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Takanori Owada
at Idemitsu Kosan Co Ltd
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Publications (3)
Proceedings Article | 23 March 2010 Paper
Development of novel positive-tone resists for EUVL
Takanori Owada, Hideaki Shiotani, Kayoko Aoyama, Takashi Kashiwamura, Mitsuru Shibata, Testuro Takeya, Hiroaki Oizumi, Toshiro Itani
Proceedings Volume 7636, 763632 (2010) https://doi.org/10.1117/12.846069
KEYWORDS: Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Line edge roughness, Line width roughness, Scanning electron microscopy, Electron beam lithography, Photoresist processing, Semiconductors, Electron beams
Proceedings Article | 1 April 2009 Paper
Development of novel positive-tone resists for EUVL
Takanori Owada, Akinori Yomogita, Takashi Kashiwamura, Toshiaki Kusaba, Shinji Miyamoto, Tetsuro Takeya
Proceedings Volume 7273, 72732R (2009) https://doi.org/10.1117/12.813631
KEYWORDS: Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Line width roughness, Electron beam lithography, Scanning electron microscopy, Photoresist processing, Electron beams, Silicon
Proceedings Article | 26 March 2008 Paper
Development of novel positive-tone resists for EUVL
Proceedings Volume 6923, 692346 (2008) https://doi.org/10.1117/12.772404
KEYWORDS: Extreme ultraviolet lithography, Line edge roughness, Etching, Extreme ultraviolet, Glasses, Molecules, Lithography, Polymers, Optical lithography, Synchrotrons
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