Dr. Hyun-Woo Kim
Senior Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (37)

Proceedings Article | 9 April 2024 Poster + Paper
Gayoung Kim, Yejin Ku, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Yu Ha Jang, Byung Jun Jung, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Proceedings Volume 12957, 129571X (2024) https://doi.org/10.1117/12.3010812
KEYWORDS: Extreme ultraviolet lithography, Electron beam lithography, Extreme ultraviolet, Lithography, Film thickness, Thin films, Photons, Solubility, Silicon, Semiconducting wafers, Fluorine

Proceedings Article | 9 April 2024 Presentation + Paper
Yejin Ku, Gayoung Kim, Min Seung Kim, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Seohyeon Lee, Byung Jun Jung, Changhyeon Lee, Hyunseok Kim, Su-Mi Hur, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Proceedings Volume 12957, 1295706 (2024) https://doi.org/10.1117/12.3010838
KEYWORDS: Extreme ultraviolet lithography, Solubility, Electron beam lithography, Thin films, Extreme ultraviolet, Lithography

Proceedings Article | 1 May 2023 Presentation + Paper
Yejin Ku, Hyungju Ahn, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Yu Ha Jang, Byung Jun Jung, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Proceedings Volume 12498, 1249816 (2023) https://doi.org/10.1117/12.2658210
KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Thin films, Lithography, Tin

Proceedings Article | 25 May 2022 Presentation + Paper
Yejin Ku, Jun-il Kim, Hyun-Taek Oh, Youngtae Kim, Minkyu Choi, Jin-Kyun Lee, Kang-Hyun Kim, Byeong-Gyu Park, Sangsul Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Proceedings Volume 12055, 120550D (2022) https://doi.org/10.1117/12.2612313
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Electron beam lithography, Zinc, Lithography, Thin films, Metals

SPIE Journal Paper | 14 May 2022
Mihyun Lee, Masayuki Miyake, Noboru Otsuka, Takanori Kawakami, Hyun-Woo Kim, Suk-Koo Hong
JM3, Vol. 21, Issue 02, 024601, (May 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.024601
KEYWORDS: Line width roughness, Etching, Resistance, Scanning electron microscopy, Photoresist developing, Optical lithography, Carbon, Photoresist materials, Materials processing, Lithography

Proceedings Article | 24 March 2017 Open Access Presentation + Paper
Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam
Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 21 March 2017 Presentation + Paper
Seokhan Park, Joonsoo Park, Jemin Park, Hyun-Woo Kim, Changhyun Cho, Hyeongsun Hong, Kyupil Lee, ES Jung
Proceedings Volume 10144, 101440F (2017) https://doi.org/10.1117/12.2257638
KEYWORDS: Polymethylmethacrylate, Polymers, Lithography, Thermodynamics, Silica, Optical spheres, Directed self assembly, Picosecond phenomena, Semiconductors, Scanning electron microscopy, Extreme ultraviolet, Etching, Optical lithography

Proceedings Article | 17 April 2014 Paper
Chang-Min Park, Insung Kim, Sang-Hyun Kim, Dong-Wan Kim, Myung-Soo Hwang, Soon-Nam Kang, Cheolhong Park, Hyun-Woo Kim, Jeong-Ho Yeo, Seong-Sue Kim
Proceedings Volume 9048, 90480S (2014) https://doi.org/10.1117/12.2046132
KEYWORDS: Deep ultraviolet, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Scanners, Pellicles, Reflectivity, Semiconducting wafers, Particles, Etching

Proceedings Article | 20 March 2012 Paper
Taku Hirayama, Su Min Kim, Hai Sub Na, Chawon Koh, Hyun Woo Kim
Proceedings Volume 8325, 83251D (2012) https://doi.org/10.1117/12.912728
KEYWORDS: Polymers, Extreme ultraviolet lithography, Diffusion, Line width roughness, Lithography, Extreme ultraviolet, Thin films, Semiconducting wafers, Polymer thin films, Photoresist processing

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79692E (2011) https://doi.org/10.1117/12.878730
KEYWORDS: Coating, Semiconducting wafers, Contamination, Extreme ultraviolet, Data modeling, Calibration, Extreme ultraviolet lithography, Scanning electron microscopy, Etching, Thin films

Proceedings Article | 7 April 2011 Paper
Hyun-Woo Kim, Hai-Sub Na, Chang-Min Park, Cheolhong Park, Sumin Kim, Chawon Koh, In-Sung Kim, Han-Ku Cho
Proceedings Volume 7969, 796916 (2011) https://doi.org/10.1117/12.879791
KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Deep ultraviolet, Reflectivity, Extreme ultraviolet lithography, Line width roughness, Photoresist processing, Resolution enhancement technologies, Photomasks, Plasma

Proceedings Article | 7 April 2011 Paper
Chawon Koh, Hyun-Woo Kim, Sumin Kim, Hai-Sub Na, Chang-Min Park, Cheolhong Park, Kyoung-Yong Cho
Proceedings Volume 7969, 796918 (2011) https://doi.org/10.1117/12.879334
KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Critical dimension metrology, Etching, Inspection, Electronics, Optical lithography, Semiconductors

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360Q (2010) https://doi.org/10.1117/12.846474
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Line width roughness, Lithography, Deep ultraviolet, Polymers, Chemical reactions, Double patterning technology, Opacity, Photomasks

Proceedings Article | 4 December 2008 Paper
Chang-Min Park, Hyun-Byuk Kim, Hyung-Do Kim, Hyun-Woo Kim, Cheol-Hong Kim, Joo-On Park, Doohoon Goo, Jeongho Yeo, Seong-Woon Choi, Woo-Sung Han, Min-Su Choi, Sung-Woo Hwang
Proceedings Volume 7140, 714024 (2008) https://doi.org/10.1117/12.804627
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photomasks, Double patterning technology, Lithography, Etching, Semiconductors, Control systems, Spatial resolution, Transistors

Proceedings Article | 29 March 2006 Paper
N. Stepanenko, Hyun-Woo Kim, S. Kishimura, D. Van Den Heuvel, N. Vandenbroeck, M. Kocsis, P. Foubert, M. Maenhoudt, M. Ercken, F. Van Roey, R. Gronheid, I. Pollentier, D. Vangoidsenhoven, C. Delvaux, C. Baerts, S. O'Brien, W. Fyen, G. Wells
Proceedings Volume 6153, 615304 (2006) https://doi.org/10.1117/12.660158
KEYWORDS: Thin film coatings, Digital watermarking, Particles, Semiconducting wafers, Immersion lithography, Scanners, Water, Critical dimension metrology, Photomasks, Scatterometry

Proceedings Article | 20 March 2006 Paper
Michael Kocsis, Dieter Van Den Heuvel, Roel Gronheid, Mireille Maenhoudt, Dizana Vangoidsenhoven, Greg Wells, Nickolay Stepanenko, Michael Benndorf, Hyun Woo Kim, Shinji Kishimura, Monique Ercken, Frieda Van Roey, S. O'Brien, Wim Fyen, Philippe Foubert, Richard Moerman, Bob Streefkerk
Proceedings Volume 6154, 615409 (2006) https://doi.org/10.1117/12.660432
KEYWORDS: Semiconducting wafers, Thin film coatings, Water, Particles, Scanners, Immersion lithography, Manufacturing, Scanning electron microscopy, Space operations, Distortion

Proceedings Article | 4 May 2005 Paper
Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599468
KEYWORDS: Polymers, Photoresist materials, Semiconducting wafers, Optical lithography, Chemical reactions, Magnesium, Critical dimension metrology, Resolution enhancement technologies, Industrial chemicals, Scanning electron microscopy

Proceedings Article | 4 May 2005 Paper
Jung Hwan Hah, Subramanya Mayya, Mitsuhiro Hata, Hyun-Woo Kim, Man-Hyoung Ryoo, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon, Byung-Il Ryu
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599450
KEYWORDS: Optical lithography, Lithography, Photoresist processing, Chemical reactions, Resolution enhancement technologies, Hydrogen, Scanning electron microscopy, Polymers, Interfaces, Semiconductor manufacturing

Proceedings Article | 14 May 2004 Paper
Won-Young Chung, Tai-Kyung Kim, Jin-Young Yoon, Hyun-Woo Kim, Young-Kwan Park, Jeong-Taek Kong
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534809
KEYWORDS: Optical lithography, Lithography, Interfaces, Temperature metrology, 3D modeling, Calibration, Scanning electron microscopy, Resolution enhancement technologies, Thermal modeling, Electron microscopes

Proceedings Article | 14 May 2004 Paper
Hyun-Woo Kim, Hyung-Rae Lee, Kyung-Mee Kim, Shi Yong Lee, Bong-Cheol Kim, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534806
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Line edge roughness, Photoresist processing, Diffusion, Lithography, Temperature metrology, Scanners, Scatterometry

Proceedings Article | 14 May 2004 Paper
Hyung-Rae Lee, Jangho Shin, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534908
KEYWORDS: Critical dimension metrology, Lithography, Semiconducting wafers, Line edge roughness, Electroluminescence, Photoresist processing, 193nm lithography, Photomasks, Scanning electron microscopy, Optical lithography

Proceedings Article | 14 May 2004 Paper
Shi Yong Lee, Myungsun Kim, Sangwoong Yoon, Kyung-Mee Kim, Jae Hyun Kim, Hyun-Woo Kim, Sang-Gyun Woo, Young Ho Kim, Sang-Mun Chon, Takahiro Kishioka, Yasuhisa Sone, Yasuyuki Nakajima
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533884
KEYWORDS: Scanning electron microscopy, Reflectivity, Critical dimension metrology, Inspection, Polymers, Silicon, Optical lithography, Time metrology, Lithography, Line edge roughness

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534811
KEYWORDS: Critical dimension metrology, Photomasks, Photoresist materials, Lithography, Cadmium, Optical lithography, Image processing, Resolution enhancement technologies, Semiconducting wafers, Temperature metrology

Proceedings Article | 14 May 2004 Paper
Ji-Young Lee, Jangho Shin, Hyun-Woo Kim, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534926
KEYWORDS: Line width roughness, Line edge roughness, Transistors, Critical dimension metrology, Etching, Photoresist materials, Semiconducting wafers, Lithography, Spatial frequencies, Failure analysis

Proceedings Article | 14 May 2004 Paper
Myoung-Ho Jung, Hyun-Woo Kim, Jin Hong, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534882
KEYWORDS: Etching, Optical lithography, Silicon, Lithography, Photoresist processing, Scanners, Photomasks, Coating, Photoresist materials, Resistance

Proceedings Article | 12 June 2003 Paper
Jin Hong, Hyun-Woo Kim, Sung-Ho Lee, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485114
KEYWORDS: Silicon, Etching, Plasma, Scanning electron microscopy, Lithography, Optical lithography, Photoresist processing, Chemistry, Oxygen, Resistance

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485115
KEYWORDS: Semiconducting wafers, Liquids, Coating, Lithography, Capillaries, Critical dimension metrology, Etching, Photoresist processing, Scanners, Semiconductors

Proceedings Article | 12 June 2003 Paper
Hyun-Woo Kim, Yool Kang, Ju-Hyung Lee, Yun-Sook Chae, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485119
KEYWORDS: Vacuum ultraviolet, Etching, Scanning electron microscopy, Dry etching, Resistance, Line edge roughness, Critical dimension metrology, Inspection, Lithography, Particles

SPIE Journal Paper | 1 April 2003
Hyunwoo Kim, KiSang Hong
JEI, Vol. 12, Issue 02, (April 2003) https://doi.org/10.1117/12.10.1117/1.1556312
KEYWORDS: Super resolution, Image enhancement, Image processing, Diffusion, Video, Anisotropic diffusion, Motion estimation, Image contrast enhancement, Image restoration, Algorithm development

Proceedings Article | 24 July 2002 Paper
Hyun-Woo Kim, Sook Lee, Sang-Jun Choi, Sung-Ho Lee, Yool Kang, Sang-Gyun Woo, Dongseok Nam, Yun-Sook Chae, Jisoo Kim, Joo-Tae Moon, Robert Kavanagh, George Barclay
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474253
KEYWORDS: Etching, Polymers, Lithography, Manufacturing, Resistance, Dry etching, Chemistry, Scanners, Scanning electron microscopy, Line edge roughness

Proceedings Article | 11 March 2002 Paper
Ji-Soong Park, Dong-Hyun Kim, Chul-Hong Park, Yoo-Hyon Kim, Moon-Hyun Yoo, Jeong-Taek Kong, Hyun-Woo Kim, Sun-Il Yoo
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458275
KEYWORDS: Optical proximity correction, Metals, Logic devices, Optical alignment, Photomasks, Resistance, Bridges, Reliability, Scanners, Overlay metrology

Proceedings Article | 24 August 2001 Paper
Hyun-Woo Kim, Sang-Jun Choi, Dong-Won Jung, Sook Lee, Sung-Ho Lee, Yool Kang, Sang-Gyun Woo, Joo-Tae Moon, Robert Kavanagh, George Barclay, George Orsula, Joe Mattia, Stefan Caporale, Timothy Adams, Tsutomu Tanaka, Doris Kang
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436840
KEYWORDS: Etching, Polymers, Resistance, Lithography, Dry etching, Chemistry, Oxides, Manufacturing, Resist chemistry, Line edge roughness

Proceedings Article | 24 August 2001 Paper
Hyun-Woo Kim, Dong-Won Jung, Sook Lee, Sang-Jun Choi, Sang-Gyun Woo, Robert Kavanagh, George Barclay, Robert Blacksmith, Doris Kang, Gerd Pohlers, James Cameron, Joe Mattia, Stefan Caporale, Thomas Penniman, Lori Joesten, James Thackeray
Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436908
KEYWORDS: Etching, Polymers, Monochromatic aberrations, Lithography, Line edge roughness, Resistance, Photoresist materials, Photoresist processing, Absorbance, Resist chemistry

Proceedings Article | 23 June 2000 Paper
Sang-Jun Choi, Hyun-Woo Kim, Sang-Gyun Woo, Joo-Tae Moon
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388333
KEYWORDS: Etching, Polymers, Lithography, Resistance, Oxides, Monochromatic aberrations, Dry etching, Polymerization, Photoresist materials, Transmittance

Proceedings Article | 23 June 2000 Paper
Hyun-Woo Kim, Si-Hyeung Lee, Ki-Young Kwon, Dong-Won Jung, Sook Lee, Kwang-Sub Yoon, Sang-Jun Choi, Sang-Gyun Woo, Joo-Tae Moon
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388273
KEYWORDS: Polymers, Etching, Polymerization, Lithography, Resistance, Monochromatic aberrations, Transparency, Dry etching, Oxides, Scanning electron microscopy

Proceedings Article | 11 June 1999 Paper
Jin-Baek Kim, Hyun-Woo Kim, Si-Hyeung Lee, Sang-Jun Choi, Joo-Tae Moon
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350224
KEYWORDS: Polymers, Silicon, Oxygen, Ions, Reactive ion etching, Chemically amplified resists, Photoresist processing, Photoresist developing, Lithography, Imaging systems

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312386
KEYWORDS: Polymers, Photoresist materials, Silicon, Photoresist processing, Reactive ion etching, Photoresist developing, Oxygen, Lithography, Imaging systems, Ultraviolet radiation

Showing 5 of 37 publications
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