Dr. Ramil-Marcelo L. Mercado Profile

Dr. Ramil-Marcelo L. Mercado

Managing Director R&D at Brewer Science Inc

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 31 March 2010 Paper

Photoresist-induced development behavior in DBARCs

Jim Meador, Alice Guerrero, Joyce Lowes, Charlyn Stroud, Brandy Carr, Anwei Qin, Carlton Washburn, Ramil-Marcelo Mercado

Proceedings Volume 7639, 763926 (2010) https://doi.org/10.1117/12.846927

KEYWORDS: Lithography, Photoresist materials, Silicon, Photoresist developing, Diffusion, Polymers, Lithographic illumination, Scanning electron microscopy, Scanners, Photography

Read Abstract +

Proceedings Article | 26 March 2010 Paper

Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications

Joyce Lowes, Victor Pham, Jim Meador, Charlyn Stroud, Ferdinand Rosas, Ramil-Marcelo Mercado, Mark Slezak

Proceedings Volume 7639, 76390K (2010) https://doi.org/10.1117/12.846608

KEYWORDS: Picosecond phenomena, Photoresist materials, Photoresist developing, Polymers, Lithography, Diffusion, Semiconducting wafers, Standards development, Chemistry, Quenching (fluorescence)

Read Abstract +

Proceedings Article | 11 December 2009 Paper

Resist double patterning on BARCs and spin-on multilayer materials

Douglas Guerrero, Daniel Sullivan, Ramil-Marcelo Mercado

Proceedings Volume 7520, 75200M (2009) https://doi.org/10.1117/12.840419

KEYWORDS: Double patterning technology, Photoresist materials, Multilayers, Lithography, Silicon, Carbon, Photoresist processing, Photoresist developing, Image processing, Etching

Read Abstract +

Proceedings Article | 1 April 2009 Paper

Improving the performance of light-sensitive developer-soluble anti-reflective coatings by using adamantyl terpolymers

Jim Meador, Joyce Lowes, Charlyn Stroud, Sherilyn Thomas, Yilin Qiu, Ramil-Marcelo Mercado, Victor Pham, Mark Slezak

Proceedings Volume 7273, 727312 (2009) https://doi.org/10.1117/12.813783

KEYWORDS: Lithography, Photoresist materials, Photoresist developing, Polymers, Scanning electron microscopy, Antireflective coatings, Interferometers, Polymer thin films, Electroluminescence, Bandpass filters

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Acid-degradable hyperbranched polymer and its application in bottom anti-reflective coatings

Ramil-Marcelo Mercado, Hao Xu, Joyce Lowes, Jim Meador, Douglas Guerrero

Proceedings Volume 7140, 71402W (2008) https://doi.org/10.1117/12.804743

KEYWORDS: Polymers, Photoresist developing, Polymer thin films, Photoresist materials, Lithography, Coating, Molecules, Bottom antireflective coatings, Electroluminescence, Etching

Read Abstract +

Proceedings Article | 15 April 2008 Paper

Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography

Jim Meador, Carol Beaman, Charlyn Stroud, Joyce Lowes, Zhimin Zhu, Douglas Guerrero, Ramil-Marcelo Mercado, David Drain

Proceedings Volume 6923, 69232W (2008) https://doi.org/10.1117/12.772793

KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Diffractive optical elements, Reflectivity, Polymer thin films, Optical properties, Scanning electron microscopy

Read Abstract +

Proceedings Article | 26 March 2008 Paper

Anti-reflective coating for multipatterning lithography

Douglas Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado

Proceedings Volume 6923, 69230X (2008) https://doi.org/10.1117/12.772827

KEYWORDS: Photoresist processing, Etching, Image processing, Optical lithography, Semiconducting wafers, Oxygen, Lithography, Printing, Argon, Scanning electron microscopy

Read Abstract +

Proceedings Article | 30 March 2007 Paper

A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography

Ramil-Marcelo Mercado, Joyce Lowes, Carlton Washburn, Douglas Guerrero

Proceedings Volume 6519, 65192X (2007) https://doi.org/10.1117/12.712313

KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Reflectivity, Antireflective coatings, Critical dimension metrology, Silicon, Light sources

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Development of 193-nm wet BARCs for implant applications

Jim Meador, Carol Beaman, Joyce Lowes, Carlton Washburn, Ramil Mercado, Mariya Nagatkina, Charlyn Stroud

Proceedings Volume 6153, 61532P (2006) https://doi.org/10.1117/12.657597

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Lithography, Polymers, Electroluminescence, Chemistry, Critical dimension metrology, Photoresist developing, Absorbance

Read Abstract +

Proceedings Article | 4 April 2005 Paper

High refractive index photocurable resins

Robert Morford, Ramil Mercado, Curtis Planje, Tony Flaim

Proceedings Volume 5724, (2005) https://doi.org/10.1117/12.590578

KEYWORDS: Refractive index, Semiconducting wafers, Quartz, Ultraviolet radiation, Visible radiation, Silicon, Prisms, Coating, Transparency, Optoelectronic devices

Read Abstract +

Proceedings Article | 4 April 2005 Paper

Hybrid high refractive index polymer coatings

Yubao Wang, Tony Flaim, Ramil Mercado, Shelly Fowler, Douglas Holmes, Curtis Planje

Proceedings Volume 5724, (2005) https://doi.org/10.1117/12.589149

KEYWORDS: Refractive index, Polymers, Titanium, Photorefractive polymers, Optical coatings, Polymer thin films, Metals, Oxides, Transparency, Titanium dioxide

Read Abstract +

Proceedings Article | 31 March 2005 Paper

Press-patterned diffraction gratings on high refractive index polyimide films

Ramil Mercado, Rebecca Rich, Wu-Sheng Shih, Udayan Senapati, Doug Holmes

Proceedings Volume 5728, (2005) https://doi.org/10.1117/12.590515

KEYWORDS: Polymers, Refractive index, Semiconducting wafers, Diffraction gratings, Optical lithography, Glasses, Photonics, Wafer-level optics, Silicon, Wafer testing

Read Abstract +

Proceedings Article | 18 June 2004 Paper

Thin-film polyetherimides with controlled refractive indices

Ramil Mercado, Yubao Wang, Tony Flaim, William DiMenna, Udayan Senapati

Proceedings Volume 5351, (2004) https://doi.org/10.1117/12.529576

KEYWORDS: Refractive index, Polymers, Photorefractive polymers, Optical coatings, Transparency, Glasses, Visible radiation, Thin films, Refraction, Light emitting diodes

Read Abstract +

Proceedings Article | 25 February 2004 Paper

High-refractive-index polymer coatings for optoelectronics applications

Tony Flaim, Yubao Wang, Ramil Mercado

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.513363

KEYWORDS: Refractive index, Optical coatings, Polymers, Oxides, Metals, Photorefractive polymers, Thin film coatings, Transmittance, Sol-gels, Titanium dioxide

Read Abstract +

Proceedings Article | 16 May 2003 Paper

Dyed red, green, and blue photoresist for manufacture of high-resolution color filter arrays for image sensors

Douglas Guerrero, William DiMenna, Tony Flaim, Ramil Mercado, Sam Sun

Proceedings Volume 5017, (2003) https://doi.org/10.1117/12.476750

KEYWORDS: Photoresist materials, Polymers, Photoresist developing, Optical filters, Electroluminescence, Polymethylmethacrylate, Dysprosium, Imaging arrays, Image sensors, Computer simulations

Read Abstract +

Showing 5 of 15 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years