Dr. Hari Pathangi Profile

Dr. Hari Pathangi

at KLA Corp.

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 23 March 2020 Paper

Optical defect inspection solution for EUV stochastics detection

Vidyasagar Anantha, Raghav Babulnath, Veikunth Kannan, Garima Sharma, Shubham Kumar, Kaushik Sah, Andrew Cross, Rahul Lakhawat, Hari Pathangi, Peter De Bisschop

Proceedings Volume 11323, 113231J (2020) https://doi.org/10.1117/12.2552452

KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Semiconducting wafers, Modulation, EUV optics, Defect inspection, Wafer-level optics, Defect detection

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SPIE Journal Paper | 11 April 2017

Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations

Vassilios Constantoudis, George Papavieros, Evangelos Gogolides, Alessandro Vaglio Pret, Hari Pathangi, Roel Gronheid

JM3, Vol. 16, Issue 02, 024001, (April 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.024001

KEYWORDS: Directed self assembly, Line edge roughness, Line width roughness, Lithography, Metrology, Scanning electron microscopy, Silicon, Critical dimension metrology, Image segmentation, Picosecond phenomena

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Proceedings Article | 1 April 2016 Paper

Improved cost-effectiveness of the block co-polymer anneal process for DSA

Hari Pathangi, Maarten Stokhof, Werner Knaepen, Varun Vaid, Arindam Mallik, Boon Teik Chan, Nadia Vandenbroeck, Jan Willem Maes, Roel Gronheid

Proceedings Volume 9777, 97771Z (2016) https://doi.org/10.1117/12.2220043

KEYWORDS: Directed self assembly, Optical lithography, Annealing, Semiconducting wafers, Front end of line, Etching, Lithography, Photoresist materials, Chemical vapor deposition, Atmospheric plasma

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Proceedings Article | 25 March 2016 Paper

Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations

Vassilios Constantoudis, Vijaya-Kumar Kuppuswamy, Evangelos Gogolides, Alessandro Pret, Hari Pathangi, Roel Gronheid

Proceedings Volume 9778, 97781X (2016) https://doi.org/10.1117/12.2230849

KEYWORDS: Metrology, Line edge roughness, Line width roughness, Lithography, Silicon, Picosecond phenomena, Nanostructures, Correlation function, Nanolithography, Nanotechnology, Neodymium, Critical dimension metrology, Ions, Scanning electron microscopy

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Proceedings Article | 22 March 2016 Paper

DSA materials contributions to the defectivity performance of 14nm half-pitch LiNe flow at IMEC

Hari Pathangi, Varun Vaid, Boon Teik Chan, Nadia Vandenbroeck, Jin Li, Sung Eun Hong, Yi Cao, Baskaran Durairaj, Guanyang Lin, Mark Somervell, Takahiro Kitano, Ryota Harukawa, Kaushik Sah, Andrew Cross, Hareen Bayana, Lucia D’Urzo, Roel Gronheid

Proceedings Volume 9777, 97770G (2016) https://doi.org/10.1117/12.2219936

KEYWORDS: Directed self assembly, Metrology, Optical lithography, Silicon, Semiconducting wafers, Etching, Bridges, Polymers, Manufacturing, Scanning electron microscopy, Epitaxy, Lithography, Thin film coatings

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SPIE Journal Paper | 2 July 2015

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Marco Polli, Lucia D’Urzo, Roel Gronheid, Paul Nealey

JM3, Vol. 14, Issue 03, 031204, (July 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.031204

KEYWORDS: Etching, Scanning electron microscopy, Silicon, Inspection, Semiconducting wafers, Diffractive optical elements, Defect inspection, Thin film coatings, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

The use of eDR-71xx for DSA defect review and automated classification

Hari Pathangi, Dieter Van Den Heuvel, Hareen Bayana, Loemba Bouckou, Jim Brown, Paolo Parisi, Rohan Gosain

Proceedings Volume 9424, 94242F (2015) https://doi.org/10.1117/12.2085902

KEYWORDS: Image quality, Bridges, Defect inspection, Inspection, Semiconducting wafers, Scanning electron microscopy, Image classification, Metrology, Silicon, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Hari Pathangi, Boon Teik Chan, Hareen Bayana, Nadia Vandenbroeck, Dieter Van Den Heuvel, Lieve Van Look, Paulina Rincon-Delgadillo, Yi Cao, JiHoon Kim, Guanyang Lin, Doni Parnell, Kathleen Nafus, Ryota Harukawa, Ito Chikashi, Venkat Nagaswami, Lucia D'Urzo, Roel Gronheid, Paul Nealey

Proceedings Volume 9423, 94230M (2015) https://doi.org/10.1117/12.2085889

KEYWORDS: Etching, Silicon, Bridges, Scanning electron microscopy, Inspection, Diffractive optical elements, Semiconducting wafers, Thin film coatings, Defect inspection, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Roel Gronheid, Paulina Rincon Delgadillo, Hari Pathangi, Dieter Van den Heuvel, Doni Parnell, Boon Teik Chan, Yu-Tsung Lee, Lieve Van Look, Yi Cao, YoungJun Her, Guanyang Lin, Ryota Harukawa, Venkat Nagaswami, Lucia D'Urzo, Mark Somervell, Paul Nealey

Proceedings Volume 9049, 904905 (2014) https://doi.org/10.1117/12.2047265

KEYWORDS: Etching, Inspection, Silicon, Semiconducting wafers, Scanning electron microscopy, Defect inspection, Polymethylmethacrylate, Particles, Critical dimension metrology, Directed self assembly

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Showing 5 of 9 publications

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