Mr. Kenneth Jantzen Profile

Kenneth Jantzen

Engineer at Siemens EDA

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 10 April 2024 Poster + Paper

Contour metrology for process matching and OPC qualification with machine learning-based site selection

Jae Yeol Maeng, Soo Kheng Tan, Yee Mei Foong, Xuefeng Zeng, Shibing Wang, Steven Lubin, Robin Chia, Angeline Chung, Ken Jantzen, Yuyang Sun

Proceedings Volume 12955, 129553N (2024) https://doi.org/10.1117/12.3012681

KEYWORDS: Metrology, Scanning electron microscopy, Contour extraction, Machine learning, Optical proximity correction, Image processing, Electronic design automation, Design

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Proceedings Article | 28 April 2023 Poster + Paper

CPU time prediction using machine learning for post-tapeout flow runs

Maram Salah, Ahmed Hamed Fathi Hamed, Stephen Kim, Pascal Gilgenkrantz, Wooil Han, Roberto Ramsis, Ken Jantzen

Proceedings Volume 12495, 124951O (2023) https://doi.org/10.1117/12.2657666

KEYWORDS: Data analysis, Data modeling, Machine learning, Feature extraction

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Proceedings Article | 16 October 2019 Presentation + Paper

Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)

Charles Whiting, Ingo Bork, Peter Buck, Robin Chia, Bharadwaj Durvasula, Daniel Hill, Gazi Huda, Ken Jantzen, Matthew Leuthold, Jianliang Li, Joerg Mellmann, Kushlendra Mishra, Jed Rankin, Nageswara Rao, Malavika Sharma, Rachit Sharma, Adam Smith, Michaela Wentz

Proceedings Volume 11148, 1114805 (2019) https://doi.org/10.1117/12.2538347

KEYWORDS: Photomasks, Data modeling, Optical proximity correction, Critical dimension metrology, Calibration, Lithography, Semiconducting wafers, Manufacturing, Opacity, Etching

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SPIE Journal Paper | 28 April 2015

Enabling scanning electron microscope contour-based optical proximity correction models

Francois Weisbuch, Kenneth Jantzen

JM3, Vol. 14, Issue 02, 021105, (April 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.021105

KEYWORDS: Scanning electron microscopy, Optical proximity correction, Calibration, Electron microscopes, Critical dimension metrology, Data modeling, Metrology, Performance modeling, Model-based design, Cadmium

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Proceedings Article | 18 March 2015 Paper

Calibrating etch model with SEM contours

François Weisbuch, A. Omran, Kenneth Jantzen

Proceedings Volume 9426, 94261T (2015) https://doi.org/10.1117/12.2180271

KEYWORDS: Etching, Calibration, Scanning electron microscopy, Data modeling, Optical proximity correction, Performance modeling, Statistical modeling, Lithography, Optical lithography, Semiconducting wafers

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Proceedings Article | 18 March 2015 Paper

Comparison of OPC job prioritization schemes to generate data for mask manufacturing

Travis Lewis, Vijay Veeraraghavan, Kenneth Jantzen, Stephen Kim, Minyoung Park, Gordon Russell, Mark Simmons

Proceedings Volume 9427, 942711 (2015) https://doi.org/10.1117/12.2086927

KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Data processing, Front end of line, Back end of line, Visualization, Design for manufacturability, Integrated circuits, Semiconductors

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Proceedings Article | 31 March 2014 Paper

Bringing SEM-contour based OPC to production

François Weisbuch, Kar Kit Koh, Kenneth Jantzen

Proceedings Volume 9052, 905224 (2014) https://doi.org/10.1117/12.2048288

KEYWORDS: Data modeling, Calibration, Scanning electron microscopy, Optical proximity correction, Performance modeling, Cadmium, Metrology, Critical dimension metrology, Statistical modeling, Semiconducting wafers

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Proceedings Article | 13 March 2012 Paper

OPC model prediction capability improvements by accounting for mask 3D-EMF effects

Jacky Cheng, Jessy Schramm, Dong Qing Zhang, Yee Mei Foong, Christian Zuniga, Thuy Do, Edita Tejnil, John Sturtevant, Angeline Chung, Kenneth Jantzen

Proceedings Volume 8326, 83261R (2012) https://doi.org/10.1117/12.916863

KEYWORDS: 3D modeling, Data modeling, Photomasks, Calibration, Performance modeling, Semiconducting wafers, Optical proximity correction, Systems modeling, Panoramic photography, System on a chip

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Proceedings Article | 23 March 2009 Paper

Compute resource management and TAT control in mask data prep

Ahmed Nouh, Kenneth Jantzen, Minyoung Park, Hien Vu

Proceedings Volume 7272, 727216 (2009) https://doi.org/10.1117/12.814236

KEYWORDS: Data centers, Optical proximity correction, Control systems, Resolution enhancement technologies, Solids, Visualization, Optical components, Optical resolution, Optical calibration, Computing systems

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Proceedings Article | 17 October 2008 Paper

Compute resource management and turn around time control in mask data prep

Travis Lewis, Scott Goad, Kenneth Jantzen, Ahmed Nouh, Minyoung Park, Emile Sahouria, Steffen Schulze

Proceedings Volume 7122, 71222O (2008) https://doi.org/10.1117/12.801544

KEYWORDS: Databases, Optical proximity correction, Data centers, Metals, Photomasks, Control systems, Data processing, Resolution enhancement technologies, Optical components, Optical resolution

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Proceedings Article | 16 November 2007 Paper

Reduction of layout complexity for shorter mask write-time

Sean Hannon, Travis Lewis, Scott Goad, Kenneth Jantzen, Jianlin Wang, Hien Vu, Emile Sahouria, Steffen Schulze

Proceedings Volume 6730, 67303K (2007) https://doi.org/10.1117/12.746986

KEYWORDS: Source mask optimization, Photomasks, Optical proximity correction, Reticles, Manufacturing, Optical alignment, Tolerancing, Lithography, Data processing, Semiconducting wafers

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Proceedings Article | 30 July 2002 Paper

Subresolution assist feature implementation for high-performance logic gate-level lithography

Allen Gabor, James Bruce, William Chu, Richard Ferguson, Carlos Fonseca, Ronald Gordon, Kenneth Jantzen, Mukesh Khare, Mark Lavin, Woo-Hyeong Lee, Lars Liebmann, Karl Muller, Jed Rankin, Patrick Varekamp, Franz Zach

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474591

KEYWORDS: SRAF, Optical proximity correction, Logic, Binary data, Lithography, Model-based design, Image enhancement, Printing, Manufacturing, Lithographic illumination

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Proceedings Article | 26 July 1999 Paper

Lithographic implications for Cu/low-k integration

Rebecca Mih, Nora Chen, Kenneth Jantzen, James Marsh, Steven Schneider

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354401

KEYWORDS: Dielectrics, Photomasks, Etching, Lithography, Silicon, Carbon, Reflectivity, Oxides, Metals, Photoresist materials

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Showing 5 of 13 publications

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