Mr. Moutaz Fakhry Profile

Moutaz Fakhry

Program Manager at Advanced Micro Devices Inc

SPIE Involvement:

Author

Area of Expertise:

Lithography , Source mask optimization

Publications (13)

Proceedings Article | 18 March 2019 Presentation

Pattern-aware diagnostics: using high-performance pattern analysis to identify defect root cause (Conference Presentation)

Jason Cain, Abdullah Yassine, Moutaz Fakhry, Piyush Pathak, Jeffrey Nelson, Frank Gennari, Ya-Chieh Lai

Proceedings Volume 10962, 1096209 (2019) https://doi.org/10.1117/12.2516571

KEYWORDS: Diagnostics, Failure analysis, Machine learning, Feature extraction, Inspection, High volume manufacturing, Silicon

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Proceedings Article | 10 April 2018 Presentation + Paper

Applying machine learning to pattern analysis for automated in-design layout optimization

Jason Cain, Moutaz Fakhry, Piyush Pathak, Jason Sweis, Frank Gennari, Ya-Chieh Lai

Proceedings Volume 10588, 1058805 (2018) https://doi.org/10.1117/12.2299492

KEYWORDS: Machine learning, Data modeling, Model-based design, Testing and analysis, Manufacturing, Lithography, Design for manufacturing, Feature extraction

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Proceedings Article | 4 April 2018 Presentation + Paper

Litho friendly via insertion with in-design auto-fix flow using machine learning

Ahmed Mounir Elsemary, Moutaz Fakhry, Janam Bakshi, Nishant Shah, Mohamed Ismail, Fadi Batarseh, Uwe Paul Schroeder, Ahmed Mohyeldin, Jason Cain

Proceedings Volume 10588, 105880F (2018) https://doi.org/10.1117/12.2297499

KEYWORDS: Lithography, Metals, Optical lithography, Manufacturing, Machine learning, Image classification, Design for manufacturing, Library classification systems, Pattern recognition

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Proceedings Article | 30 March 2017 Paper

Pattern-based analytics to estimate and track yield risk of designs down to 7nm

Jason Cain, Moutaz Fakhry, Piyush Pathak, Jason Sweis, Frank Gennari, Ya-Chieh Lai

Proceedings Volume 10148, 1014805 (2017) https://doi.org/10.1117/12.2262363

KEYWORDS: Databases, Process modeling, Analytics, Design for manufacturability, Design for manufacturing, Yield improvement, Silicon, Model-based design, Statistical analysis, Product engineering, Metals, Optical lithography, Charge-coupled devices, Computer simulations, Manufacturing, Logic, Optical proximity correction, Digital electronics

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Proceedings Article | 16 March 2016 Paper

Pattern-based DTCO flow for early estimation of lithographic difficulty using optical image processing

Moutaz Fakhry, Kareem Madkour, Wael ElManhawy, Jason Cain, Joe Kwan

Proceedings Volume 9781, 97810I (2016) https://doi.org/10.1117/12.2219506

KEYWORDS: Optical lithography, Image processing, Design for manufacturing, Manufacturing, Lithography, Design for manufacturability, Optical proximity correction, Model-based design, Image quality, Resolution enhancement technologies

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Proceedings Article | 31 March 2014 Paper

Computational lithography platform for 193i-guided directed self-assembly

Kafai Lai, Melih Ozlem, Jed Pitera, Chi-chun Liu, Anthony Schepis, Daniel Dechene, Azalia Krasnoperova, Daniel Brue, Jassem Abdallah, Hsinyu Tsai, Mike Guillorn, Joy Cheng, Gregory Doerk, Melia Tjio, Rasit Topalogu, Moutaz Fakhry, Neal Lafferty

Proceedings Volume 9052, 90521A (2014) https://doi.org/10.1117/12.2046920

KEYWORDS: 3D modeling, Monte Carlo methods, Computational lithography, Photomasks, Critical dimension metrology, Lithography, Photoresist processing, Instrument modeling, Optical lithography, Directed self assembly

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Proceedings Article | 14 October 2011 Paper

Total source mask optimization: high-capacity, resist modeling, and production-ready mask solution

Moutaz Fakhry, Yuri Granik, Kostas Adam, Kafai Lai

Proceedings Volume 8166, 81663M (2011) https://doi.org/10.1117/12.898860

KEYWORDS: Source mask optimization, Photomasks, Lithography, Optimization (mathematics), Photoresist processing, Manufacturing, Process modeling, Optical proximity correction, 193nm lithography, Lithographic illumination

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Proceedings Article | 23 March 2011 Paper

Applicability of global source mask optimization to 22/20nm node and beyond

Kehan Tian, Moutaz Fakhry, Aasutosh Dave, Alexander Tritchkov, Jaione Tirapu-Azpiroz, Alan Rosenbluth, David Melville, Masaharu Sakamoto, Tadanobu Inoue, Scott Mansfield, Alexander Wei, Young Kim, Bruce Durgan, Kostas Adam, Gabriel Berger, Gandharv Bhatara, Jason Meiring, Henning Haffner, Byung-Sung Kim

Proceedings Volume 7973, 79730C (2011) https://doi.org/10.1117/12.879703

KEYWORDS: Source mask optimization, Photomasks, Resolution enhancement technologies, Optical proximity correction, Tolerancing, Optical lithography, SRAF, Image processing, Lithography, Semiconducting wafers

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Proceedings Article | 16 March 2010 Paper

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations

David Melville, Alan Rosenbluth, Kehan Tian, Kafai Lai, Saeed Bagheri, Jaione Tirapu-Azpiroz, Jason Meiring, Scott Halle, Greg McIntyre, Tom Faure, Daniel Corliss, Azalia Krasnoperova, Lei Zhuang, Phil Strenski, Andreas Waechter, Laszlo Ladanyi, Francisco Barahona, Daniele Scarpazza, Jon Lee, Tadanobu Inoue, Masaharu Sakamoto, Hidemasa Muta, Alfred Wagner, Geoffrey Burr, Young Kim, Emily Gallagher, Mike Hibbs, Alexander Tritchkov, Yuri Granik, Moutaz Fakhry, Kostas Adam, Gabriel Berger, Michael Lam, Aasutosh Dave, Nick Cobb

Proceedings Volume 7640, 764006 (2010) https://doi.org/10.1117/12.846716

KEYWORDS: Source mask optimization, Photomasks, Metals, Lithography, Optical proximity correction, Line edge roughness, Resolution enhancement technologies, Diffractive optical elements, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 23 September 2009 Paper

Introducing process variability score for process window OPC optimization

Moutaz Fakhry, H. Maaty, A. Seoud

Proceedings Volume 7488, 748836 (2009) https://doi.org/10.1117/12.829714

KEYWORDS: Optical proximity correction, Photovoltaics, Visualization, Photomasks, Lead, Electroluminescence, Photomask technology, Current controlled current source, Shape analysis

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Proceedings Article | 16 March 2009 Paper

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan Rosenbluth, Saeed Bagheri, John Hoffnagle, Kehan Tian, David Melville, Jaione Tirapu-Azpiroz, Moutaz Fakhry, Young Kim, Scott Halle, Greg McIntyre, Alfred Wagner, Geoffrey Burr, Martin Burkhardt, Daniel Corliss, Emily Gallagher, Tom Faure, Michael Hibbs, Donis Flagello, Joerg Zimmermann, Bernhard Kneer, Frank Rohmund, Frank Hartung, Christoph Hennerkes, Manfred Maul, Robert Kazinczi, Andre Engelen, Rene Carpaij, Remco Groenendijk, Joost Hageman, Carsten Russ

Proceedings Volume 7274, 72740A (2009) https://doi.org/10.1117/12.814680

KEYWORDS: Photomasks, Source mask optimization, Diffractive optical elements, Manufacturing, Lithographic illumination, Lithography, Semiconducting wafers, Photovoltaics, Polarization, Printing

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Proceedings Article | 21 March 2007 Paper

Litho aware method for circuit timing/power analysis through process

R. Fathy, M. Al-Imam, H. Diab, M. Fakhry, J. A. Torres, B. Graupp, J. M. Brunet, M. Bahnas

Proceedings Volume 6521, 65210O (2007) https://doi.org/10.1117/12.711723

KEYWORDS: Lithography, Oscillators, Semiconducting wafers, Transistors, Visualization, Design for manufacturing, Integrated circuit design, Silicon, Process modeling, Etching

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Proceedings Article | 20 October 2006 Paper

Optimization of process window simulations for litho-friendly design framework

Mohamed Al-Imam, Andres Torres, Jean-Marie Brunet, Moutaz Fakhry, Rami Fathy

Proceedings Volume 6349, 63491C (2006) https://doi.org/10.1117/12.686313

KEYWORDS: Lithography, Image processing, Standards development, Photovoltaics, Capacitors, Visualization, Manufacturing, Silicon, Semiconducting wafers, Design for manufacturing

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Showing 5 of 13 publications

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