SCALPEL proof-of-concept system: preliminary lithography results

Warren K. Waskiewicz; Christopher J. Biddick; Myrtle I. Blakey; Kevin J. Brady; Ron M. Camarda; Wayne F. Connelly; A. H. Crorken; J. P. Custy; R. DeMarco; Reginald C. Farrow; Joseph A. Felker; Linus A. Fetter; Richard R. Freeman; Lloyd R. Harriott; Leslie C. Hopkins; Harold A. Huggins; Richard J. Kasica; Chester S. Knurek; Joseph S. Kraus; James Alexander Liddle; Masis M. Mkrtchyan; Anthony E. Novembre; Milton L. Peabody Jr.; Len Rutberg; Harry H. Wade; Pat G. Watson; Kurt S. Werder; David L. Windt; Regine G. Tarascon-Auriol; Steven D. Berger; Stephen W. Bowler

doi:10.1117/12.275786

7 July 1997 SCALPEL proof-of-concept system: preliminary lithography results

Warren K. Waskiewicz, Christopher J. Biddick, Myrtle I. Blakey, Kevin J. Brady, Ron M. Camarda, Wayne F. Connelly, A. H. Crorken, J. P. Custy, R. DeMarco, Reginald C. Farrow, Joseph A. Felker, Linus A. Fetter, Richard R. Freeman, Lloyd R. Harriott, Leslie C. Hopkins, Harold A. Huggins, Richard J. Kasica, Chester S. Knurek, Joseph S. Kraus, James Alexander Liddle, Masis M. Mkrtchyan, Anthony E. Novembre, Milton L. Peabody Jr., Len Rutberg, Harry H. Wade, Pat G. Watson, Kurt S. Werder, David L. Windt, Regine G. Tarascon-Auriol, Steven D. Berger, Stephen W. Bowler

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Proceedings Volume 3048, Emerging Lithographic Technologies; (1997) https://doi.org/10.1117/12.275786
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

We have designed, constructed, and are now performing experiments with a proof-of-concept projection electron-beam lithography system based upon the SCALPEL^R (scattering with angular limitation projection electron-beam lithography) principle. This initial design has enabled us to demonstrate the feasibility of not only the electron optics, but also the scattering mask and resist platform. In this paper we report on some preliminary results which indicate the lithographic potential and benefits of this technology for the production of sub-0.18 micrometer features.

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Warren K. Waskiewicz, Christopher J. Biddick, Myrtle I. Blakey, Kevin J. Brady, Ron M. Camarda, Wayne F. Connelly, A. H. Crorken, J. P. Custy, R. DeMarco, Reginald C. Farrow, Joseph A. Felker, Linus A. Fetter, Richard R. Freeman, Lloyd R. Harriott, Leslie C. Hopkins, Harold A. Huggins, Richard J. Kasica, Chester S. Knurek, Joseph S. Kraus, James Alexander Liddle, Masis M. Mkrtchyan, Anthony E. Novembre, Milton L. Peabody Jr., Len Rutberg, Harry H. Wade, Pat G. Watson, Kurt S. Werder, David L. Windt, Regine G. Tarascon-Auriol, Steven D. Berger, and Stephen W. Bowler "SCALPEL proof-of-concept system: preliminary lithography results", Proc. SPIE 3048, Emerging Lithographic Technologies, (7 July 1997); https://doi.org/10.1117/12.275786

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