Dr. Lander Verstraete
at imec
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150K (2024) https://doi.org/10.1117/12.3034646
KEYWORDS: Extreme ultraviolet, Lithography, Extreme ultraviolet lithography, Directed self assembly, Photoresist developing, Reticles, Photoresist materials, Line width roughness, Semiconducting wafers, Line edge roughness

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13215, 132150N (2024) https://doi.org/10.1117/12.3034701
KEYWORDS: Optical lithography, Extreme ultraviolet, Directed self assembly, Sustainability, Stochastic processes, Phase shifts, Materials processing, Lithography, Extreme ultraviolet lithography, Design

SPIE Journal Paper | 18 October 2024
Julie Van Bel, Lander Verstraete, Hyo Seon Suh, Philippe Bezard, Alain Moussa, Andreia Santos, YoungJun Her, Stefan De Gendt
JM3, Vol. 23, Issue 04, 043001, (October 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.4.043001
KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Annealing, Extreme ultraviolet lithography, Film thickness, Bridges, Picosecond phenomena, Etching, Semiconducting wafers

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

Proceedings Article | 9 April 2024 Presentation + Paper
Lander Verstraete, Hyo Seon Suh, Julie Van Bel, Byeong-U Bak, Seong Eun Kim, Remi Vallat, Philippe Bezard, Matteo Beggiato, Christophe Beral
Proceedings Volume 12956, 129560G (2024) https://doi.org/10.1117/12.3010817
KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Annealing, Bridges, Extreme ultraviolet lithography, Polymethylmethacrylate, Materials processing

Proceedings Article | 5 October 2023 Paper
Proceedings Volume 12802, 128020S (2023) https://doi.org/10.1117/12.2675573
KEYWORDS: Data modeling, Directed self assembly, Performance modeling, Defect inspection, Scanning electron microscopy, Machine learning, Defect detection, Semiconductors, Inspection

Proceedings Article | 1 May 2023 Presentation + Paper
Julie Van Bel, Lander Verstraete, Hyo Seon Suh, Stefan De Gendt, Philippe Bezard, Jelle Vandereyken, Waikin Li, Matteo Beggiato, Amir-Hossein Tamaddon, Christophe Beral, Andreia Santos, Boaz Alperson, YoungJun Her
Proceedings Volume 12497, 124970K (2023) https://doi.org/10.1117/12.2657990
KEYWORDS: Directed self assembly, Block copolymers, Extreme ultraviolet, Annealing, Film thickness, Extreme ultraviolet lithography, Line edge roughness, Critical dimension metrology, Semiconducting wafers, Line width roughness

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12497, 124970I (2023) https://doi.org/10.1117/12.2657939
KEYWORDS: Block copolymers, Extreme ultraviolet, Directed self assembly, Extreme ultraviolet lithography, Bridges, Etching

Proceedings Article | 30 April 2023 Poster
Proceedings Volume 12498, 1249823 (2023) https://doi.org/10.1117/12.2658398
KEYWORDS: Extreme ultraviolet lithography, Lithography, Line width roughness, Ecosystems

Proceedings Article | 31 October 2022 Poster
Proceedings Volume PC12292, PC122920W (2022) https://doi.org/10.1117/12.2643150
KEYWORDS: Extreme ultraviolet, Lithography, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Ecosystems

Proceedings Article | 7 June 2022 Presentation
Proceedings Volume PC12054, PC1205402 (2022) https://doi.org/10.1117/12.2622565
KEYWORDS: Directed self assembly, Extreme ultraviolet lithography, Optical lithography, Extreme ultraviolet, Semiconductors, Semiconducting wafers, Lithography, Light-matter interactions

Showing 5 of 11 publications
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