Dr. Tsutomu Shoki
at HOYA Corp
SPIE Involvement:
Author
Publications (30)

Proceedings Article | 18 September 2024 Paper
Daimu Ikeya, Yohei Ikebe, Tsutomu Shoki
Proceedings Volume 13273, 132730L (2024) https://doi.org/10.1117/12.3026940
KEYWORDS: Reflectivity, Extreme ultraviolet, Deep ultraviolet, Lithography, Design, Reflectometry, Multilayers, Extreme ultraviolet lithography, Reflection, Optical simulations

Proceedings Article | 26 August 2024 Paper
Takahiro Onoue, Yohei Ikebe, Hirofumi Kozakai, Haruka Amemiya, Tatsuya Sasaki, Ryotaro Takeuchi, Tsutomu Shoki
Proceedings Volume 13177, 1317702 (2024) https://doi.org/10.1117/12.3034338
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Tantalum, Multilayers, Resolution enhancement technologies, Optical properties, Hydrogen, EUV optics

Proceedings Article | 30 September 2021 Presentation
Ikuya Fukasawa, Yohei Ikebe, Takeshi Aizawa, Tsutomu Shoki, Takahiro Onoue
Proceedings Volume 11855, 118550N (2021) https://doi.org/10.1117/12.2606239

SPIE Journal Paper | 1 September 2017
Yohei Ikebe, Hirofumi Kozakai, Tsutomu Shoki, Takahiro Onoue
JM3, Vol. 16, Issue 04, 041006, (September 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041006
KEYWORDS: Reflectivity, Extreme ultraviolet, Nickel, Photomasks, Diffusion, Interfaces, Etching, Extreme ultraviolet lithography, Lithography, Thin films

Proceedings Article | 23 October 2015 Paper
Jaehyuck Choi, Jinsu Kim, Jeff Lowe, Davide Dattilo, Soowan Koh, Jun Yeol Choi, Uwe Dietze, Tsutomu Shoki, Byung Gook Kim, Chan-Uk Jeon
Proceedings Volume 9635, 96350C (2015) https://doi.org/10.1117/12.2197226
KEYWORDS: Extreme ultraviolet, Carbon, Photomasks, Extreme ultraviolet lithography, Ruthenium, Industrial chemicals, Particles, Scanning probe microscopy, Mask cleaning, Pellicles

Showing 5 of 30 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Showing 5 of 9 Conference Committees
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