Dr. Mark Ma
Engineer at Photronics Inc
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 9 September 2013 Paper
Doug Uzzel, Mark Ma, Shad Hedges, Saghir Munir
Proceedings Volume 8880, 88800B (2013) https://doi.org/10.1117/12.2027913
KEYWORDS: Inspection, Cadmium, Photomasks, Reticles, Opacity, Argon, Detection and tracking algorithms, Defect detection, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 28 June 2013 Paper
Proceedings Volume 8701, 870109 (2013) https://doi.org/10.1117/12.2027883
KEYWORDS: Etching, Quartz, Analytical research, Critical dimension metrology, Process control, Attenuators, Atomic force microscopy, Photomasks, Opacity, Image processing

Proceedings Article | 11 December 2009 Paper
Proceedings Volume 7520, 752017 (2009) https://doi.org/10.1117/12.838246
KEYWORDS: Photomasks, Lithography, SRAF, Quartz, Optical proximity correction, Etching, Critical dimension metrology, Manufacturing, Phase shifts, Lithographic illumination

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617122
KEYWORDS: Photomasks, Reticles, Inspection, Lithography, Semiconducting wafers, Data modeling, Failure analysis, Statistical analysis, 193nm lithography, Crystals

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617083
KEYWORDS: Photomasks, Ions, Inspection, Reticles, Raman spectroscopy, Crystals, Contamination, Chemical analysis, Fluorine, Lithography

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601010
KEYWORDS: Photomasks, Ions, Reticles, Contamination, Inspection, Crystals, Chemical analysis, Fluorine, Air contamination, Manufacturing

Proceedings Article | 6 December 2004 Paper
Mark Ma, Hyesook Hong, Yong Seok Choi, Chi-Chien Ho, Mark Mason, Randy McKee
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569309
KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, Resolution enhancement technologies, Semiconducting wafers, Reticles, Silicon, Design for manufacturing, Scanning electron microscopy, Metals

Proceedings Article | 17 December 2003 Paper
William Volk, Carl Hess, Wayne Ruch, Zongchang Yu, Weimin Ma, Lisa Fisher, Carl Vickery, Z. Mark Ma
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518071
KEYWORDS: Inspection, Reticles, Manufacturing, Photomasks, Prototyping, Metals, Semiconducting wafers, System on a chip, Transistors, Yield improvement

Proceedings Article | 1 August 2002 Paper
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476928
KEYWORDS: Photomasks, Critical dimension metrology, Pellicles, Semiconducting wafers, Reticles, Calibration, Etching, Photoresist processing, Process control, Metrology

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474512
KEYWORDS: Optical proximity correction, Critical dimension metrology, Cadmium sulfide, Scanning electron microscopy, Process modeling, Photomasks, Printing, Lithography, Calibration, 193nm lithography

Proceedings Article | 11 March 2002 Paper
Won Kim, Robert Bennett, Z. Mark Ma
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458310
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Etching, Dry etching, Photoresist processing, Scanning electron microscopy, Photomicroscopy, Mask making, Optical proximity correction

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435790
KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Inspection, Semiconducting wafers, Optical proximity correction, Scanners, Cadmium, Photoresist processing, Image processing

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435694
KEYWORDS: Polarization, Phase shifts, Photomasks, Optical lithography, Coherence (optics), Resolution enhancement technologies, Optical proximity correction, Light, Spatial coherence, Lithography

Proceedings Article | 29 June 1998 Paper
Z. Mark Ma, Andrew Andersson
Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310783
KEYWORDS: Printing, Reticles, Photomasks, Phase shifts, Semiconducting wafers, Imaging systems, Deep ultraviolet, Scanning electron microscopy, Diffraction, Binary data

Proceedings Article | 7 July 1997 Paper
Kent Ibsen, Mark Eickhoff, Z. Mark Ma, Sonya Shaw, Steven Carlson, H. Tomomatsu
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275972
KEYWORDS: Reticles, Semiconducting wafers, Lithography, Manufacturing, Photomasks, Wafer inspection, Inspection, Image processing, Defect inspection

Showing 5 of 15 publications
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