Adam C. Smith
Photomask Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 17 October 2019 Presentation
Proceedings Volume 11148, 111480S (2019) https://doi.org/10.1117/12.2539054
KEYWORDS: Photomasks, Silicon photonics, Photonics, Silicon, Optical proximity correction, Data corrections, Inspection, Mask making, Signal attenuation, Semiconducting wafers

Proceedings Article | 16 October 2019 Presentation + Paper
Charles Whiting, Ingo Bork, Peter Buck, Robin Chia, Bharadwaj Durvasula, Daniel Hill, Gazi Huda, Ken Jantzen, Matthew Leuthold, Jianliang Li, Joerg Mellmann, Kushlendra Mishra, Jed Rankin, Nageswara Rao, Malavika Sharma, Rachit Sharma, Adam Smith, Michaela Wentz
Proceedings Volume 11148, 1114805 (2019) https://doi.org/10.1117/12.2538347
KEYWORDS: Photomasks, Data modeling, Optical proximity correction, Critical dimension metrology, Calibration, Lithography, Semiconducting wafers, Manufacturing, Opacity, Etching

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 111481L (2019) https://doi.org/10.1117/12.2539039
KEYWORDS: Computed tomography, Electronic design automation, Optical proximity correction, Operating systems, Data processing, Photomasks, Chemical elements

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86791I (2013) https://doi.org/10.1117/12.2014935
KEYWORDS: Photomasks, Extreme ultraviolet, Atomic force microscopy, Inspection, Printing, Extreme ultraviolet lithography, Semiconducting wafers, Phase shifts, Manufacturing, Calibration

Proceedings Article | 6 April 2011 Paper
Proceedings Volume 7969, 79690U (2011) https://doi.org/10.1117/12.879931
KEYWORDS: Photomasks, Optical proximity correction, Calibration, Back end of line, Extreme ultraviolet, Extreme ultraviolet lithography, Scanning electron microscopy, Printing, Photoresist processing, Distortion

Proceedings Article | 11 May 2009 Paper
Junichi Watanabe, Tsukasa Yamazaki, Masahito Tanabe, Toru Komizo, Amy Zweber, Adam Smith
Proceedings Volume 7379, 73790B (2009) https://doi.org/10.1117/12.824252
KEYWORDS: Standards development, SRAF, Optical lithography, Photomasks, Manufacturing, Resolution enhancement technologies, Semiconductors, Photomask technology, Photoresist processing, Critical dimension metrology

Proceedings Article | 30 October 2007 Paper
Adam Smith, Daniel Sullivan, Kazuhiko Sugawara, Yusuke Okawa
Proceedings Volume 6730, 67300L (2007) https://doi.org/10.1117/12.747605
KEYWORDS: Critical dimension metrology, Photoresist developing, Photoresist materials, Photomasks, Photoresist processing, Chemically amplified resists, Metrology, Tolerancing, Industrial chemicals, Feature extraction

Proceedings Article | 20 May 2006 Paper
Andrew Watts, Chet Huang, Yiyang Wang, Cuc Huynh, Craig Benson, Adam Smith
Proceedings Volume 6283, 628303 (2006) https://doi.org/10.1117/12.681730
KEYWORDS: Photomasks, Manufacturing, Control systems, Semiconducting wafers, Process control, Statistical analysis, Etching, Inspection, Error analysis, Yield improvement

Proceedings Article | 6 December 2004 Paper
Christopher Magg, Jason Benz, Louis Kindt, Adam Smith, Jay Burnham, Jeffrey Riendeau, Christy Johnson, Rick Kontra
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.570563
KEYWORDS: Photomasks, Inspection, Particles, Chemical analysis, Aluminum, Silicon, Semiconducting wafers, Contamination, Manufacturing, Tantalum

Proceedings Article | 1 August 2002 Paper
Adam Smith, William Aaskov, Stephen Knight, Robert Leidy, Andrew Watts
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477006
KEYWORDS: Semiconducting wafers, Photomasks, Etching, Lithography, Photoresist materials, Photomicroscopy, Yield improvement, Photoresist developing, Polymers, Photoresist processing

Proceedings Article | 11 March 2002 Paper
Thomas Faure, Cuc Huynh, Michael Lercel, Adam Smith, Thomas Wagner
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458343
KEYWORDS: Etching, Chromium, Photomasks, Dry etching, Critical dimension metrology, Plasma, Quartz, Reticles, Chlorine, Plasma etching

Showing 5 of 11 publications
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