Dr. Scott W. LeFevre Profile

Dr. Scott W. LeFevre

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Publications (4)

Proceedings Article | 1 May 2023 Presentation + Paper

Characterization of TSV etch from a sustainability standpoint

Osakpolo Isowamwen, Nathan Marchack, Devi Koty, Qingyun Yang, Hien Nguyen, Steve Molis, Scott Lefevre, Marco Hopstaken, Andy Metz, Jeff Shearer, Robert Bruce

Proceedings Volume 12499, 124990H (2023) https://doi.org/10.1117/12.2658564

KEYWORDS: Etching, Passivation, Ions, Sustainability, Plasma etching, Scanning electron microscopy, Semiconductors, Semiconductor manufacturing, Semiconducting wafers, Plasma

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Proceedings Article | 25 May 2022 Presentation + Paper

Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperatures

John Papalia, Devi Koty, Nathan Marchack, Scott Lefevre, Qingyun Yang, Aelan Mosden, Sebastian Engelmann, Robert Bruce

Proceedings Volume 12056, 1205603 (2022) https://doi.org/10.1117/12.2614264

KEYWORDS: Etching, Polymers, Diffusion, Plasma etching, Ions, Silicon, Plasma, Semiconducting wafers, Scanning electron microscopy, Deep reactive ion etching, Reactive ion etching, Packaging

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Proceedings Article | 27 March 2017 Paper

DSA patterning options for logics and memory applications

Chi-Chun Liu, Elliott Franke, Yann Mignot, Scott LeFevre, Stuart Sieg, Cheng Chi, Luciana Meli, Doni Parnell, Kristin Schmidt, Martha Sanchez, Lovejeet Singh, Tsuyoshi Furukawa, Indira Seshadri, Ekmini Anuja De Silva, Hsinyu Tsai, Kafai Lai, Hoa Truong, Richard Farrell, Robert Bruce, Mark Somervell, Daniel Sanders, Nelson Felix, John Arnold, David Hetzer, Akiteru Ko, Andrew Metz, Matthew Colburn, Daniel Corliss

Proceedings Volume 10146, 1014603 (2017) https://doi.org/10.1117/12.2260479

KEYWORDS: Directed self assembly, Plasma etching, Optical lithography, Etching, Logic, Lithography, Manufacturing, Nanofabrication, Silicon, Metals, Extreme ultraviolet, Line edge roughness, Optical alignment, Critical dimension metrology

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Proceedings Article | 13 September 2007 Paper

Solubility- and temperature-driven thin film structures of polymeric thiophene derivatives for high performance OFET applications

Scott LeFevre, Zhenan Bao, Chang Ryu, Richard Siegel, Hoichang Yang

Proceedings Volume 6658, 665812 (2007) https://doi.org/10.1117/12.734032

KEYWORDS: Crystals, Polymers, Chlorine, Field effect transistors, Thin films, Grazing incidence, Atomic force microscopy, Semiconductors, Annealing, Polymer thin films

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