Dr. Edward K. Pavelchek Profile

Dr. Edward K. Pavelchek

at DuPont Electronics & Industrial

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 14 September 2001 Paper

Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes

Doris Kang, Stewart Robertson, Michael Reilly, Edward Pavelchek

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435786

KEYWORDS: Photomasks, Binary data, Nanoimprint lithography, Critical dimension metrology, Photoresist materials, Deep ultraviolet, Argon, Chromium, Lithography, Reticles

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Proceedings Article | 24 August 2001 Paper

Simulation of 193-nm photoresists based on different polymer platforms

Doris Kang, Stewart Robertson, Edward Pavelchek

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436818

KEYWORDS: Standards development, Diffusion, Polymers, Lithography, Data modeling, Photoresist materials, Semiconducting wafers, Scanners, Chemically amplified resists, Photoresist processing

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Proceedings Article | 24 August 2001 Paper

Improved notch model for resist dissolution in lithography simulation

Stewart Robertson, Edward Pavelchek, Wolfgang Hoppe, Robert Wildfeuer

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436815

KEYWORDS: Lithography, Standards development, Data modeling, Promethium, Photoresist materials, Photoresist processing, Diffusion, Inspection, Process modeling, Picture Archiving and Communication System

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Proceedings Article | 24 August 2001 Paper

Planarizing ARs for dual-damascene processing

Edward Pavelchek, Marjorie Cernigliaro, Peter Trefonas, Amy Kwok, Suzanne Coley

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436920

KEYWORDS: Semiconducting wafers, Etching, Dielectrics, Oxides, Coating, Error analysis, Argon, Prototyping, Thin film coatings, Lithography

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Proceedings Article | 26 April 2001 Paper

Manufacturing considerations for MEEF minimization and process window optimization for 180-nm contact holes

Doris Kang, Stewart Robertson, Michael Reilly, Edward Pavelchek

Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425204

KEYWORDS: Binary data, Photomasks, Picosecond phenomena, Electroluminescence, Manufacturing, Autoregressive models, Argon, Phase shifting, Reticles, Thermal modeling

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Proceedings Article | 23 August 2000 Paper

New method for determining the optical properties of thin films by reflectometry

John Bohland, Edward Pavelchek, Charles Szmanda

Proceedings Volume 4182, (2000) https://doi.org/10.1117/12.410068

KEYWORDS: Reflectivity, Antireflective coatings, Semiconducting wafers, Refractive index, Photoresist materials, Optical properties, Thin films, Reflectometry, Spectral models, Silicon

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Proceedings Article | 18 August 2000 Paper

Planarization approaches to via-first dual-damascene processing

Edward Pavelchek, Marjorie Cernigliaro, Peter Trefonas, Manuel doCanto

Proceedings Volume 4181, (2000) https://doi.org/10.1117/12.395723

KEYWORDS: Dielectrics, Transistors, Voltage controlled current source, Logic, Manufacturing, Metals, Oxides, Copper, Capacitance

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Proceedings Article | 5 July 2000 Paper

Factors affecting pitch bias in lithography simulation

Stewart Robertson, Edward Pavelchek, Catherine Swible-Keane, John Bohland, Michael Reilly

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389067

KEYWORDS: Diffusion, Lithography, Data modeling, Photoresist processing, Lithographic illumination, Reflectivity, Optical proximity correction, Scanning electron microscopy, Inspection, Computer simulations

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Proceedings Article | 11 June 1999 Paper

Accuracy of current model descriptions of a DUV photoresist

Doris Kang, Edward Pavelchek, Catherine Swible-Keane

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350276

KEYWORDS: Diffusion, Lithography, Data modeling, Deep ultraviolet, Absorbance, Ions, Photoresist materials, Polymers, Silicon, Semiconducting wafers

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Proceedings Article | 11 June 1999 Paper

Planarizing AR for DUV lithography

Timothy Adams, Suzanne Coley, Manuel doCanto, Dana Gronbeck, Matthew King, Edward Pavelchek

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350273

KEYWORDS: Polymers, Lithography, Glasses, Chromophores, Absorbance, Deep ultraviolet, Autoregressive models, Critical dimension metrology, Etching, Reflection

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Proceedings Article | 7 July 1997 Paper

Tunable AR for DUV lithography

Edward Pavelchek, Manuel doCanto

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275893

KEYWORDS: Deep ultraviolet, Lithography, Photoresist materials, Etching, Absorbance, Autoregressive models, Coating, Silicon

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Proceedings Article | 7 July 1997 Paper

Process techniques for improving post-exposure delay stability in chemically amplified resists

Sassan Nour, Edward Pavelchek, Tracy Lindsay, Matthew Moynihan, Lori Gambin

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275815

KEYWORDS: Silicon, Chemically amplified resists, Reflectivity, Diffusion, Antireflective coatings, Semiconducting wafers, Deep ultraviolet, Contamination, Temperature metrology, Critical dimension metrology

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Proceedings Article | 14 June 1996 Paper

Highly absorbing ARC for DUV lithography

Edward Pavelchek, James Meador, Douglas Guerrero, James Lamb, Ajit Kache, Manuel doCanto, Timothy Adams, David Stark, Daniel Miller

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241867

KEYWORDS: Photoresist materials, Etching, Coating, Absorbance, Silicon, Oxides, Lithography, Deep ultraviolet, Antireflective coatings, Reflectivity

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SPIE Journal Paper | 1 October 1993

Process techniques for improving performance of positive tone silylation

Edward Pavelchek, Gary Calabrese, John Bohland, Bruce Dudley, Susan Jones, Peter Freeman

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.146858

KEYWORDS: Silicon, Semiconducting wafers, Photoresist processing, Scanning electron microscopy, Reactive ion etching, Etching, Deep ultraviolet, Image processing, Glasses, Manufacturing

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Proceedings Article | 15 September 1993 Paper

Processing techniques for improving performance of positive-tone silylation

Edward Pavelchek, Gary Calabrese, Bruce Dudley, Susan Jones, Peter Freeman, John Bohland, Roger Sinta

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154760

KEYWORDS: Silicon, Photoresist processing, Semiconducting wafers, Scanning electron microscopy, Reactive ion etching, Etching, Manufacturing, Image processing, Very large scale integration, Deep ultraviolet

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Proceedings Article | 1 June 1992 Paper

Toward the development of a stable chemically amplified DUV positive photoresist

James Thackeray, Diane Canistro, Mark Denison, Joseph Ferrari, Richard Hemond, David Medeiros, George Orsula, Edward Pavelchek, Martha Rajaratnam, Roger Sinta

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59722

KEYWORDS: Deep ultraviolet, Photoresist materials, Photoresist developing, Absorbance, Transparency, Chemically amplified resists, Lithography, Temperature metrology, Excimer lasers, Industrial chemicals

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Proceedings Article | 1 June 1992 Paper

Positive-tone surface imaging: methodologies for analysis and process control

Susan Jones, Peter Freeman, Edward Pavelchek, John Bohland, Bruce Dudley, Gary Calabrese

Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59843

KEYWORDS: Silicon, Process control, Photoresist processing, Plasma, Scanning electron microscopy, Image processing, Integrated circuits, Metrology, Inspection, Semiconducting wafers

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Proceedings Article | 1 July 1991 Paper

Techniques for characterization of silicon penetration during DUV surface imaging

Peter Freeman, John Bohland, Edward Pavelchek, Susan Jones, Bruce Dudley, Stephen Bobbio

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44450

KEYWORDS: Silicon, Etching, Plasma, Deep ultraviolet, Scanning electron microscopy, Photoresist processing, Photomicroscopy, Plasma etching, Backscatter, Photoresist materials

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Proceedings Article | 1 July 1991 Paper

Characterization of wavelength offset for optimization of deep-UV stepper performance

Susan Jones, Bruce Dudley, Charles Peters, Mark Kellam, Edward Pavelchek

Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44465

KEYWORDS: Metrology, Monochromatic aberrations, Distortion, Scanning electron microscopy, Semiconducting wafers, Inspection, Photomasks, Resistance, Integrated circuits, Process control

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Proceedings Article | 1 June 1991 Paper

Novel surface imaging masking technique for high-aspect-ratio dry etching applications

Gary Calabrese, Livingstone Abali, John Bohland, Edward Pavelchek, Prasit Sricharoenchaikit, Gerald Vizvary, Stephen Bobbio, Patrick Smith

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46401

KEYWORDS: Photoresist materials, Etching, Nickel, Photoresist developing, Metals, Aluminum, Printing, Plasma etching, Transmission electron microscopy, Palladium

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Proceedings Article | 1 June 1991 Paper

Dissolution inhibition mechanism of ANR photoresists: crosslinking vs. -OH site consumption

James Thackeray, George Orsula, Martha Rajaratnam, Roger Sinta, Daniel Herr, Edward Pavelchek

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46357

KEYWORDS: Polymers, Photoresist materials, Deep ultraviolet, Excimer lasers, Chromatography, Lithography, Photoresist developing, Oxygen, Oxides, Silicon

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Showing 5 of 21 publications

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