Douglas Guerrero received a PhD in Organic Chemistry from the University of Oklahoma and completed Post-doctoral work at the University of Texas-Dallas in the field of conducting polymers.
He joined Brewer Science in 1995 and has served in several positions within the R&D organization where he led the development and commercialization of several products. He is currently a Senior Technologist in the Semiconductor Materials Business Unit. He has been on assignment at imec in Leuven, Belgium since 2008 where he is developing processes for future nodes.
Dr. Guerrero is a Senior Member of SPIE and is currently chair of the SPIE Advances in Patterning Materials and Processes conference. He has served in several international symposia committees and has published over 80 papers and patents on optoelectronic materials, underlayers for lithography, reflection control, and DSA.
He joined Brewer Science in 1995 and has served in several positions within the R&D organization where he led the development and commercialization of several products. He is currently a Senior Technologist in the Semiconductor Materials Business Unit. He has been on assignment at imec in Leuven, Belgium since 2008 where he is developing processes for future nodes.
Dr. Guerrero is a Senior Member of SPIE and is currently chair of the SPIE Advances in Patterning Materials and Processes conference. He has served in several international symposia committees and has published over 80 papers and patents on optoelectronic materials, underlayers for lithography, reflection control, and DSA.
Understanding and improving performance of 14-nm HP EUV lithography via rational design of materials
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