Dr. Shuji Ding Profile

Dr. Shuji Ding

at Clariant Chemicals Ltd

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 4 May 2005 Paper

193nm dual layer organic BARCs for high NA immersion lithography

David Abdallah, Mark Neisser, Ralph Dammel, Georg Pawlowski, S. Ding, Francis Houlihan, Andrew Romano, J. Biafore, Alex Raub

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600736

KEYWORDS: Fourier transforms, Reflectivity, Lithography, Etching, Bottom antireflective coatings, Multilayers, Antireflective coatings, Semiconducting wafers, Stereolithography, 193nm lithography

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Proceedings Article | 28 May 2004 Paper

Developable bottom antireflective coatings for 248-nm and 193-nm lithography

Tomohide Katayama, Hisashi Motobayashi, Wen-Bing Kang, Medhat Toukhy, Joseph Oberlander, Shuji Ding, Mark Neisser

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537539

KEYWORDS: Lithography, Silicon, Semiconducting wafers, 193nm lithography, Polymers, Bottom antireflective coatings, Dry etching, Process control, Electroluminescence, Absorbance

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Proceedings Article | 14 May 2004 Paper

Design and development of high etch rate organic bottom antireflective coating for sub-100 nm node and beyond

Hengpeng Wu, Zhong Xiang, Aritaka Hishida, David Abdallah, Jianhui Shan, Eleazar Gonzalez, Shuji Ding, Mark Neisser

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537883

KEYWORDS: Etching, Polymers, Photoresist materials, Lithography, Fourier transforms, Semiconducting wafers, Bottom antireflective coatings, Optical lithography, Scanning electron microscopy, Refractive index

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Proceedings Article | 24 July 2002 Paper

Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.

Young-Sun Hwang, Jae Chang Jung, Kyu-Dong Park, Sung-Koo Lee, Jin-Soo Kim, Keun-Kyu Kong, Ki-Soo Shin, Shuji Ding, Zhong Xiang, Mark Neisser

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474189

KEYWORDS: Polymers, 193nm lithography, Lithography, Photoresist processing, Refractive index, Line edge roughness, Semiconductors, Chromophores, Scanning electron microscopy, Reflectivity

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Proceedings Article | 24 July 2002 Paper

Optimization of organic bottom antireflective coatings' compatibility with ArF resists

Zhong Xiang, Jianhui Shan, Eleazar Gonzalez, Hengpeng Wu, Shuji Ding, Mark Neisser, Bang-Chein Ho, Harrison Chen

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474186

KEYWORDS: Etching, Reflectivity, Fourier transforms, Polymers, Bottom antireflective coatings, 193nm lithography, Lithography, Coating, Silicon carbide, Neodymium

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Proceedings Article | 24 July 2002 Paper

Development of 193-nm B.A.R.C.s for dual damascene applications

Hengpeng Wu, Zhong Xiang, Eleazar Gonzalez, Jianhui Shan, Shuji Ding, Wen-Bing Kang, Aritaka Hishida

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474188

KEYWORDS: Semiconducting wafers, Polymers, Etching, Copper, Photoresist materials, Optical lithography, Fourier transforms, Aluminum, Dielectrics, Glasses

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Proceedings Article | 23 June 2000 Paper

Optimization of bottom antireflective coating materials for dual damascene process

Shuji Ding, Wen-Bing Kang, Hatsuyuki Tanaka, Sunit Dixit, Ronald Eakin, Jianhui Shan, Eleazar Gonzalez, Ying Liu, Dinesh Khanna

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388377

KEYWORDS: Polymers, Etching, Deep ultraviolet, Semiconducting wafers, Coating, Fourier transforms, Lithography, Thin film coatings, Bottom antireflective coatings, Silicon

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Proceedings Article | 11 June 1999 Paper

Bottom antireflective coatings for ArF, KrF, and i-line applications: a comparison of theory, design, and lithographic aspects

Munirathna Padmanaban, Shuji Ding, Stanley Ficner, Wen-Bing Kang, Dinesh Khanna, Ralph Dammel

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350238

KEYWORDS: Reflectivity, Bottom antireflective coatings, Lithography, Molecules, Absorption, Thin film coatings, Etching, Photoresist materials, Silicon, Polymers

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Proceedings Article | 11 June 1999 Paper

Performance impact of novel polymeric dyes in photoresist applications

Ping-Hung Lu, Salem Mehtsun, John Sagan, Jianhui Shan, Eleazar Gonzalez, Shuji Ding, Dinesh Khanna

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350175

KEYWORDS: Polymers, Semiconducting wafers, Photoresist materials, Reflectivity, Chromophores, Quartz, Absorption, Lithography, Thin films, Dysprosium

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Proceedings Article | 11 June 1999 Paper

Process and performance optimization of bottom antireflective coatings: II

Shuji Ding, John Sagan, Jianhui Shan, Eleazar Gonzalez, Sunit Dixit, Ying Liu, Dinesh Khanna

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350152

KEYWORDS: Coating, Electroluminescence, Bottom antireflective coatings, Particles, Semiconducting wafers, Edge roughness, Liquids, Photoresist materials, Chemical analysis, Scanning electron microscopy

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Proceedings Article | 29 June 1998 Paper

Monitoring and controlling synthesis of bottom antireflective coating materials by in-situ FT-IR technique

Shuji Ding, Jianhui Shan, Dinesh Khanna

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312481

KEYWORDS: Bottom antireflective coatings, FT-IR spectroscopy, Polymers, Process control, Lithography

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Proceedings Article | 29 June 1998 Paper

Process effects resulting from conversion to a safe-solvent organic BARC

James Cox, Lynn Welsh, Deborah Murphy, Ronald Eakin, Pierre Silvestre, Ralph Dammel, Shuji Ding, Brad Williams, Dinesh Khanna

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312394

KEYWORDS: Semiconducting wafers, Photoresist materials, Reflectivity, Coating, Thin film coatings, Etching, Silicon, Antireflective coatings, Silicon films, Quartz

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Proceedings Article | 29 June 1998 Paper

Process and performance optimization of bottom antireflective coatings

Shuji Ding, Ping-Hung Lu, Jianhui Shan, Eleazar Gonzalez, Salem Mehtsun, Sunit Dixit, Dinesh Khanna

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312480

KEYWORDS: Coating, Photoresist materials, Semiconducting wafers, Lithography, Bottom antireflective coatings, Silicon, Refractive index, Reflectivity, Antireflective coatings, Silicon films

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Proceedings Article | 7 July 1997 Paper

Use of highly absorptive azo dyes in photoresist coatings

Ping-Hung Lu, Shuji Ding, T. Hannigan, D. Eberly, Elaine Kokinda, Sunit Dixit, Salem Mehtsun, Anthony Corso, Dinesh Khanna

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275880

KEYWORDS: Reflectivity, Photoresist materials, Lithography, Aluminum, Dysprosium, Thin film coatings, Absorbance, Semiconducting wafers, Chromophores, Critical dimension metrology

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Proceedings Article | 7 July 1997 Paper

Novel polymeric dyes for bottom antireflective coatings

Shuji Ding, Ping-Hung Lu, Ralph Dammel, Jianhui Shan, Salem Mehtsun, T. Hannigan, D. Eberly, Dinesh Khanna, Hatsuyuki Tanaka

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275879

KEYWORDS: Coating, Photoresist materials, Etching, Semiconducting wafers, Lithography, Bottom antireflective coatings, Polymers, Reflectivity, Absorbance, Antireflective coatings

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Showing 5 of 15 publications

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