Mr. Joon-Soo Park Profile

Joon-Soo Park

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (18)

SPIE Journal Paper | 1 November 2021 Open Access

Open Access

Study on various curvilinear data representations and their impact on mask and wafer manufacturing

Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Peter Buck, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao, Ravi Pai, Sandeep Koranne, Alexander Tritchkov

JM3, Vol. 20, Issue 04, 041403, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041403

KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Semiconducting wafers, Manufacturing, Extreme ultraviolet, Vestigial sideband modulation, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography

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Proceedings Article | 12 October 2021 Presentation + Paper

Presentation + Paper

Study for big data interrelation using real-time monitoring technology in high cost, high volume manufacturing EUV era

Hyun-Joo Lee, Euihyun Jung, Daein Kim, Byoungsu Kim, Seun Yang, Jaewhan Sung, Joonsoo Park

Proceedings Volume 11855, 118550A (2021) https://doi.org/10.1117/12.2599020

KEYWORDS: Particles, Inspection, Photomasks, Digital image processing, Image processing, Sensors, Extreme ultraviolet, Process control, Manufacturing, Plasma

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A sampling inspection using non-patterned wafer and photomask has been dedicated to classical inspection technology for monitoring trend of particle variation at mass production. Total cost of sampling inspection method decreases the overall equipment effectiveness in mass production because equipment usage time and raw material cost. Nevertheless, customer mass production yield requirements for high-grade photomask and extreme ultraviolet photomask by sampling inspection method will be difficult to satisfy. To overcome sampling inspection's low reliability, this paper intended to describe an application of real-time monitoring for mass production equipment and verification of evaluated case by case. Optimization of real-time monitoring setup requires that sensor's install location with a considered mean free path in vacuum chamber, avoid to particle and bubble in chemical tube line and filter, and digital image process comparing method for nozzle height and parts location. An emergence of many by-products in a vacuum chamber, chemical tube line, and chemical filter is an unexpected danger. Application of real-time monitoring contributes to observing particles that in vacuum chamber using plasma, in tube line using chemical and chemical filters, sensing of mechanical drift and twist are also applicable with real-time detection technology using high-resolution cameras. As mentioned above, saved real-time big data can use proactive control to improve yield loss and cost of ownership. The specific suggestion about using real-time monitoring method is as follows 1. Detected increase rapidly trend of particle. Stop a process and start a particle removing recipe. 2. Observed particle rising. Stop process and start a cure recipe, and change other best path. 3. Sensed abnormal action. Stop process and do preventive maintenance after all substrate out. Both real-time monitoring data and yield data can analyze correlations that improve to become low cost of ownership by figuring out a root cause and drop in quality. A photomask industry is small compare to semiconductor industries, less than 1 percent by number of tools and production capacity. A photomask industry hard to make a big data due to little seed or small volume data. This paper shows how to make big data using real-time monitoring technology and how to defend a yield loss by unexpected situation at photomask tools.

Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

Curvilinear data format working group for MBMW era

Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Buck Peter, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao

Proceedings Volume 11610, 116100S (2021) https://doi.org/10.1117/12.2587109

KEYWORDS: Optical proximity correction, Mask making, Electronic design automation

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Proceedings Article | 15 May 2020 Presentation + Paper

Presentation + Paper

An application study on the stochastic effect of EUV photons

Jongsu Kim, Hyekyoung Jue, Hyungju Ryu, Sang-Jin Kim, Joon-Soo Park, Kyoungsub Shin, Ulrich Welling, Jürgen Preuninger, Ulrich Klostermann, Hans-Jürgen Stock, Wolfgang Demmerle, Eun-Soo Jeong, Sang-Yil Chang, Jung-Hoe Choi

Proceedings Volume 11323, 113231E (2020) https://doi.org/10.1117/12.2553319

KEYWORDS: Stochastic processes, Photomasks, Data modeling, Nanoimprint lithography, Line width roughness, Calibration, Extreme ultraviolet, Photons, Scanning electron microscopy, Line edge roughness

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Proceedings Article | 20 March 2020 Presentation + Paper

Presentation + Paper

Novel on-product focus metrology for EUV enabling direct focus monitoring and control for EUV systems

Inbeom Yim, Koshiba Dakeshi, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Jenny Yueh, Ali Ghavami, Bart Segers, Miguel Garcia Granda, Yutao Gui, Eric Janda, Frank Staals, Se-Hui Lee, Seung-Bin Yang, Yoon-Tae Lee, Se-Ra Jeon, Daniel Park, Ewoud van West, Elliott McNamara

Proceedings Volume 11325, 113251U (2020) https://doi.org/10.1117/12.2553246

KEYWORDS: Metrology, Extreme ultraviolet, Semiconducting wafers, Control systems, Scanners, Logic, Extreme ultraviolet lithography, Deep ultraviolet, Diffraction

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Proceedings Article | 20 March 2020 Paper

Paper

Enabling accurate and robust optical metrology of in device overlay

Min-Seok Kang, Chan Hwang, Seungyoon Lee, Jeongjin Lee, Joon-Soo Park, Christian Leewis, Eun-Ji Yang, Do-Haeng Lee, James Lee, Sabil Huda, Noh-Kyoung Park, Anagnostis Tsiatmas, Giulio Bottegal, Amy Wang, Filippo Belletti, Jan Jitse Venselaar, Giacomo Miceli, Izabela Saj, Sam Chen

Proceedings Volume 11325, 1132529 (2020) https://doi.org/10.1117/12.2553446

KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Measurement devices, Optical metrology, Etching, Scanners, Diffractive optical elements, Wafer testing, Optical testing

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Proceedings Article | 20 March 2020 Presentation + Paper

Presentation + Paper

Understanding advanced DRAM edge placement error budget and opportunities for control

Jaeseung Jeong, Jinho Lee, Jinsun Kim, Sunyoung Yea, Chan Hwang, Seung Yoon Lee, Jeongjin Lee, Joonsoo Park, Peter Nikolsky, Daniel Park, Antonio Corradi, Hyun-Woo Yu, Sun-Wook Jung, Denis Ovchinnikov, Vadim Timoshkov, Isabel de la Fuente Valentin, Yuxiang Yin, Kaustubh Padhye, Wim Tel, Harm Dillen, Koen Thuijs, Daan Slotboom, Miao Wang, Rhys Su, Marc Kea, Jin-Woo Lee, Yun-A Sung, Sang-Uk Kim, Young-Hoon Song, James Lee, Oh-Sung Kwon

Proceedings Volume 11325, 1132506 (2020) https://doi.org/10.1117/12.2551997

KEYWORDS: Metrology, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Optical lithography, Etching, Lithography, Edge roughness

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Proceedings Article | 20 March 2020 Presentation + Paper

Presentation + Paper

Taking the multi-wavelength DBO to the next level of accuracy and robustness

Jinsun Kim, Jeongijn Lee, Chan Hwang, Seung Yoon Lee, Wooyoung Jung, Joonsoo Park, Kaustuve Bhattacharyya, Arie den Boef, Simon Mathijssen, Marc Noot, Farzad Farhadzadeh, Daniel Park, Kaustubh Padhye, Se-Ra Jeon, Seung-Bin Yang, Won-Jae Jang, Oh-Sung Kwon

Proceedings Volume 11325, 113251J (2020) https://doi.org/10.1117/12.2551676

KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Metrology, Diffraction gratings, Polarization, Optical testing, Etching, Electronics, Optical lithography

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Proceedings Article | 13 March 2018 Paper

Paper

Improved control of multi-layer overlay in advanced 8nm logic nodes

Tae-Sun Kim, Young-Sik Park, Yong-Chul Kim, Byoung-Hoon Kim, Ji-Hun Lee, Min-Keun Kwak, Sung-Won Choi, Joon-Soo Park, Hong-Cheon Yang, Philipp Meixner, Dong-jin Lee, Oh-Sung Kwon, Hyun-Su Kim, Jin-Tae Park, Sung-Min Lee, Cedric Grouwstra, Vidar van der Meijden, Mohamed El Kodadi, Chris Kim, Pierre-Yves Guittet, Tjitte Nooitgedagt

Proceedings Volume 10585, 1058527 (2018) https://doi.org/10.1117/12.2297099

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Overlay metrology, Logic, Metrology, Diffraction, Target acquisition, Performance modeling, Diffraction gratings

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Proceedings Article | 28 March 2017 Presentation + Paper

Presentation + Paper

The use of computational inspection to identify process window limiting hotspots and predict sub-15nm defects with high capture rate

Boo-Hyun Ham, Il-Hwan Kim, Sung-Sik Park, Sun-Young Yeo, Sang-Jin Kim, Dong-Woon Park, Joon-Soo Park, Chang-Hoon Ryu, Bo-Kyeong Son, Kyung-Bae Hwang, Jae-Min Shin, Jangho Shin, Ki-Yeop Park, Sean Park, Lei Liu, Ming-Chun Tien, Angelique Nachtwein, Marinus Jochemsen, Philip Yan, Vincent Hu, Christopher Jones

Proceedings Volume 10145, 101451P (2017) https://doi.org/10.1117/12.2257964

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Metrology, Scanning electron microscopy, Critical dimension metrology, Electron beam lithography, Metals, Defect detection, Scanners

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Proceedings Article | 21 March 2017 Presentation + Paper

Presentation + Paper

Free energy modeling of block-copolymer within pillar confinements on DSA lithography

Seokhan Park, Joonsoo Park, Jemin Park, Hyun-Woo Kim, Changhyun Cho, Hyeongsun Hong, Kyupil Lee, ES Jung

Proceedings Volume 10144, 101440F (2017) https://doi.org/10.1117/12.2257638

KEYWORDS: Polymethylmethacrylate, Polymers, Lithography, Thermodynamics, Silica, Optical spheres, Directed self assembly, Picosecond phenomena, Semiconductors, Scanning electron microscopy, Extreme ultraviolet, Etching, Optical lithography

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Proceedings Article | 24 March 2009 Paper

Paper

CD budget analysis on sub-50-nm DRAM device: global CD variation to local CD variation

Chan Hwang, Joon-Soo Park, Jeongho Yeo, Seong-Woon Choi, Chan-Hoon Park

Proceedings Volume 7272, 72722O (2009) https://doi.org/10.1117/12.814476

KEYWORDS: Critical dimension metrology, Photomasks, Scanning electron microscopy, Metrology, Error analysis, Line width roughness, Semiconducting wafers, Statistical analysis, Scanners, Computer simulations

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Proceedings Article | 12 May 2005 Paper

Paper

Era of double exposure in 70 nm node DRAM cell

Sang-Jin Kim, Joon-Soo Park, Tae-Young Kim, Byeong-Soo Kim, Gi-Sung Yeo, Seok-Hwan Oh, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599458

KEYWORDS: Photomasks, Double patterning technology, Lithography, Lithographic illumination, Optical lithography, Critical dimension metrology, Distortion, Phase shifts, Monte Carlo methods, Personal protective equipment

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Proceedings Article | 26 June 2003 Paper

Paper

ArF issues of 90-nm-node DRAM device integration

Doo-Hoon Goo, Byeong-Soo Kim, Joon-Soo Park, Kwang-Sub Yoon, Jung-Hyeon Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485473

KEYWORDS: Line edge roughness, Vacuum ultraviolet, Optical proximity correction, Atrial fibrillation, Photoresist processing, Semiconductors, Etching, Lithography, Semiconducting wafers, Nanoimprint lithography

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Proceedings Article | 27 December 2002 Paper

Paper

Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

Ju-Hyung Lee, Dong-Hoon Chung, Dong-Ho Cha, Ho-Chul Kim, Joon-Soo Park, Dong-Seok Nam, Sang-Gyun Woo, Han-Ku Cho, Woo-Sung Han

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467504

KEYWORDS: Photomasks, Nanoimprint lithography, Phase shifts, Lithography, Scanners, Surface plasmons, Scanning electron microscopy, Manufacturing, Quartz, Semiconducting wafers

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Proceedings Article | 11 March 2002 Paper

Paper

One step forward to maturity of AF (assistant feature)-OPC in 100-nm level DRAM application

Hyunjae Kang, Byeongsoo Kim, Joonsoo Park, Insung Kim, Gisung Yeo, Junghyun Lee, Hanku Cho, Joo-Tae Moon

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458274

KEYWORDS: Atrial fibrillation, Optical proximity correction, Optical lithography, Lithography, Photomask technology, Resolution enhancement technologies, Lithographic illumination, Photomasks

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Proceedings Article | 14 September 2001 Paper

Paper

Lithography process design for 4-Gb DRAM of 0.31 K1 with KrF

Joonsoo Park, Gisung Yeo, Insung Kim, Byeongsoo Kim, Junghyun Lee, Hanku Cho, Joo-Tae Moon

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435720

KEYWORDS: Optical proximity correction, Photomasks, Atrial fibrillation, Lithography, Critical dimension metrology, Resolution enhancement technologies, Scanners, Lithium, Nanoimprint lithography, Lithographic illumination

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Proceedings Article | 26 July 1999 Paper

Paper

Challenge to 0.13-um device patterning using KrF

Insung Kim, Junghyun Lee, DongHo Cha, Joonsoo Park, Hanku Cho, Joo-Tae Moon

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354405

KEYWORDS: Lithography, Optical lithography, Resolution enhancement technologies, Diffraction, Scanners, Photomasks, Transmittance, Image quality, Semiconducting wafers, Electronics

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Showing 5 of 18 publications

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