Mr. Wael ElManhawy Profile

Wael ElManhawy

Electronic Engineering at Siemens EDA

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Author

Publications (17)

Proceedings Article | 23 March 2020 Paper

Explore process weak patterns for manufacturing friendly design

Jet Jiang, Frank Hou, Gavin Li, Marfe Ma, Kuan Hu, Chunshan Du, Qijian Wan, Zhengfang Liu, Xinyi Hu, Elven Huang, Wael ElManhawy

Proceedings Volume 11328, 1132812 (2020) https://doi.org/10.1117/12.2551691

KEYWORDS: Machine learning, Data modeling, Semiconducting wafers, Manufacturing, Silicon, Design for manufacturability, Databases, Data analysis, Neural networks, Roads

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Proceedings Article | 23 March 2020 Presentation + Paper

Machine Learning using retarget data to improve accuracy of fast lithographic hotspot detection

Aliaa Kabeel, Wael ElManhawy, Joe Kwan, Asmaa Rabie, Mohamed Ismail, Ahmed Khater, Sarah Rizk

Proceedings Volume 11328, 1132803 (2020) https://doi.org/10.1117/12.2551827

KEYWORDS: Data modeling, Machine learning, Lithography, Manufacturing, Metals, Critical dimension metrology, Silicon, Photomasks, Etching, SRAF

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Proceedings Article | 23 March 2020 Paper

Approaches for full coverage physical design space exploration and analysis by synthetic layout generation

Marwah Shafee, Joe Kwan, Wael El-Manhawy, Aliaa Kabeel, Sarah Risk, Jongha Park, SeungJo Lee, Jin Hee Kim, Mostafa Alaa, Mohamed Bahnasawi, Abdelrahman Abdelrazek, Sherif Hammouda, Kareem Madkour, Nabil Sabry

Proceedings Volume 11328, 1132808 (2020) https://doi.org/10.1117/12.2551916

KEYWORDS: Manufacturing, Process engineering, Classification systems, Library classification systems, Image classification, Monte Carlo methods, Product engineering, Metals

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Proceedings Article | 20 March 2019 Paper

Machine learning to improve accuracy of fast lithographic hotspot detection

NamJae Kim, Kiheung Park, Jiwon Oh, Sangwoo Jung, Sangah Lee, Jae-hyun Kang, Seung Weon Paek, Kareem Madkour, Wael ElManhawy, Aliaa Kabeel, Ahmed ElGhoroury, Marwa Shafee, Asmaa Rabie, Joe Kwan

Proceedings Volume 10962, 1096216 (2019) https://doi.org/10.1117/12.2515139

KEYWORDS: Machine learning, Data modeling, Lithography, Neural networks, Manufacturing, Computer simulations, Design for manufacturability, Design for manufacturing, Feature extraction, Electronics

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Proceedings Article | 20 March 2018 Paper

A weak pattern random creation and scoring method for lithography process tuning

Meili Zhang, Guogui Deng, Mudan Wang, Shirui Yu, Xinyi Hu, Chunshan Du, Qijian Wan, Zhengfang Liu, Gensheng Gao, Aliaa Kabeel, Kareem Madkour, Wael ElManhawy, Joe Kwan

Proceedings Volume 10588, 105880U (2018) https://doi.org/10.1117/12.2297296

KEYWORDS: Analytical research, Reliability, Logic, Multilayers, Failure analysis, New and emerging technologies, Manufacturing, Visualization, Lithography

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Proceedings Article | 4 April 2017 Paper

Early stage hot spot analysis through standard cell base random pattern generation

Joong-Won Jeon, Jaewan Song, Jeong-Lim Kim, Seongyul Park, Seung-Hune Yang, Sooryong Lee, Hokyu Kang, Kareem Madkour, Wael ElManhawy, SeungJo Lee, Joe Kwan

Proceedings Volume 10148, 101480S (2017) https://doi.org/10.1117/12.2257830

KEYWORDS: Optical proximity correction, Lithography, Resolution enhancement technologies, Optical lithography, Logic, Standards development, Electroluminescence, Metals, Product engineering, Composites, Signal detection

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Proceedings Article | 4 April 2017 Paper

A random generation approach to pattern library creation for full chip lithographic simulation

Elain Zou, Sid Hong, Limei Liu, Lucas Huang, Legender Yang, Aliaa Kabeel, Kareem Madkour, Wael ElManhawy, Joe Kwan, Chunshan Du, Xinyi Hu, Qijian Wan, Recoo Zhang

Proceedings Volume 10148, 1014811 (2017) https://doi.org/10.1117/12.2258133

KEYWORDS: Standards development, Phase modulation, Probability theory, Design for manufacturability, Lithography, Library classification systems, Visualization, Image classification, Intellectual property, Monte Carlo methods, Computer simulations

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Proceedings Article | 4 April 2017 Paper

Litho hotspots fixing using model based algorithm

Meili Zhang, Shirui Yu, Zhibiao Mao, Marwa Shafee, Kareem Madkour, Wael ElManhawy, Joe Kwan, Xinyi Hu, Qijian Wan, Chunshan Du

Proceedings Volume 10148, 101481B (2017) https://doi.org/10.1117/12.2257630

KEYWORDS: Lithography, Metals, Process modeling, Design for manufacturing, Contact lenses, Model-based design, Manufacturing, Microelectronics, Roads, Visualization

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Proceedings Article | 16 March 2016 Paper

A random approach of test macro generation for early detection of hotspots

Jong-hyun Lee, Chin Kim, Minsoo Kang, Sungwook Hwang, Jae-seok Yang, Mohammed Harb, Mohamed Al-Imam, Kareem Madkour, Wael ElManhawy, Joe Kwan

Proceedings Volume 9781, 97810J (2016) https://doi.org/10.1117/12.2218806

KEYWORDS: New and emerging technologies, Process modeling, Design for manufacturing, Silicon, Design for manufacturability, Lithography, Visualization, Particles, Defect detection

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Proceedings Article | 16 March 2016 Paper

Design space exploration for early identification of yield limiting patterns

Helen Li, Elain Zou, Robben Lee, Sid Hong, Square Liu, JinYan Wang, Chunshan Du, Recco Zhang, Kareem Madkour, Hussein Ali, Danny Hsu, Aliaa Kabeel, Wael ElManhawy, Joe Kwan

Proceedings Volume 9781, 97810W (2016) https://doi.org/10.1117/12.2218540

KEYWORDS: Visualization, Legal, Double patterning technology, Acquisition tracking and pointing, Optical proximity correction, Roads, Manufacturing, Design for manufacturability, Resolution enhancement technologies, Lithography, Design for manufacturing, Optical lithography, Monte Carlo methods

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Proceedings Article | 16 March 2016 Paper

Pattern-based DTCO flow for early estimation of lithographic difficulty using optical image processing

Moutaz Fakhry, Kareem Madkour, Wael ElManhawy, Jason Cain, Joe Kwan

Proceedings Volume 9781, 97810I (2016) https://doi.org/10.1117/12.2219506

KEYWORDS: Resolution enhancement technologies, Image quality, Model-based design, Optical proximity correction, Design for manufacturability, Lithography, Manufacturing, Design for manufacturing, Image processing, Optical lithography

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Proceedings Article | 18 March 2015 Paper

High coverage of litho hotspot detection by weak pattern scoring

Jinho Park, NamJae Kim, Jae-hyun Kang, Seung Weon Paek, Steve Kwon, Marwah Shafee, Kareem Madkour, Wael ElManhawy, Joe Kwan, Jean-Marie Brunet

Proceedings Volume 9427, 942703 (2015) https://doi.org/10.1117/12.2087473

KEYWORDS: Phase modulation, Lithography, Image classification, Library classification systems, Visualization, Process modeling, Design for manufacturing, Manufacturing, Yield improvement, Land mines

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Achieving lithographic printability at advanced nodes (14nm and beyond) can impose significant restrictions on physical design, including large numbers of complex design rule checks (DRC) and compute-intensive detailed process model checking. Early identifying of yield-limiter hotspots is essential for both foundries and designers to significantly improve process maturity. A real challenge is to scan the design space to identify hotspots, and decide the proper course of action regarding each hotspot. Building a scored pattern library with real candidates for hotspots for both foundries and designers is of great value. Foundries are looking for the most used patterns to optimize their technology for and identify patterns that should be forbidden, while designers are looking for the patterns that are sensitive to their neighboring context to perform lithographic simulation with their context to decide if they are hotspots or not.[1] In this paper we propose a framework to data mine designs to obtain set of representative patterns of each design, our aim is to sample the designs at locations that can be potential yield limiting. Though our aim is to keep the total number of patterns as small as possible to limit the complexity, still the designer is free to generate layouts results in several million of patterns that define the whole design space. In order to handle the large number of patterns that represent the design building block constructs, we need to prioritize the patterns according to their importance. The proposed pattern classification methodology depends on giving scores to each pattern according to the severity of hotspots they cause, the probability of their presence in the design and the likelihood of causing a hotspot. The paper also shows how the scoring scheme helps foundries to optimize their master pattern libraries and priorities their efforts in 14nm technology and beyond. Moreover, the paper demonstrates how the hotspot scoring helps in improving the runtime of lithographic simulation verification by identifying which patterns need to be optimized to correctly describe candidate hotspots, so that only potential problematic patterns are simulated.

Proceedings Article | 28 March 2014 Paper

Model based multilayers fix for litho hotspots beyond 20nm node

Asmaa Rabie, Kareem Madkour, Kirolos George, Wael ElManhawy, Jean-Marie Brunet, Joe Kwan

Proceedings Volume 9053, 90530F (2014) https://doi.org/10.1117/12.2045744

KEYWORDS: Standards development, Bridges, Multilayers, Design for manufacturing, Visualization, Manufacturing, Lithography, Photomasks, Metals, Double patterning technology

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Proceedings Article | 29 March 2013 Paper

A novel algorithm for automatic arrays detection in a layout

Marwah Shafee, Jea-Woo Park, Ara Aslyan, Andres Torres, Kareem Madkour, Wael ElManhawy

Proceedings Volume 8684, 86840O (2013) https://doi.org/10.1117/12.2011413

KEYWORDS: Detector arrays, Computer aided design, Detection and tracking algorithms, Lithography, Optical proximity correction, Visualization, Resolution enhancement technologies, Electroluminescence, Integrated circuits, Manufacturing

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Proceedings Article | 29 March 2013 Paper

Model based hint for litho hotspot fixing beyond 20nm node

Jae-Hyun Kang, Byung-Moo Kim, Naya Ha, Hung bok Choi , Kee sup Kim , Sarah Mohamed, Kareem Madkour, Wael ElManhawy, Evan Lee, Jean-Marie Brunet, Joe Kwan

Proceedings Volume 8684, 86840N (2013) https://doi.org/10.1117/12.2011619

KEYWORDS: Lithography, Double patterning technology, Design for manufacturing, Resolution enhancement technologies, Manufacturing, Bridges, Visualization, Design for manufacturability, Metals, Electronics

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Proceedings Article | 15 March 2012 Paper

Advanced techniques for design assembly and characterization for the 14nm node with LFD using a black box API

Juliann Opitz, Andres Torres, Ioana Graur, Wael Manhawy, Suniti Kanodia, Marwah Shafee, Sarah Mohamed, Ahmed Hassand, Jeanne Bickford

Proceedings Volume 8327, 832711 (2012) https://doi.org/10.1117/12.916431

KEYWORDS: Interfaces, Resolution enhancement technologies, Visualization, Design for manufacturability, Lithography, Double patterning technology, Design for manufacturing, Optical lithography, Photomasks, Manufacturing

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Proceedings Article | 5 April 2011 Paper

Fast process-hotspot detection using compressed patterns

Peter Rezk, Wael ElManhawy

Proceedings Volume 7974, 79740V (2011) https://doi.org/10.1117/12.879548

KEYWORDS: Tolerancing, Lithography, Visualization, Electroluminescence, Roads, Design for manufacturing, Photomasks, Calibration, Design for manufacturability, Current controlled current source

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Showing 5 of 17 publications

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