Mr. Masaharu Nishiguchi Profile

Masaharu Nishiguchi

at Dai Nippon Printing Co Ltd

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Author

Publications (15)

Proceedings Article | 9 July 2015 Paper

Improvements of AIMS D2DB matching for product patterns

Masaharu Nishiguchi, Koichi Kanno, Hiroyuki Miyashita, Kana Ohara, Donghwan Son, Vikram Tolani, Masaki Satake

Proceedings Volume 9658, 96580W (2015) https://doi.org/10.1117/12.2197609

KEYWORDS: Photomasks, Calibration, SRAF, Optical proximity correction, Semiconducting wafers, Deep ultraviolet, Lithography, Image analysis, Manufacturing, Resolution enhancement technologies

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Proceedings Article | 28 July 2014 Paper

Evaluation of AIMS D2DB simulation without calibration images

Masaharu Nishiguchi, Kouichi Kanno, Katsuya Hayano, Hideyoshi Takamizawa, Kana Ohara, Donghwan Son, Vikram Tolani

Proceedings Volume 9256, 925605 (2014) https://doi.org/10.1117/12.2070026

KEYWORDS: Calibration, Photomasks, SRAF, Opacity, Optical proximity correction, Lithography, Critical dimension metrology, Deep ultraviolet, Metals, Semiconducting wafers

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Proceedings Article | 6 December 2004 Paper

Evaluation of dry etching and defect repair of EUVL mask absorber layer

Tsukasa Abe, Masaharu Nishiguchi, Tsuyoshi Amano, Toshiaki Motonaga, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Yuusuke Tanaka, Iwao Nishiyama

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569397

KEYWORDS: Etching, Chromium, Plasma, Dry etching, Photoresist processing, Atomic force microscopy, Extreme ultraviolet lithography, Photomasks, Image processing, Diamond machining

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Proceedings Article | 20 August 2004 Paper

Study of mask process development for EUVL

Tsukasa Abe, Masaharu Nishiguchi, Tsuyoshi Amano, Toshiaki Motonaga, Shiho Sasaki, Hiroshi Mohri, Naoya Hayashi, Yuusuke Tanaka, Hiromasa Yamanashi, Iwao Nishiyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557817

KEYWORDS: Etching, Atomic force microscopy, Chromium, Dry etching, Photoresist processing, Extreme ultraviolet lithography, Plasma, Scanning electron microscopy, Photomasks, Diamond machining

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Proceedings Article | 17 December 2003 Paper

Photomask repair performance of the SiON/Ta-Hf attenuating PSM

Masaharu Nishiguchi, Tsuyoshi Amano, Shiho Sasaki, Yasutaka Morikawa, Naoya Hayashi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518038

KEYWORDS: Etching, Photomasks, Quartz, Semiconducting wafers, Transmittance, Signal processing, Silicon, Ions, Atomic force microscopy, Scanning electron microscopy

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Proceedings Article | 17 December 2003 Paper

Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, Yoshihiro Koyama, Hiroshi Sawaragi, Yasuhiko Sugiyama, Masashi Muramatsu, Toshio Doi, Katsumi Suzuki, Mamoru Okabe, Masashi Shinohara, Osamu Matsuda, Kazuo Aita, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Satoh, Naoya Hayashi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518026

KEYWORDS: Printing, Photomasks, Binary data, Image processing, Lithography, Ions, Opacity, Transmittance, Imaging systems, Surface conduction electron emitter displays

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Proceedings Article | 17 December 2003 Paper

Optimization of nanomachining repair condition for ArF lithography

Tsuyoshi Amano, Masaharu Nishiguchi, Hiroyuki Hashimoto, Yasutaka Morikawa, Naoya Hayashi, Roy White, Ron Bozak, Lee Terrill

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518025

KEYWORDS: Binary data, Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Cadmium, Quartz, Scanning electron microscopy, NOx, Printing

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Proceedings Article | 28 August 2003 Paper

Defect repair performance using the nanomachining repair technique

Yasutaka Morikawa, Haruo Kokubo, Masaharu Nishiguchi, Naoya Hayashi, Roy White, Ron Bozak, Lee Terrill

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504213

KEYWORDS: Quartz, Scanning electron microscopy, Photomasks, Binary data, Printing, Bridges, Cadmium, Image transmission, 193nm lithography, Manufacturing

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Proceedings Article | 28 August 2003 Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography: II

Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504212

KEYWORDS: Printing, Photomasks, Binary data, Lithography, Semiconducting wafers, Imaging systems, Opacity, Ions, Scanners, Transmittance

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Proceedings Article | 27 December 2002 Paper

Defect printability analysis on alternating phase-shifting masks for 193-nm lithography

Yasutaka Morikawa, Yousuke Totsu, Masaharu Nishiguchi, Morihisa Hoga, Naoya Hayashi, Linyong Pang, Gerard Luk-Pat

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468210

KEYWORDS: Inspection, Semiconducting wafers, Photomasks, Lithography, Quartz, Dry etching, Etching, Phase shifts, Chromium, Computer simulations

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Proceedings Article | 27 December 2002 Paper

Feasibility study of detectability and printability for TaSiOx

Masaharu Nishiguchi, Yasutaka Morikawa, Toshiaki Motonaga, Kenji Noguchi, Shiho Sasaki, Hiroshi Mohri, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468201

KEYWORDS: Inspection, Photomasks, Lithography, Photomask technology, Phase shifting, Quartz, Dry etching, Etching, Defect detection

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Proceedings Article | 27 December 2002 Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography

Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Hiroshi Sawaragi, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467357

KEYWORDS: Photomasks, Binary data, Transmittance, Lithography, Opacity, Ions, Atomic force microscopy, Imaging systems, Image processing, Data modeling

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Proceedings Article | 16 August 2002 Paper

Feasibility study of manufacturing process and quality control for the new alternating PSM structure

Yasutaka Morikawa, Haruo Kokubo, Masaharu Nishiguchi, Masami Nara, Yousuke Totsu, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479337

KEYWORDS: Quartz, Inspection, Process control, Optical alignment, Etching, Cadmium, Binary data, Reticles, Manufacturing, Photomasks

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Proceedings Article | 1 August 2002 Paper

Defect printability analysis on alternating phase-shifting masks

Linyong Pang, Qi-De Qian, Kevin Chan, Yasutaka Morikawa, Masaharu Nishiguchi, Naoya Hayashi

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476975

KEYWORDS: Photomasks, Inspection, Phase shifts, Semiconducting wafers, Virtual reality, Defect inspection, Cadmium sulfide, Manufacturing, Quartz, Wavefronts

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Proceedings Article | 11 March 2002 Paper

Feasibility study of manufacturing process and quality control for the new alternating PSM structure

Yasutaka Morikawa, Haruo Kokubo, Masaharu Nishiguchi, Masami Nara, Yousuke Totsu, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458278

KEYWORDS: Quartz, Inspection, Optical alignment, Binary data, Process control, Reticles, Etching, Cadmium, Manufacturing, Semiconducting wafers

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Showing 5 of 15 publications

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