Ms. Melia Tjio Profile

Melia Tjio

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Publications (9)

Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Customization and design of directed self-assembly using hybrid prepatterns

Joy Cheng, Gregory Doerk, Charles Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Hsinyu Tsai, Chi-Chun Liu, Michael Guillorn, Daniel Sanders

Proceedings Volume 9423, 942307 (2015) https://doi.org/10.1117/12.2086973

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, System on a chip, Scanning electron microscopy, Image segmentation, Photomasks, Etching, Electron beam lithography, Composites, Directed self assembly

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Proceedings Article | 31 March 2014 Paper

Computational lithography platform for 193i-guided directed self-assembly

Kafai Lai, Melih Ozlem, Jed Pitera, Chi-chun Liu, Anthony Schepis, Daniel Dechene, Azalia Krasnoperova, Daniel Brue, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Rasit Topalogu, Moutaz Fakhry, Neal Lafferty

Proceedings Volume 9052, 90521A (2014) https://doi.org/10.1117/12.2046920

KEYWORDS: 3D modeling, Monte Carlo methods, Computational lithography, Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Instrument modeling, Optical lithography, Directed self assembly

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Proceedings Article | 28 March 2014 Paper

Towards electrical testable SOI devices using Directed Self-Assembly for fin formation

Chi-Chun Liu, Cristina Estrada-Raygoza, Hong He, Michael Cicoria, Vinayak Rastogi, Nihar Mohanty, Hsinyu Tsai, Anthony Schepis, Kafai Lai, Robin Chao, Derrick Liu, Michael Guillorn, Jason Cantone, Sylvie Mignot, Ryoung-Han Kim, Joy Cheng, Melia Tjio, Akiteru Ko, David Hetzer, Mark Somervell, Matthew Colburn

Proceedings Volume 9049, 904909 (2014) https://doi.org/10.1117/12.2046462

KEYWORDS: Etching, Silicon, Polymethylmethacrylate, Semiconducting wafers, Scatterometry, Image processing, 3D modeling, Line edge roughness, Defect detection, Directed self assembly

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Proceedings Article | 12 April 2013 Paper

Computational aspects of optical lithography extension by directed self-assembly

Kafai Lai, Chi-chun Liu, Jed Pitera, Daniel Dechene, Anthony Schepis, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Charles Rettner, Olalekan Odesanya, Melih Ozlem, Neal Lafferty

Proceedings Volume 8683, 868304 (2013) https://doi.org/10.1117/12.2012440

KEYWORDS: Photomasks, Optical lithography, Lithography, Optical proximity correction, Source mask optimization, 3D modeling, Extreme ultraviolet, Semiconducting wafers, Data modeling, Directed self assembly

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Proceedings Article | 26 March 2013 Paper

Directed self-assembly process implementation in a 300mm pilot line environment

Chi-Chun Liu, I. Cristina Estrada-Raygoza, Jassem Abdallah, Steven Holmes, Yunpeng Yin, Anthony Schepis, Michael Cicoria, David Hetzer, Hsinyu Tsai, Michael Guillorn, Melia Tjio, Joy Cheng, Mark Somervell, Matthew Colburn

Proceedings Volume 8680, 86801G (2013) https://doi.org/10.1117/12.2011610

KEYWORDS: Critical dimension metrology, Etching, Line width roughness, Semiconducting wafers, Optical lithography, Lithography, Chemical reactions, Photoresist processing, Polymethylmethacrylate, Directed self assembly

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Proceedings Article | 16 April 2012 Paper

Directed self-assembly defectivity assessment. Part II

Chris Bencher, He Yi, Jessica Zhou, Manping Cai, Jeffrey Smith, Liyan Miao, Ofir Montal, Shiran Blitshtein, Alon Lavi, Kfir Dotan, Huixiong Dai, Joy Cheng, Daniel Sanders, Melia Tjio, Steven Holmes

Proceedings Volume 8323, 83230N (2012) https://doi.org/10.1117/12.917993

KEYWORDS: Polymethylmethacrylate, Metrology, Image registration, Scanning electron microscopy, Inspection, Semiconducting wafers, Signal to noise ratio, Polymers, Optical lithography, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy

Chi-Chun Liu, Jed Pitera, Neal Lafferty, Kafai Lai, Charles Rettner, Melia Tjio, Noel Arellano, Joy Cheng

Proceedings Volume 8323, 83230X (2012) https://doi.org/10.1117/12.916525

KEYWORDS: Performance modeling, Monte Carlo methods, Optical proximity correction, Photomasks, Lithography, 3D modeling, Photoresist processing, Electron beam lithography, Double patterning technology, Directed self assembly

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Proceedings Article | 2 April 2011 Paper

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

Chris Bencher, Jeffrey Smith, Liyan Miao, Cathy Cai, Yongmei Chen, Joy Cheng, Daniel Sanders, Melia Tjio, Hoa Truong, Steven Holmes, William Hinsberg

Proceedings Volume 7970, 79700F (2011) https://doi.org/10.1117/12.881293

KEYWORDS: Semiconducting wafers, Optical lithography, Etching, Polymers, Lithography, Semiconductors, Inspection, Chemical vapor deposition, Silicon, Directed self assembly

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Showing 5 of 9 publications

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