An X-ray standing wave technique was used to characterize the interface roughness of multilayer structures. Standing wave fields of X-rays in multilayers are described in terms of a modified optical matrix. To include the interface roughness effect, Fresnel reflectance and transmittance coefficients in the matrix were modified. A Ni/C multilayer with about 54 angstroms periods was analyzed by X-ray diffraction and by the X-ray standing wave technique. The ratio between second and third Bragg reflection peaks suggested an expansion of nickel layer thickness. The X-ray standing wave measurement showed a reduction of nickel layer density, suggesting the diffusion of nickel atoms and formation of nickel-carbon complex. Interface roughness was estimated to be about 10 angstroms from the calculation at 85% bulk density of nickel, suggesting the diffusion of nickel.
Mo-based multilayers show high reflectivities in the 8 - 20 nm region at normal incidence. We have evaluated the soft x-ray reflectivities and the effects of thermal annealing on both reflectivity and the layered structures of these Mo-based multilayers. The Cu-K (alpha) x-ray first-order Bragg-peak reflectivity of the Mo/Si multilayer markedly decreases at annealing temperatures above 400 degree(s)C. TEM observation reveals that the thermally induced deteriorations of Mo/B4C and Mo/SiC multilayers are smaller than those of the Mo/Si multilayer. The Mo/Si multilayer reflectivity at a wavelength of about 13 nm decreases greatly with 600 degree(s)C annealing. However, the Mo/B4C and Mo/SiC multilayers maintain higher reflectivities at the same wavelength. These results suggests that the Mo/B4C and Mo/SiC multilayers are superior to a Mo/Si multilayer in terms of thermal stability.
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