from the reaction of the hydrogen radicals generated by the EUV light with the metal elements in the nonCAR and the metal hydride outgases from the resist. This would result in a noncleanable contamination on the EUV mirror [3]. The knowledge with respect to outgassing from an organic metal complex is insufficient even in a vacuum condition. Hence, the study involved the preparation of certain types of organic metal complexes as model materials. Then, the outgassing evaluations for the materials were carried out as a fundamental studies in a vacuum condition. The results were reported in this study.

SPIE Journal Paper | 18 February 2016

Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

JM3, Vol. 15, Issue 02, 021007, (February 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021007

KEYWORDS: Extreme ultraviolet, Microscopes, Diffraction, Extreme ultraviolet lithography, Photomasks, CCD cameras, Phase imaging, Scatterometry, Reflection, Coherence imaging

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Proceedings Article | 9 November 2015 Paper

Paper

Phase imaging results of phase defect using micro coherent EUV scatterometry microscope

Tetsuo Harada, Hiraku Hashimoto, Tsuyoshi Amano, Hiroo Kinoshita, Takeo Watanabe

Proceedings Volume 9635, 96351E (2015) https://doi.org/10.1117/12.2205304

KEYWORDS: Microscopes, Extreme ultraviolet, Phase contrast, Phase imaging, Extreme ultraviolet lithography, Coherence imaging, Diffraction, Photomasks, CCD cameras, Reconstruction algorithms, Reflection

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Proceedings Article | 9 July 2015 Paper

Paper

Development of a reflectometer for a large EUV mirror in NewSUBARU

Haruki Iguchi, Hiraku Hashimoto, Masaki Kuki, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9658, 965819 (2015) https://doi.org/10.1117/12.2199014

KEYWORDS: Reflectometry, Mirrors, Extreme ultraviolet, Reflectivity, Photomasks, Spherical lenses, Switching, Multilayers, Extreme ultraviolet lithography, Synchrotrons

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Proceedings Article | 9 July 2015 Paper

Paper

EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source

Takahiro Fujino, Yusuke Tanaka, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9658, 965818 (2015) https://doi.org/10.1117/12.2194253

KEYWORDS: Extreme ultraviolet, Diffraction, Photomasks, Mirrors, Extreme ultraviolet lithography, Microscopes, 3D metrology, CCD cameras, Relays, Scatterometry

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Proceedings Article | 13 March 2015 Paper

Paper

Study of Dill's B parameter measurement of EUV resist

Atsushi Sekiguchi, Yoko Matsumoto, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9422, 94222L (2015) https://doi.org/10.1117/12.2082883

KEYWORDS: Transmittance, Extreme ultraviolet, Absorption, Coating, Hybrid fiber optics, Extreme ultraviolet lithography, Electrons, Absorbance, Chemical species, Silicon

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Proceedings Article | 13 March 2015 Paper

Paper

Analysis of EUV resist outgassing depended on the dosage

E. Shiobara, I. Takagi, Y. Kikuchi, T. Sasami, S. Minegishi, T. Fujimori, T. Watanabe, T. Harada, H. Kinoshita, S. Inoue

Proceedings Volume 9422, 942210 (2015) https://doi.org/10.1117/12.2085692

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Mirrors, Reflectivity, Systems modeling, Spectroscopy, Data modeling, Scanners, EUV optics

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SPIE Journal Paper | 24 June 2014 Open Access

Open Access

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

JM3, Vol. 13, Issue 02, 023012, (June 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023012

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, Phase measurement, Scanning probe microscopes, Optical lithography

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Proceedings Article | 17 April 2014 Paper

Paper

At-wavelength observation of phase defect using focused lensless microscope

Tetsuo Harada, Yusuke Tanaka, Tsuyoshi Amano, Youichi Usui, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9048, 90483F (2014) https://doi.org/10.1117/12.2050936

KEYWORDS: Extreme ultraviolet, Scattering, Multilayers, Speckle, Diffraction, Microscopes, Extreme ultraviolet lithography, Photomasks, CCD cameras, Glasses

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Proceedings Article | 17 April 2014 Paper

Paper

At wavelength observation of phase defect embedded in EUV mask using microscope technique

Tsuneo Terasawa, Tsuyoshi Amano, Takeshi Yamane, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9048, 904825 (2014) https://doi.org/10.1117/12.2046156

KEYWORDS: Extreme ultraviolet, Photomasks, Microscopes, Semiconducting wafers, EUV optics, Extreme ultraviolet lithography, Mirrors, Inspection, Critical dimension metrology, Lithography

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Proceedings Article | 17 April 2014 Paper

Paper

Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinosihta

Proceedings Volume 9048, 904827 (2014) https://doi.org/10.1117/12.2046164

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Scanning probe microscopy, Multilayers, Quartz, Transmission electron microscopy, Extreme ultraviolet lithography, EUV optics, Semiconducting wafers

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Proceedings Article | 17 April 2014 Paper

Paper

Correlation study on resist outgassing between EUV and e-beam irradiation

Yukiko Kikuchi, Kazuhiro Katayama, Isamu Takagi, Norihiko Sugie, Toshiya Takahashi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita

Proceedings Volume 9048, 90482W (2014) https://doi.org/10.1117/12.2046636

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Carbon, Molecules, Semiconducting wafers, Electrons, Protactinium, Statistical modeling, Statistical analysis

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Proceedings Article | 17 April 2014 Paper

Paper

Contribution of EUV resist components to the non-cleanable contaminations

Eishi Shiobara, Toshiya Takahashi, Norihiko Sugie, Yukiko Kikuchi, Isamu Takagi, Kazuhiro Katayama, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuro Harada, Hiroo Kinoshita

Proceedings Volume 9048, 904819 (2014) https://doi.org/10.1117/12.2046215

KEYWORDS: Contamination, Sulfur, Iodine, Extreme ultraviolet, Chlorine, Bromine, Extreme ultraviolet lithography, Hydrogen, Reflectivity, Protactinium

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Proceedings Article | 30 September 2013 Paper

Paper

Development of coherent EUV scatterometry microscope with high-order harmonic for EUV mask inspection

Yutaka Nagata, Tetsuo Harada, Masato Nakasuji, Hiroo Kinoshita, Katsumi Midorikawa

Proceedings Volume 8849, 884914 (2013) https://doi.org/10.1117/12.2023880

KEYWORDS: Diffraction, Extreme ultraviolet, Photomasks, Inspection, Extreme ultraviolet lithography, Light sources, Mirrors, Scatterometry, Microscopes, Pulsed laser operation

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Proceedings Article | 20 September 2013 Paper

Paper

Extreme ultraviolet mask defect observation using an extreme ultraviolet microscope

Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8880, 88802I (2013) https://doi.org/10.1117/12.2030819

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Semiconducting wafers, Scanning probe microscopy, Extreme ultraviolet lithography, Scanning electron microscopy, Critical dimension metrology, Reflectivity, Lithography

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Proceedings Article | 28 June 2013 Paper

Paper

Phase imaging of EUV masks using a lensless EUV microscope

Tetsuo Harada, Masato Nakasuji, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8701, 870119 (2013) https://doi.org/10.1117/12.2027283

KEYWORDS: Extreme ultraviolet, Photomasks, Diffraction, Microscopes, Extreme ultraviolet lithography, CCD cameras, Phase imaging, Mirrors, Lithography, Coherence imaging

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Proceedings Article | 1 April 2013 Paper

Paper

Study of EUV outgassing spatial distribution toward witness plate in the EUV outgas tester

Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Isamu Takagi, Kazuhiro Katayama, Norihiko Sugie, Toshiya Takahashi, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita

Proceedings Volume 8679, 86790M (2013) https://doi.org/10.1117/12.2011709

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Monte Carlo methods, Fluorine, Extreme ultraviolet lithography, Molecules, Contamination, Chemical species, Ions, Mirrors

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Proceedings Article | 30 June 2012 Paper

Paper

Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source

Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Yutaka Nagata, Hiroo Kinoshita

Proceedings Volume 8441, 84411I (2012) https://doi.org/10.1117/12.952477

KEYWORDS: Extreme ultraviolet, Diffraction, Mirrors, CCD cameras, Microscopes, Extreme ultraviolet lithography, Photomasks, Scatterometry, Zirconium, Optical filters

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Proceedings Article | 23 March 2012 Paper

Paper

Resist outgassing characterization for qualification in high power EUV lithography

Toshiya Takahashi, Norihiko Sugie, Kazuhiro Katayama, Isamu Takagi, Yukiko Kikuchi, Eishi Shiobara, Hiroyuki Tanaka, Soichi Inoue, Takeo Watanabe, Tetsuo Harada, Hiroo Kinoshita

Proceedings Volume 8322, 83221E (2012) https://doi.org/10.1117/12.916347

KEYWORDS: Contamination, Extreme ultraviolet, Carbon, Light sources, Fluorine, Extreme ultraviolet lithography, Polymers, Semiconducting wafers, Chemical elements, Electron beams

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Proceedings Article | 14 October 2011 Paper

Paper

Printability of native blank defects and programmed defects and their stack structures

Hyuk Joo Kwon, Jenah Harris-Jones, Ranganath Teki, Aaron Cordes, Toshio Nakajima, Iacopo Mochi, Kenneth Goldberg, Yuya Yamaguchi, Hiroo Kinoshita

Proceedings Volume 8166, 81660H (2011) https://doi.org/10.1117/12.897165

KEYWORDS: Inspection, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Signal detection, Electron beam lithography, Deep ultraviolet, Multilayers, 3D modeling, Quartz

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Proceedings Article | 4 May 2011 Paper

Paper

Multilayers for next generation EUVL at 6.X nm

Yuriy Platonov, Jim Rodriguez, Michael Kriese, Eric Gullikson, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8076, 80760N (2011) https://doi.org/10.1117/12.889519

KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Lanthanum, Multilayers, Extreme ultraviolet, Mirrors, Sputter deposition, Laser beam diagnostics, Boron, X-ray optics

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Proceedings Article | 22 April 2011 Paper

Paper

The coherent EUV scatterometry microscope for actinic mask inspection and metrology

Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8081, 80810K (2011) https://doi.org/10.1117/12.896576

KEYWORDS: Photomasks, Extreme ultraviolet, Diffraction, Inspection, Extreme ultraviolet lithography, CCD cameras, Microscopes, Scatterometry, Metrology, Mirrors

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Proceedings Article | 8 April 2011 Paper

Paper

Relationships between EUV resist outgassing and contamination deposition at Selete

Hiroaki Oizumi, Kazuyuki Matsumaro, Satoshi Nomura, Julius Joseph Santillan, Toshiro Itani, Takeo Watanabe, Naohiro Matsuda, Tetsuo Harada, Hiroo Kinoshita

Proceedings Volume 7969, 796921 (2011) https://doi.org/10.1117/12.878571

KEYWORDS: Contamination, Extreme ultraviolet, Extreme ultraviolet lithography, Mirrors, Spectroscopy, Photography, Statistical analysis, Protactinium, Optical components, Line width roughness

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Proceedings Article | 11 May 2009 Paper

Paper

Actinic mask inspection using an extreme ultraviolet microscope

Kei Takase, Yoshito Kamaji, Takafumi Iguchi, Takashi Sugiyama, Toshiyuki Uno, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 7379, 73792J (2009) https://doi.org/10.1117/12.824333

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, X-rays, Extreme ultraviolet lithography, Microscopes, X-ray optics, Sensors, Glasses, X-ray imaging

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Proceedings Article | 1 April 2009 Paper

Paper

Decomposition analysis of molecular resists to further CD control

Daiju Shiono, Hideo Hada, Taku Hirayama, Junichi Onodera, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 7273, 727330 (2009) https://doi.org/10.1117/12.815173

KEYWORDS: Surface roughness, Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Coating, Molecules, Chemical analysis, Atomic force microscopy, Light sources, Spectroscopy

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Proceedings Article | 1 April 2009 Paper

Paper

Evaluation of novel resist materials for EUV lithography

Ichihiro Aratani, Shuji Matsunaga, Tsuyoshi Kajiyashiki, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 7273, 72731Z (2009) https://doi.org/10.1117/12.813586

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Chemical species, Absorption, Oxygen, Sulfur, Semiconducting wafers, Carbon, Hydrogen

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Proceedings Article | 27 March 2008 Paper

Paper

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Sungmin Huh, Hoon Kim, Gisung Yoon, Jaehyuck Choi, Han-Shin Lee, Dong Gun Lee, Byungsup Ahn, Hwan-Seok Seo, Dongwan Kim, Seoung Sue Kim, Han Ku Cho, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6921, 692115 (2008) https://doi.org/10.1117/12.772412

KEYWORDS: Photomasks, Carbon, Contamination, Ruthenium, Extreme ultraviolet lithography, Silicon, Critical dimension metrology, Reflectivity, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 26 March 2008 Paper

Paper

Development of partially fluorinated EUV-resist polymers for LER and sensitivity improvement

Takashi Sasaki, Osamu Yokokoji, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6923, 692347 (2008) https://doi.org/10.1117/12.772542

KEYWORDS: Polymers, Extreme ultraviolet lithography, Fluorine, Line edge roughness, Extreme ultraviolet, Etching, Chemical species, Polymerization, Spectroscopy, Lithography

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Proceedings Article | 26 March 2008 Paper

Paper

Development of novel positive-tone resists for EUVL

Takanori Owada, Takeo Watanabe, Hiroo Kinoshita, Hiroaki Oizumi, Iwao Nishiyama

Proceedings Volume 6923, 692346 (2008) https://doi.org/10.1117/12.772404

KEYWORDS: Extreme ultraviolet lithography, Line edge roughness, Etching, Extreme ultraviolet, Glasses, Molecules, Lithography, Polymers, Optical lithography, Synchrotrons

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Proceedings Article | 21 March 2007 Paper

Paper

Development of optical component for EUV phase-shift microscopes

Yoshio Mizuta, Masafumi Osugi, Jyunki Kishimoto, Noriyuki Sakaya, Kazuhiro Hamamoto, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6517, 651733 (2007) https://doi.org/10.1117/12.711997

KEYWORDS: Beam splitters, Silicon, Multilayers, Argon, Molybdenum, Silicon films, Protactinium, Extreme ultraviolet, Reflectivity, Mirrors

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Proceedings Article | 29 March 2006 Paper

Paper

Optimization of photoacid generator in CA resist for EUVL

Takeo Watanabe, Hideo Hada, Hiroo Kinoshita, Yuzuru Tanaka, Hideaki Shiotani, Yasuyuki Fukushima, Hiroji Komano

Proceedings Volume 6153, 615343 (2006) https://doi.org/10.1117/12.656266

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, FT-IR spectroscopy, Ions, Line edge roughness, Polymers, Spectroscopy, Mass spectrometry, Annealing, Electron beams

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Proceedings Article | 23 March 2006 Paper

Paper

Phase defect observation using an EUV microscope

Kazuhiro Hamamoto, Yuzuru Tanaka, Takahiro Yoshizumi, Yasuyuki Fukushima, Hideaki Shiotani, Noriyuki Sakaya, Morio Hosoya, Tsutomu Shoki, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 6151, 615119 (2006) https://doi.org/10.1117/12.655430

KEYWORDS: Extreme ultraviolet, Microscopes, Photomasks, Multilayers, X-ray optics, X-rays, Extreme ultraviolet lithography, Inspection, EUV optics, Glasses

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Proceedings Article | 20 May 2004 Paper

Paper

Evaluation of resist outgassing by EUV irradiation

Hideo Hada, Takeo Watanabe, Kazuhiko Hamamoto, Hiroo Kinoshita, Hiroshi Komano

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534972

KEYWORDS: Polymers, Extreme ultraviolet, Protactinium, Extreme ultraviolet lithography, Chemical species, Carbon, Lithography, Reflectivity, Spectroscopy, Electroluminescence

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Proceedings Article | 28 August 2003 Paper

Paper

Pattern inspection of EUV mask using an EUV microscope

Takeo Watanabe, Tsuneyuki Haga, Tsutomu Shoki, Kazuhiro Hamamoto, Shintaro Takada, Naoki Kazui, Satoshi Kakunai, Harushige Tsubakino, Hiroo Kinoshita

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504240

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Microscopes, Inspection, Scanning electron microscopy, Multilayers, Mask making, Dry etching, Surface roughness

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Proceedings Article | 1 July 2002 Paper

Paper

Fine pattern replication on 10 x 10-mm exposure area using ETS-1 laboratory tool in HIT

K. Hamamoto, Takeo Watanabe, Hideo Hada, Hiroshi Komano, Shinji Kishimura, Shinji Okazaki, Hiroo Kinoshita

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472272

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Wafer-level optics, Chemically amplified resists, Mirrors, Chromium, Edge roughness, Silicon, Scanning electron microscopy

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Proceedings Article | 20 December 2001 Paper

Paper

Current status of ASET-HIT EUV phase-shifting point diffraction interferometer

Yoshio Gomei, Katsumi Sugisaki, Yucong Zhu, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450962

KEYWORDS: Extreme ultraviolet, Diffraction gratings, Diffraction, Phase shifts, Mirrors, Fringe analysis, CCD cameras, Point diffraction interferometers, Optical testing, Tantalum

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Proceedings Article | 5 September 2001 Paper

Paper

Performance of Cr mask for extreme-ultraviolet lithography

Hajime Nii, Hiroo Kinoshita, Takeo Watanabe, K. Hamamoto, H. Tsubakino, Y. Sugie

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438367

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Chromium, Lithography, Multilayers, Extreme ultraviolet, Semiconducting wafers, Mask making, Coating, Plasma

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Proceedings Article | 5 September 2001 Paper

Paper

EUV mask cleaning by dry and wet processes

Hajime Nii, Hiroo Kinoshita, Takeo Watanabe, Y. Matsuo, Y. Sugie

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438368

KEYWORDS: Photomasks, Contamination, Multilayers, Silicon, Ozone, Extreme ultraviolet lithography, Surface roughness, X-ray diffraction, Chromium, High power microwaves

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Proceedings Article | 8 November 2000 Paper

Paper

Present status of the ASET at-wavelength phase-shifting point diffraction interferometer

Katsumi Sugisaki, Yucong Zhu, Yoshio Gomei, Masahito Niibe, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 4146, (2000) https://doi.org/10.1117/12.406675

KEYWORDS: Visible radiation, Extreme ultraviolet, Mirrors, Wavefronts, Interferometers, Information technology, Interferometry, Point diffraction interferometers, Phase shifts, Optical testing

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Proceedings Article | 21 July 2000 Paper

Paper

Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography

Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Shigeo Irie, Shigeru Shirayone, Shigeyasu Mori, Ei Yano, Hideo Hada, Katsumi Ohmori, Hiroshi Komano

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390100

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Chemically amplified resists, Lithography, Image resolution, Wafer-level optics, Mirrors, Photomasks, Scanning electron microscopy, Ultraviolet radiation

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Proceedings Article | 21 July 2000 Paper

Paper

Recent advances of three-aspherical-mirror system for EUVL

Hiroo Kinoshita, Takeo Watanabe, Yanqiu Li, Atsushi Miyafuji, Tetsuya Oshino, Katsumi Sugisaki, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

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Proceedings Article | 21 July 2000 Paper

Paper

Design of EUVL camera with large numerical aperture

Yanqiu Li, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390115

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Wafer-level optics, Distortion, Optical design, Cameras, Semiconducting wafers, Modulation transfer functions, Monochromatic aberrations, Diffraction

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Proceedings Article | 21 July 2000 Paper

Paper

Development for the alignment procedure of three-aspherical mirror optics

Shigeo Irie, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390122

KEYWORDS: Mirrors, Alignment procedures, NOx, Tolerancing, Extreme ultraviolet lithography, Optical alignment, Interferometers, Ray tracing, Monochromatic aberrations, Geometrical optics

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Proceedings Article | 21 July 2000 Paper

Paper

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Shigeo Irie, Shigeru Shirayone

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390114

KEYWORDS: Mirrors, Optical alignment, Extreme ultraviolet, Projection systems, Extreme ultraviolet lithography, Wavefronts, Tolerancing, Assembly tolerances, Monochromatic aberrations, Multilayers

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Proceedings Article | 23 November 1999 Paper

Paper

Progress in the development of three-aspherical mirror optics for EUVL

Hiroo Kinoshita, Takeo Watanabe, Daniel Bajuk, Jay Daniel, Yachiyo Kimpara, Michael Kriese, Yuriy Platonov

Proceedings Volume 3767, (1999) https://doi.org/10.1117/12.371114

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Multilayers, Reflectivity, Coating, Surface finishing, Polishing, Phase interferometry, Interferometers, Semiconducting wafers

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Proceedings Article | 13 November 1998 Paper

Paper

Fabrication of an aspherical mirror for extreme-ultraviolet lithography (EUVL) optics

Masahito Niibe, Atsushi Miyafuji, Hiroo Kinoshita, Takeo Watanabe, Shozo Inoue, Keiji Koterazawa

Proceedings Volume 3447, (1998) https://doi.org/10.1117/12.331127

KEYWORDS: Multilayers, Mirrors, Extreme ultraviolet lithography, Surface roughness, Argon, Cameras, Aspheric lenses, Molybdenum, Reflectivity, Silicon

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Proceedings Article | 13 November 1998 Paper

Paper

Design of a LIGA beamline using a multilayer-coated reflection mirror

Hiroo Kinoshita, Yachiyo Kimpara, T. Uruga, Takeo Watanabe, Masahito Niibe, Yuriy Platonov, James Wood

Proceedings Volume 3447, (1998) https://doi.org/10.1117/12.331117

KEYWORDS: Mirrors, Reflectivity, Multilayers, Platinum, Coating, X-rays, Reflection, X-ray lithography, Silicon carbide, X-ray optics

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Proceedings Article | 1 September 1998 Paper

Paper

Mask technology of extreme-ultraviolet lithography

Hiroo Kinoshita, Takeo Watanabe, Akira Ozawa, Masahito Niibe

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328848

KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Chromium, Tantalum, Reflectivity, Etching, Inspection, Aluminum, Mask making

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Proceedings Article | 5 June 1998 Paper

Paper

Three-aspherical-mirror system for EUV lithography

Hiroo Kinoshita, Takeo Watanabe, Masahito Niibe, Masaaki Ito, H. Oizumi, Hiromasa Yamanashi, Katsuhiko Murakami, Tetsuya Oshino, Yuriy Platonov, Nicola Grupido

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309580

KEYWORDS: Semiconducting wafers, Wafer-level optics, Photomasks, Optical alignment, Mirrors, Extreme ultraviolet lithography, Synchrotron radiation, Tolerancing, Assembly tolerances, Optical design

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Proceedings Article | 1 November 1997 Paper

Paper

Design of imaging system for EUVL

Hiroo Kinoshita, Takeo Watanabe, Masato Koike, Takeshi Namioka

Proceedings Volume 3152, (1997) https://doi.org/10.1117/12.279373

KEYWORDS: Mirrors, Wafer-level optics, Semiconducting wafers, Tolerancing, Assembly tolerances, Photomasks, Extreme ultraviolet lithography, Optical design, Error analysis, Distortion

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Proceedings Article | 2 August 1995 Paper

Paper

Soft x-ray optics for synchrotron radiation

Takeshi Namioka, Masato Koike, Hiroo Kinoshita, Tsuneyuki Haga

Proceedings Volume 2576, (1995) https://doi.org/10.1117/12.215581

KEYWORDS: Mirrors, Tolerancing, Error analysis, Monochromators, Spectral resolution, X-ray optics, Extreme ultraviolet, Modulation transfer functions, Projection lithography, Assembly tolerances

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Proceedings Article | 1 February 1994 Paper

Paper

Thermal stability of Mo-based multilayer x-ray mirrors

Yoshikazu Ishii, Hisataka Takenaka, Tomoaki Kawamura, Tsuneyuki Haga, Hiroo Kinoshita

Proceedings Volume 2015, (1994) https://doi.org/10.1117/12.167991

KEYWORDS: Reflectivity, Annealing, X-rays, Mirrors, Thermal effects, Silicon, Molybdenum, Transmission electron microscopy, Crystals, Photomicroscopy

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Proceedings Article | 21 January 1993 Paper

Paper

Present and future requirements of soft x-ray projection lithography

Hiroo Kinoshita

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140589

KEYWORDS: Mirrors, Photomasks, Semiconducting wafers, Wafer-level optics, Reflectivity, X-rays, Projection lithography, Sputter deposition, X-ray lithography, Lithography

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Proceedings Article | 1 January 1991 Paper

Paper

Soft and hard x-ray reflectivities of multilayers fabricated by alternating-material sputter deposition

Hisataka Takenaka, Yoshikazu Ishii, Hiroo Kinoshita, Kenji Kurihara

Proceedings Volume 1345, (1991) https://doi.org/10.1117/12.23324

KEYWORDS: Multilayers, Reflectivity, Silicon, X-rays, Sputter deposition, Molybdenum, Hard x-rays, X-ray diffraction, Monochromators, Tungsten

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Showing 5 of 55 publications

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