Dr. Mircea V. Dusa
Fellow/Founding Member of Technol. Development Ctr at Imec
SPIE Involvement:
Author | Instructor
Publications (133)

Proceedings Article | 12 November 2024 Presentation + Paper
Proceedings Volume 13216, 1321604 (2024) https://doi.org/10.1117/12.3047176
KEYWORDS: Metals, Optical lithography, Logic, Semiconducting wafers, Extreme ultraviolet lithography, Etching, Scanning electron microscopy, Lithography, Tin

Proceedings Article | 10 April 2024 Presentation + Paper
Syamashree Roy, Arame Thiam, Kaushik Sah, Yannick Feurprier, Nobuyuki Fukui, Kathleen Nafus, Kenichi Miyaguchi, Dieter Van den Heuvel, Balakumar Baskaran, Joost Bekaert, Andrew Cross, Mircea Dusa, Victor Blanco Carballo
Proceedings Volume 12953, 129530X (2024) https://doi.org/10.1117/12.3010868
KEYWORDS: Optical lithography, Semiconducting wafers, Logic, Scanning electron microscopy, Lithography, Design, Extreme ultraviolet

Proceedings Article | 26 May 2022 Presentation + Paper
Mihir Gupta, Paulina Rincon Delgadillo, Hyo Seon Suh, Sandip Halder, Mircea Dusa
Proceedings Volume 12053, 120530Q (2022) https://doi.org/10.1117/12.2616679
KEYWORDS: Critical dimension metrology, Statistical analysis, Scanning electron microscopy, Optical inspection, Materials processing, Inspection, Image processing, Metrology, Lithography

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11854, 118540C (2021) https://doi.org/10.1117/12.2600937
KEYWORDS: Stochastic processes, Semiconducting wafers, Ruthenium, Inspection, Extreme ultraviolet lithography, Line edge roughness

Proceedings Article | 12 October 2021 Poster + Presentation + Paper
Proceedings Volume 11854, 1185418 (2021) https://doi.org/10.1117/12.2600938
KEYWORDS: Etching, Logic, Critical dimension metrology, Inspection, Extreme ultraviolet lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Metrology, Diffractive optical elements

Proceedings Article | 24 March 2020 Presentation
Proceedings Volume 11329, 113290U (2020) https://doi.org/10.1117/12.2569606

Proceedings Article | 20 March 2020 Paper
Andrew D. Humphris, Alain Moussa, Mircea Dusa, Anne-Laure Charley, Elis Newham, Jenny Goulden, Lei Feng, Christopher Bevis
Proceedings Volume 11325, 113251M (2020) https://doi.org/10.1117/12.2552054
KEYWORDS: 3D image processing, Extreme ultraviolet lithography, Microscopes, 3D metrology, Extreme ultraviolet, Data analysis, Metrology, Statistical analysis, Finite element methods, Microscopy

Proceedings Article | 3 October 2018 Presentation + Paper
Proceedings Volume 10809, 108090N (2018) https://doi.org/10.1117/12.2503321
KEYWORDS: Source mask optimization, Semiconducting wafers, Scanners, Logic, Extreme ultraviolet lithography, Reticles, Extreme ultraviolet

Proceedings Article | 21 March 2018 Presentation + Paper
Proceedings Volume 10583, 105830L (2018) https://doi.org/10.1117/12.2299639
KEYWORDS: Etching, Tin, SRAF, Optical lithography, Logic, Extreme ultraviolet, Photomasks, Stochastic processes, Scanning electron microscopy, Photoresist processing

Proceedings Article | 24 March 2017 Presentation + Paper
Andrew Liang, Jan Hermans, Timothy Tran, Katja Viatkina, Chen-Wei Liang, Brandon Ward, Steven Chuang, Jengyi Yu, Greg Harm, Jelle Vandereyken, David Rio, Michael Kubis, Samantha Tan, Mircea Dusa, Akhil Singhal, Bart van Schravendijk, Girish Dixit, Nader Shamma, Rich Wise, Sirish Reddy
Proceedings Volume 10143, 1014319 (2017) https://doi.org/10.1117/12.2258192
KEYWORDS: Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Lithography, High volume manufacturing, Stochastic processes, Plasma etching, Reactive ion etching, Plasma enhanced chemical vapor deposition, Focus stacking software, Photomasks

Proceedings Article | 24 March 2017 Presentation + Paper
V. Blanco Carballo, J. Bekaert, M. Mao, B. Kutrzeba Kotowska, S. Larivière, I. Ciofi, R. Baert, R. H. Kim, E. Gallagher, E. Hendrickx, L. E. Tan, W. Gillijns, D. Trivkovic, P. Leray, S. Halder, M. Gallagher, F. Lazzarino, S. Paolillo, D. Wan, A. Mallik, Y. Sherazi, G. McIntyre, M. Dusa, P. Rusu, T. Hollink, T. Fliervoet, F. Wittebrood
Proceedings Volume 10143, 1014318 (2017) https://doi.org/10.1117/12.2258005
KEYWORDS: Metals, Extreme ultraviolet lithography, Optical lithography, Back end of line, Extreme ultraviolet, Etching, Semiconducting wafers, Logic, Critical dimension metrology, Tin

Proceedings Article | 24 March 2017 Paper
Michael Kubis, Rich Wise, Charlotte Chahine, Katja Viatkina, Samee Ur-Rehman, Geert Simons, Mircea Dusa, David Hellin, Daniel Sobieski, Wenzhe Zhang, Christiane Jehoul, Patrick Jaenen, Philippe Leray
Proceedings Volume 10147, 101470H (2017) https://doi.org/10.1117/12.2260000
KEYWORDS: Etching, Scanners, Semiconducting wafers, Optical lithography, Overlay metrology, Lithography, Immersion lithography, Metrology, Atomic force microscopy, Ions, Critical dimension metrology

Proceedings Article | 28 March 2016 Paper
P. Raghavan, F. Firouzi, L. Matti, P. Debacker, R. Baert, S. M. Y. Sherazi, D. Trivkovic, V. Gerousis, M. Dusa, J. Ryckaert, Z. Tokei, D. Verkest, G. McIntyre, K. Ronse
Proceedings Volume 9781, 97810Q (2016) https://doi.org/10.1117/12.2238928
KEYWORDS: Metals, Optical lithography, Resistance, Extreme ultraviolet, Capacitance, Semiconducting wafers, Logic, Optical design, Copper, Photomasks

Proceedings Article | 16 March 2016 Paper
Proceedings Volume 9781, 978107 (2016) https://doi.org/10.1117/12.2220019
KEYWORDS: Metals, Extreme ultraviolet, Optical lithography, Back end of line, Line edge roughness, Image processing, Image segmentation, Lithography, Extreme ultraviolet lithography, Printing

Proceedings Article | 15 March 2016 Paper
Michael Kubis, Rich Wise, Liesbeth Reijnen, Katja Viatkina, Patrick Jaenen, Melisa Luca, Guillaume Mernier, Charlotte Chahine, David Hellin, Benjamin Kam, Daniel Sobieski, Johan Vertommen, Jan Mulkens, Mircea Dusa, Girish Dixit, Nader Shamma, Philippe Leray
Proceedings Volume 9780, 978007 (2016) https://doi.org/10.1117/12.2220591
KEYWORDS: Critical dimension metrology, Etching, Lithography, Optical lithography, Scanners, Process control, Logic, Scatterometry, Photomasks, Plasma etching, Metrology

Proceedings Article | 18 March 2015 Paper
Bharani Chava, David Rio, Yasser Sherazi, Darko Trivkovic, Werner Gillijns, Peter Debacker, Praveen Raghavan, Ahmad Elsaid, Mircea Dusa, Abdelkarim Mercha, Julien Ryckaert, Diederik Verkest
Proceedings Volume 9427, 94270E (2015) https://doi.org/10.1117/12.2085739
KEYWORDS: Extreme ultraviolet, Photovoltaics, Deep ultraviolet, Standards development, Extreme ultraviolet lithography, Lithography, Photomasks, Source mask optimization, Scanners, Optical lithography

Proceedings Article | 18 March 2015 Paper
Sushil Sakhare, Darko Trivkovic, Tom Mountsier, Min-Soo Kim, Dan Mocuta, Julien Ryckaert, Abdelkarim Mercha, Diederik Verkest, Aaron Thean, Mircea Dusa
Proceedings Volume 9427, 94270O (2015) https://doi.org/10.1117/12.2086100
KEYWORDS: Optical lithography, Nano opto mechanical systems, Metals, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Critical dimension metrology, Scanners, Lithography, Reliability

Proceedings Article | 28 March 2014 Paper
Proceedings Volume 9053, 90530Q (2014) https://doi.org/10.1117/12.2048079
KEYWORDS: Metals, Extreme ultraviolet lithography, Optical lithography, Etching, Extreme ultraviolet, Argon, Logic, Lithography, Computational lithography, Double patterning technology

Proceedings Article | 12 April 2013 Paper
Tsann-Bim Chiou, Mircea Dusa, Alek Chen, David Pietromonaco
Proceedings Volume 8683, 86830R (2013) https://doi.org/10.1117/12.2025863
KEYWORDS: Lithography, Photomasks, Optical lithography, Extreme ultraviolet, Optical alignment, Source mask optimization, Image processing, Error analysis, Optical proximity correction, Electroluminescence

Proceedings Article | 16 April 2012 Paper
Proceedings Volume 8352, 835205 (2012) https://doi.org/10.1117/12.918495
KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Imaging systems, Reticles, Extreme ultraviolet, Electroluminescence, Critical dimension metrology, Lithography, Scanning electron microscopy

Proceedings Article | 5 April 2012 Paper
A.-L. Charley, M. Dusa, T.-B. Chiou, P. Leray, S. Cheng, A. Fumar-Pici
Proceedings Volume 8324, 83242I (2012) https://doi.org/10.1117/12.918028
KEYWORDS: Metrology, Critical dimension metrology, Optical proximity correction, Calibration, Lithography, Scanning electron microscopy, Scatterometry, Scatter measurement, 3D metrology, Cadmium

Proceedings Article | 14 March 2012 Paper
Proceedings Volume 8322, 832202 (2012) https://doi.org/10.1117/12.917616
KEYWORDS: Semiconducting wafers, Reticles, Optical alignment, Scanners, Extreme ultraviolet lithography, Overlay metrology, Critical dimension metrology, Extreme ultraviolet, Silicon, Manufacturing

Proceedings Article | 14 October 2011 Paper
Natalia Davydova, Eelco van Setten, Sang-In Han, Mark van de Kerkhof, Robert de Kruif, Dorothe Oorschot, John Zimmerman, Ad Lammers, Brid Connolly, Frank Driessen, Anton van Oosten, Mircea Dusa, Youri van Dommelen, Noreen Harned, Jiong Jiang, Wei Liu, Hoyoung Kang, Hua-yu Liu
Proceedings Volume 8166, 816624 (2011) https://doi.org/10.1117/12.896816
KEYWORDS: Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Apodization, Optical proximity correction, Photoresist processing, Scanners, Semiconducting wafers, Multilayers

Proceedings Article | 30 September 2011 Paper
Anne-Laure Charley, Philippe Leray, Koen D'havé, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen, Mircea Dusa
Proceedings Volume 8169, 81690Q (2011) https://doi.org/10.1117/12.897582
KEYWORDS: 3D metrology, Scatterometry, Critical dimension metrology, Metrology, Lithography, 3D modeling, Optical proximity correction, Diffraction, Calibration, Scatter measurement

Proceedings Article | 20 April 2011 Paper
Anne-Laure Charley, Philippe Leray, Koen D'havé, Shaunee Cheng, Paul Hinnen, Fahong Li, Peter Vanoppen, Mircea Dusa
Proceedings Volume 7971, 79712E (2011) https://doi.org/10.1117/12.881276
KEYWORDS: 3D metrology, Metrology, Critical dimension metrology, Lithography, Scatterometry, Scanning electron microscopy, Scatter measurement, 3D modeling, Optical proximity correction, Process control

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691K (2011) https://doi.org/10.1117/12.881690
KEYWORDS: Optical lithography, Etching, Extreme ultraviolet lithography, Optical proximity correction, Extreme ultraviolet, Lithography, Critical dimension metrology, Photomasks, Semiconducting wafers

Proceedings Article | 8 April 2011 Paper
Jan Hermans, David Laidler, Charles Pigneret, Andre van Dijk, Oleg Voznyi, Mircea Dusa, Eric Hendrickx
Proceedings Volume 7969, 79691M (2011) https://doi.org/10.1117/12.881088
KEYWORDS: Semiconducting wafers, Optical alignment, Reticles, Overlay metrology, Extreme ultraviolet lithography, Silicon, Scanners, Extreme ultraviolet, Coating, Thermal effects

Proceedings Article | 5 April 2011 Paper
Jo Finders, Mircea Dusa, Jan Mulkens, Yu Cao, Maryana Escalante
Proceedings Volume 7973, 79730U (2011) https://doi.org/10.1117/12.881598
KEYWORDS: Semiconducting wafers, Optical proximity correction, Optical lithography, Photomasks, Overlay metrology, Logic, Scanners, Reticles, Lithography, Etching

Proceedings Article | 2 April 2011 Paper
Natalia Davydova, Eelco van Setten, Robert de Kruif, Dorothe Oorschot, Mircea Dusa, Christian Wagner, Jiong Jiang, Wei Liu, Hoyoung Kang, Hua-yu Liu, Petra Spies, Nils Wiese, Markus Waiblinger
Proceedings Volume 7985, 79850X (2011) https://doi.org/10.1117/12.884504
KEYWORDS: Photomasks, Reflectivity, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction, 3D modeling, Data modeling, Reflection

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79730B (2011) https://doi.org/10.1117/12.881688
KEYWORDS: Logic, Lithium, Source mask optimization, Optical lithography, Double patterning technology, Surface plasmons, Transistors, Photovoltaics, Photomasks, Semiconducting wafers

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013009, (January 2011) https://doi.org/10.1117/12.10.1117/1.3541779
KEYWORDS: Pellicles, Semiconducting wafers, Critical dimension metrology, Reticles, Apodization, Lithography, Photomasks, Transmittance, Optical proximity correction, Phase shifts

SPIE Journal Paper | 1 January 2011
JM3, Vol. 10, Issue 1, 013008, (January 2011) https://doi.org/10.1117/12.10.1117/1.3541778
KEYWORDS: Source mask optimization, Photomasks, Diffractive optical elements, Semiconducting wafers, Scanners, Manufacturing, Double patterning technology, Fiber optic illuminators, Optical lithography, Lithographic illumination

Proceedings Article | 29 September 2010 Paper
Eelco van Setten, Dorothe Oorschot, Cheuk-Wah Man, Mircea Dusa, Robert de Kruif, Natalia Davydova, Kees Feenstra, Christian Wagner, Petra Spies, Nils Wiese, Markus Waiblinger
Proceedings Volume 7823, 78231O (2010) https://doi.org/10.1117/12.864247
KEYWORDS: Photomasks, Extreme ultraviolet, Critical dimension metrology, Reticles, Semiconducting wafers, Reflectivity, Extreme ultraviolet lithography, Optical proximity correction, Scanning electron microscopy, Etching

Proceedings Article | 8 June 2010 Paper
Robert Socha, Tejas Jhaveri, Mircea Dusa, Xiaofeng Liu, Luoqi Chen, Stephen Hsu, Zhipan Li, Andrzej Strojwas
Proceedings Volume 7748, 77480T (2010) https://doi.org/10.1117/12.865781
KEYWORDS: Source mask optimization, Photomasks, Photovoltaics, Logic, Feedback loops, Lithography, Metals, Electroluminescence, Diffractive optical elements, Manufacturing

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 763808 (2010) https://doi.org/10.1117/12.848444
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Data modeling, Scatterometry, Metrology, Lithography, Finite element methods, Reticles, Scatter measurement

Proceedings Article | 2 April 2010 Paper
Proceedings Volume 7638, 763809 (2010) https://doi.org/10.1117/12.848388
KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Metrology, Calibration, Control systems, Scatterometry, Process control, Reticles, Diffraction

Proceedings Article | 22 March 2010 Paper
Jo Finders, Mircea Dusa, Peter Nikolsky, Youri van Dommelen, Robert Watso, Tom Vandeweyer, Joost Beckaert, Bart Laenens, Lieve Van Look
Proceedings Volume 7640, 76400C (2010) https://doi.org/10.1117/12.848330
KEYWORDS: Metals, Logic, Tolerancing, Optical lithography, Semiconducting wafers, Reticles, Double patterning technology, Photomasks, Critical dimension metrology, Lithography

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 764019 (2010) https://doi.org/10.1117/12.846580
KEYWORDS: Photomasks, Metals, Lithography, Optical lithography, Logic, Source mask optimization, Photovoltaics, Optical proximity correction, Lithium, SRAF

Proceedings Article | 4 March 2010 Paper
J. Bekaert, B. Laenens, S. Verhaegen, L. Van Look, D. Trivkovic, F. Lazzarino, G. Vandenberghe, P. van Adrichem, R. Socha, S. Baron, M. C. Tsai, K. Ning, S. Hsu, H. Y. Liu, M. Mulder, A. Bouma, E. van der Heijden, O. Mouraille, K. Schreel, J. Finders, M. Dusa, J. Zimmermann, P. Gräupner, J. T. Neumann, C. Hennerkes
Proceedings Volume 7640, 764008 (2010) https://doi.org/10.1117/12.846918
KEYWORDS: Source mask optimization, Photomasks, Semiconducting wafers, Diffractive optical elements, Manufacturing, Double patterning technology, Scanners, Electroluminescence, Fiber optic illuminators, Optical lithography

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76401Y (2010) https://doi.org/10.1117/12.848219
KEYWORDS: Pellicles, Semiconducting wafers, Reticles, Lithography, Apodization, Photomasks, Transmittance, Optical proximity correction, Phase shifts, Solids

Proceedings Article | 12 December 2009 Paper
Proceedings Volume 7520, 752025 (2009) https://doi.org/10.1117/12.837495
KEYWORDS: Source mask optimization, Scanners, Photomasks, Reticles, Diffractive optical elements, Double patterning technology, Etching, Lithography, Error analysis

Proceedings Article | 11 May 2009 Paper
Eelco van Setten, Onno Wismans, Kees Grim, Jo Finders, Mircea Dusa, Robert Birkner, Rigo Richter, Thomas Scherübl
Proceedings Volume 7379, 737912 (2009) https://doi.org/10.1117/12.824279
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Seaborgium, Scanners, Binary data, Lithography, Scanning electron microscopy, Cadmium, Error analysis

Proceedings Article | 17 March 2009 Paper
Jo Finders, Mircea Dusa, Bert Vleeming, Timon Fliervoet, Birgitt Hepp, Henry Megens, Remco Groenendijk, John Quaedackers, Evert Mos, Christian Leewis, Frank Bornebroek, Mireille Maenhoudt, Marc Leblans, Tom Vandeweyer, Gayle Murdoch, Efrain Altamirano Sanchez
Proceedings Volume 7274, 72740R (2009) https://doi.org/10.1117/12.814091
KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Metrology, Scatterometry, Scanning electron microscopy, Scanners, Process control, Lithography, Optical lithography

Proceedings Article | 16 March 2009 Paper
Yuan He, Peter Engblom, Jianming Zhou, Eric Janda, Anton Devilliers, Bernd Geh, Erik Byers, Jasper Menger, Steve Hansen, Mircea Dusa
Proceedings Volume 7274, 72742P (2009) https://doi.org/10.1117/12.816417
KEYWORDS: Scanners, Printing, Semiconducting wafers, Reticles, Calibration, Metrology, Scatterometry, Data modeling, Cadmium, Scanning electron microscopy

SPIE Journal Paper | 1 January 2009
JM3, Vol. 8, Issue 01, 011004, (January 2009) https://doi.org/10.1117/12.10.1117/1.3023078
KEYWORDS: Photomasks, Reticles, Semiconducting wafers, Overlay metrology, Double patterning technology, Lithography, Image registration, Metrology, Critical dimension metrology, Extreme ultraviolet lithography

SPIE Journal Paper | 1 January 2009
Jo Finders, Mircea Dusa, Bert Vleeming, Birgitt Hepp, Mireille Maenhoudt, Shaunee Cheng, Tom Vandeweyer
JM3, Vol. 8, Issue 01, 011002, (January 2009) https://doi.org/10.1117/12.10.1117/1.3079349
KEYWORDS: Double patterning technology, Critical dimension metrology, Etching, Lithography, Photomasks, Reticles, Semiconducting wafers, Overlay metrology, Scanners, Optical lithography

Proceedings Article | 19 May 2008 Open Access Paper
Proceedings Volume 7028, 702810 (2008) https://doi.org/10.1117/12.796016
KEYWORDS: Etching, Critical dimension metrology, Lithography, Extreme ultraviolet, Double patterning technology, Reticles, Optical lithography, Scanners, Semiconducting wafers, Process control

Proceedings Article | 2 May 2008 Paper
Robert de Kruif, Karsten Bubke, Gert-Jan Janssen, Eddy van der Heijden, Jörg Fochler, Mircea Dusa, Jan Hendrik Peters, Paul de Haas, Brid Connolly
Proceedings Volume 6792, 679204 (2008) https://doi.org/10.1117/12.798515
KEYWORDS: Reticles, Semiconducting wafers, Photomasks, Lithography, Double patterning technology, Overlay metrology, Photoresist processing, Image registration

Proceedings Article | 2 May 2008 Paper
Eelco van Setten, Onno Wismans, Kees Grim, Jo Finders, Mircea Dusa, Robert Birkner, Rigo Richter, Thomas Scherübl
Proceedings Volume 6792, 67920K (2008) https://doi.org/10.1117/12.798603
KEYWORDS: Photomasks, Seaborgium, Binary data, Semiconducting wafers, Electroluminescence, Scanners, Scanning electron microscopy, Lithography, Critical dimension metrology, Optical proximity correction

Proceedings Article | 11 April 2008 Paper
Eelco van Setten, Onno Wismans, Kees Grim, Jo Finders, Mircea Dusa, Robert Birkner, Rigo Richter, Thomas Scherübl
Proceedings Volume 6924, 69244I (2008) https://doi.org/10.1117/12.773266
KEYWORDS: Photomasks, Binary data, Seaborgium, Semiconducting wafers, Critical dimension metrology, Scanners, Atrial fibrillation, Scanning electron microscopy, Electroluminescence, Reticles

Proceedings Article | 18 March 2008 Paper
Jo Finders, Mircea Dusa, Bert Vleeming, Henry Megens, Birgitt Hepp, Mireille Maenhoudt, Shaunee Cheng, Tom Vandeweyer
Proceedings Volume 6924, 692408 (2008) https://doi.org/10.1117/12.772780
KEYWORDS: Etching, Critical dimension metrology, Reticles, Double patterning technology, Semiconducting wafers, Overlay metrology, Optical lithography, Lithography, Scanners, Metrology

Proceedings Article | 12 March 2008 Paper
Staf Verhaegen, Stefan Cosemans, Mircea Dusa, Pol Marchal, Axel Nackaerts, Geert Vandenberghe, Wim Dehaene
Proceedings Volume 6925, 69250R (2008) https://doi.org/10.1117/12.773333
KEYWORDS: Transistors, Line width roughness, Critical dimension metrology, Monte Carlo methods, Double patterning technology, Optical lithography, Device simulation, Electroluminescence, Etching, Very large scale integration

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67301H (2007) https://doi.org/10.1117/12.747006
KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Overlay metrology, Image registration, Semiconducting wafers, Lithography, Double patterning technology, Extreme ultraviolet lithography, Metrology

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 65330L (2007) https://doi.org/10.1117/12.737109
KEYWORDS: Photomasks, Seaborgium, Binary data, Electroluminescence, Line width roughness, Phase shifts, Diffraction, Critical dimension metrology, Image processing, Chromium

Proceedings Article | 4 April 2007 Open Access Paper
Proceedings Volume 6518, 651802 (2007) https://doi.org/10.1117/12.721459
KEYWORDS: Double patterning technology, Lithography, Overlay metrology, Metrology, Optical lithography, Semiconducting wafers, Photomasks, Etching, Logic, Resolution enhancement technologies

Proceedings Article | 4 April 2007 Paper
Chandra Saru Saravanan, Srinivasan Nirmalgandhi, Oleg Kritsun, Alden Acheta, Richard Sandberg, Bruno La Fontaine, Harry Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici
Proceedings Volume 6518, 651806 (2007) https://doi.org/10.1117/12.712470
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scanners, Scatterometry, Finite element methods, Monochromatic aberrations, Reticles, Cadmium, Fused deposition modeling, Mathematical modeling

Proceedings Article | 27 March 2007 Paper
Mircea Dusa, John Quaedackers, Olaf Larsen, Jeroen Meessen, Eddy van der Heijden, Gerald Dicker, Onno Wismans, Paul de Haas, Koen van Ingen Schenau, Jo Finders, Bert Vleeming, Geert Storms, Patrick Jaenen, Shaunee Cheng, Mireille Maenhoudt
Proceedings Volume 6520, 65200G (2007) https://doi.org/10.1117/12.714278
KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Optical lithography, Overlay metrology, Critical dimension metrology, Lithography, Neodymium, Photomasks, Manufacturing

Proceedings Article | 26 March 2007 Paper
Oleg Kritsun, Bruno La Fontaine, Richard Sandberg, Alden Acheta, Harry Levinson, Kevin Lensing, Mircea Dusa, Jan Hauschild, Anita Pici, Chandra Saravanan, Kunie Primak, Rahul Korlahalli, Srinivasan Nirmalgandhi
Proceedings Volume 6520, 65200L (2007) https://doi.org/10.1117/12.715971
KEYWORDS: Semiconducting wafers, Scanners, Scatterometry, Critical dimension metrology, Metrology, Lithography, Modulation transfer functions, Cadmium, Spatial frequencies, Immersion lithography

Proceedings Article | 21 March 2007 Paper
Proceedings Volume 6521, 65210N (2007) https://doi.org/10.1117/12.713385
KEYWORDS: Transistors, Overlay metrology, Critical dimension metrology, Etching, Lithography, Semiconducting wafers, Statistical analysis, Instrument modeling, Logic

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634922 (2006) https://doi.org/10.1117/12.692921
KEYWORDS: Photomasks, Optical lithography, Optical proximity correction, Double patterning technology, Etching, Model-based design, Printing, Manufacturing, Critical dimension metrology, Photoresist processing

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634910 (2006) https://doi.org/10.1117/12.687747
KEYWORDS: Double patterning technology, Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Neodymium, Logic, Optical lithography, Scanners, Resolution enhancement technologies

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62830T (2006) https://doi.org/10.1117/12.681853
KEYWORDS: Photomasks, Double patterning technology, Optical proximity correction, Printing, Semiconducting wafers, Critical dimension metrology, Lithography, Feature extraction, 3D modeling, Manufacturing

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 61521Y (2006) https://doi.org/10.1117/12.659320
KEYWORDS: Oscillators, Semiconducting wafers, Etching, Critical dimension metrology, Transistors, Picosecond phenomena, Analog electronics, Digital electronics, Scanners, Annealing

Proceedings Article | 21 March 2006 Paper
Proceedings Volume 6154, 61540L (2006) https://doi.org/10.1117/12.661164
KEYWORDS: Seaborgium, Photomasks, Scanners, Lithography, Binary data, Critical dimension metrology, Modulation, Tolerancing, Reticles, Printing

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602092
KEYWORDS: Critical dimension metrology, Reticles, Semiconducting wafers, Error analysis, Lithography, Phase shifts, Photomasks, Stray light, Optical proximity correction, Monochromatic aberrations

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601188
KEYWORDS: Modulation transfer functions, Scanners, Light scattering, Lithography, Spatial frequencies, Scatterometry, Critical dimension metrology, Computer simulations, Semiconducting wafers, Optical microscopes

Proceedings Article | 10 May 2005 Paper
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599896
KEYWORDS: Semiconducting wafers, Metrology, Critical dimension metrology, Lithography, Reticles, Wafer-level optics, Scanners, Photoresist materials, Reflectivity, Reflectometry

Proceedings Article | 6 December 2004 Paper
Douglas Van Den Broeke, Xuelong Shi, Robert Socha, Tom Laidig, Uwe Hollerbach, Kurt Wampler, Stephen Hsu, J. Fung Chen, Noel Corcoran, Mircea Dusa, Jung Chul Park
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568692
KEYWORDS: Reticles, Resolution enhancement technologies, Printing, Scattering, Binary data, Manufacturing, Optical proximity correction, Photomasks, Model-based design, Algorithm development

Proceedings Article | 20 August 2004 Paper
Douglas Van Den Broeke, Thomas Laidig, J. Fung Chen, Kurt Wampler, Stephen Hsu, Xuelong Shi, Robert Socha, Mircea Dusa, Noel Corcoran
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557751
KEYWORDS: Reticles, Lithography, Resolution enhancement technologies, Manufacturing, Phase shifts, Photomasks, Printing, Lithographic illumination, Phase shifting, Semiconducting wafers

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536596
KEYWORDS: Monochromatic aberrations, Printing, Scanning electron microscopy, Interferometry, Spherical lenses, Target detection, Photomasks, Phase shifts, Scanners, Semiconducting wafers

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535292
KEYWORDS: Semiconducting wafers, Reticles, Metrology, Data modeling, Scanners, Monochromatic aberrations, Calibration, Photoresist materials, Image analysis, Matrices

Proceedings Article | 28 May 2004 Open Access Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535432
KEYWORDS: Polarization, Reticles, Photoresist materials, Photomasks, Chromium, Optical lithography, Semiconducting wafers, Sodium, Resolution enhancement technologies, Lithography

Proceedings Article | 24 May 2004 Paper
Hugo Cramer, Ton Kiers, Peter Vanoppen, Jeroen Meessen, Frans Blok, Mircea Dusa
Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.544249
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Metrology, Scanning electron microscopy, Reticles, Line width roughness, Atrial fibrillation, Scatterometry, Scanners, Lithography

Proceedings Article | 29 April 2004 Paper
Mircea Dusa, Richard Moerman, Bhanwar Singh, Paul Friedberg, Ray Hoobler, Terry Zavecs
Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.543786
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Lithography, Metrology, Error analysis, Scatterometry, Reticles, Photoresist processing, Statistical analysis, Finite element methods

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518603
KEYWORDS: Monochromatic aberrations, Printing, Photomasks, Point spread functions, Semiconducting wafers, Interferometry, Target detection, Electromagnetism, Phase shifts, Scanners

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.484987
KEYWORDS: Etching, Critical dimension metrology, Semiconducting wafers, Lithography, Process control, Optical lithography, Metrology, Cadmium, Stars, Silicon

Proceedings Article | 26 June 2003 Paper
Bruno La Fontaine, Jan Hauschild, Mircea Dusa, Alden Acheta, Eric Apelgren, Marc Boonman, Jouke Krist, Ashok Khathuria, Harry Levinson, Anita Fumar-Pici, Marco Pieters
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485535
KEYWORDS: Semiconducting wafers, Scanners, Etching, Silicon, Metrology, Lithography, Thin films, Computer simulations, Overlay metrology, Polishing

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485505
KEYWORDS: Monochromatic aberrations, Imaging systems, Photoresist processing, Lithography, Polymers, Image quality, Diffraction, Thin films, Electroluminescence, Deep ultraviolet

Proceedings Article | 2 June 2003 Paper
Weidong Yang, Roger Lowe-Webb, Silvio Rabello, Jiangtao Hu, Je-Yi Lin, John Heaton, Mircea Dusa, Arie den Boef, Maurits van der Schaar, Adolph Hunter
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483476
KEYWORDS: Overlay metrology, Diffraction, Diffraction gratings, Semiconducting wafers, Spectroscopy, Optical alignment, Imaging systems, Metrology, Error analysis, Optical design

Proceedings Article | 27 December 2002 Paper
Eric Hendrickx, Geert Vandenberghe, Kurt Ronse, Albert Colina, Alex van der Hoff, Mircea Dusa, Jo Finders
Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467912
KEYWORDS: Scanners, Data modeling, Diffraction, Monochromatic aberrations, Semiconducting wafers, Lithography, Lithographic illumination, Metrology, Overlay metrology, Scanning electron microscopy

Proceedings Article | 30 July 2002 Paper
Stephen Hsu, Noel Corcoran, Mark Eurlings, William Knose, Thomas Laidig, Kurt Wampler, Sabita Roy, Xuelong Shi, Chungwei Michael Hsu, J. Fung Chen, Jo Finders, Robert Socha, Mircea Dusa
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474596
KEYWORDS: Optical proximity correction, Photomasks, Reticles, Model-based design, Manufacturing, Semiconducting wafers, Scattering, Resolution enhancement technologies, Printing, Nanoimprint lithography

Proceedings Article | 30 July 2002 Paper
Bruno La Fontaine, Mircea Dusa, Jouke Krist, Alden Acheta, Jongwook Kye, Harry Levinson, Carlo Luijten, Craig Sager, Jack Thomas, Judith van Praagh
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474581
KEYWORDS: Semiconducting wafers, Error analysis, Reticles, Lithography, Scanners, Calibration, Prototyping, Sensors, Monochromatic aberrations, Image processing

Proceedings Article | 30 July 2002 Paper
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474598
KEYWORDS: Modulation transfer functions, Point spread functions, Spatial frequencies, Photomasks, Scanners, Modulation, Lithography, Light scattering, Semiconducting wafers, Critical dimension metrology

Proceedings Article | 16 July 2002 Paper
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473427
KEYWORDS: Scattering, Optical lithography, Destructive interference, Chromium, Reticles, Light scattering, Optical proximity correction, Image processing, Imaging systems, Printing

Proceedings Article | 16 July 2002 Paper
James Holden, Thomas Gubiotti, William McGahan, Mircea Dusa, Ton Kiers
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473439
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scatterometry, Lithography, Metrology, Scatter measurement, Process control, Reflectometry, Data modeling, Spectroscopic ellipsometry

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458261
KEYWORDS: Scattering, Optical lithography, Destructive interference, Light scattering, Reticles, Optical proximity correction, Image processing, Imaging systems, Chromium, Printing

Proceedings Article | 11 March 2002 Paper
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.443111
KEYWORDS: Photomasks, Binary data, Scanning electron microscopy, Optical testing, Nanoimprint lithography, Image quality, Phase shifts, Image enhancement, Metrology, Semiconducting wafers

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435664
KEYWORDS: Critical dimension metrology, Monochromatic aberrations, Lithographic illumination, Lithography, Photomasks, Zernike polynomials, Lenses, Semiconducting wafers, Lithographic lenses, Phase measurement

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435725
KEYWORDS: Reticles, Photoresist materials, Photomasks, Critical dimension metrology, Optical proximity correction, Binary data, Lithography, Manufacturing, Lithographic illumination, Coherence (optics)

Proceedings Article | 26 April 2001 Paper
Proceedings Volume 4404, (2001) https://doi.org/10.1117/12.425215
KEYWORDS: Atrial fibrillation, Electroluminescence, Lithographic illumination, Printing, Reticles, Lithography, Optical lithography, Photomasks, Manufacturing, Cadmium

Proceedings Article | 9 April 2001 Paper
Mircea Dusa, Judith van Praagh, Andrew Ridley, Bo So
Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425089
KEYWORDS: Photomasks, Optical proximity correction, Resolution enhancement technologies, Lithography, Lithographic illumination, Semiconducting wafers, Image processing, Scanners, Reticles, Calibration

Proceedings Article | 20 October 2000 Paper
Proceedings Volume 4226, (2000) https://doi.org/10.1117/12.404849
KEYWORDS: Photomasks, Optical lithography, Lithographic illumination, Phase shifts, Binary data, Lithography, Nanoimprint lithography, Scattering, Optical proximity correction, Printing

Proceedings Article | 19 July 2000 Paper
Gidon Gottlib, Yair Eran, Shirley Hemar, Amikam Sade, Wolfgang Staud, Mircea Dusa, Steve Warila
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392073
KEYWORDS: Reticles, Photomasks, System on a chip, Semiconducting wafers, Inspection, Manufacturing, Critical dimension metrology, Lithography, Detection and tracking algorithms, Process control

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389002
KEYWORDS: Lithography, Reticles, Lithographic illumination, Scattering, Photomasks, Critical dimension metrology, Optical proximity correction, Binary data, Diffraction, Manufacturing

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388951
KEYWORDS: Optical proximity correction, Reticles, Photomasks, Data modeling, Lithography, Binary data, Phase shifts, Resolution enhancement technologies, Lithographic illumination, Diffraction

Proceedings Article | 5 July 2000 Paper
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389047
KEYWORDS: Reticles, Photomasks, Optical proximity correction, Binary data, Critical dimension metrology, Photoresist materials, Manufacturing, Deep ultraviolet, 193nm lithography, Optical lithography

Proceedings Article | 5 July 2000 Paper
Michael Reilly, Colin Parker, Karen Kvam, Robert Socha, Mircea Dusa
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388959
KEYWORDS: Optical proximity correction, Photomasks, Scattering, Binary data, Deep ultraviolet, Manufacturing, Resolution enhancement technologies, Reticles, Lithography, Electroluminescence

Proceedings Article | 23 June 2000 Paper
Xuelong Shi, Allen Fung, Stephen Hsu, Zongyu Li, Timothy Nguyen, Robert Socha, Will Conley, Mircea Dusa
Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388369
KEYWORDS: Photoresist processing, Copper, Optical lithography, Dielectrics, Etching, Silicon, Aluminum, Metals, Tolerancing, Standards development

Proceedings Article | 2 June 2000 Paper
J. Fung Chen, Robert Socha, Kumar Puntambekar, Kurt Wampler, Roger Caldwell, Mircea Dusa, John Love, Greg Yeric, Brenda Stoner
Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386469
KEYWORDS: Reticles, Critical dimension metrology, Diffractive optical elements, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Photomasks, Monochromatic aberrations, Printing, Mask making

Proceedings Article | 30 December 1999 Paper
Kent Nakagawa, J. Fung Chen, Robert Socha, Mircea Dusa, Thomas Laidig, Kurt Wampler, Roger Caldwell, Douglas Van Den Broeke
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373382
KEYWORDS: Reticles, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Photomasks, Defect detection, Scattering, Inspection, Photoresist processing

Proceedings Article | 1 October 1999 Paper
Dan Nicolau, Susumu Yoshikawa, Mircea Dusa
Proceedings Volume 3892, (1999) https://doi.org/10.1117/12.364494
KEYWORDS: Lithography, Picture Archiving and Communication System, Absorbance, Photolysis, Systems modeling, Chemical species, Chemistry, Optical lithography, Computer simulations, Standards development

Proceedings Article | 25 August 1999 Paper
Robert Socha, Will Conley, Xuelong Shi, Mircea Dusa, John Petersen, J. Fung Chen, Kurt Wampler, Thomas Laidig, Roger Caldwell
Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360236
KEYWORDS: Critical dimension metrology, Monochromatic aberrations, Transmittance, Photomasks, Reticles, Phase shifts, Optical proximity correction, Printing, Lithography, Scattering

Proceedings Article | 25 August 1999 Paper
Kent Nakagawa, J. Fung Chen, Robert Socha, Thomas Laidig, Kurt Wampler, Douglas Van Den Broeke, Mircea Dusa, Roger Caldwell
Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360237
KEYWORDS: Halftones, Reticles, Semiconducting wafers, Inspection, Optical proximity correction, Scanning electron microscopy, Teeth, Control systems, Manufacturing, Semiconductors

Proceedings Article | 26 July 1999 Paper
Robert Socha, Xuelong Shi, Ken Holman, Mircea Dusa, Will Conley, John Petersen, J. Fung Chen, Thomas Laidig, Kurt Wampler, Roger Caldwell, M. Chu, Chung Jen Su, Kuei-Chun Hung, C. Chen, F. Wang, C. Le, Christophe Pierrat, Bo Su
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354355
KEYWORDS: Reticles, Photomasks, Phase shifts, Printing, Transmittance, Lithography, Bessel functions, Deep ultraviolet, Chromium, Quartz

Proceedings Article | 26 July 1999 Paper
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354336
KEYWORDS: Photomasks, Binary data, Optical proximity correction, Resolution enhancement technologies, Phase shifts, Semiconducting wafers, Reticles, SRAF, Lithography, Optical lithography

Proceedings Article | 14 June 1999 Paper
J. Fung Chen, Nathan Diachun, Kent Nakagawa, Robert Socha, Mircea Dusa, Thomas Laidig, Kurt Wampler, Roger Caldwell, Douglas Van Den Broeke
Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350858
KEYWORDS: Reticles, Optical proximity correction, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Cadmium, Scattering, Photoresist processing, Silicon, Defect inspection

Proceedings Article | 11 June 1999 Paper
Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350266
KEYWORDS: Diffusion, Optical proximity correction, Optical lithography, Chromium, Chemically amplified resists, Reticles, Deep ultraviolet, Scanning electron microscopy, Diffraction, Chemical reactions

Proceedings Article | 18 December 1998 Paper
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332862
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Reticles, Scattering, Error analysis, Scanning electron microscopy, Metrology, Dysprosium, Semiconductors

Proceedings Article | 8 June 1998 Paper
Stephen Hsu, Mircea Dusa, Joost Vlassak, Cameron Harker, Michelle Zimmerman
Proceedings Volume 3332, (1998) https://doi.org/10.1117/12.308744
KEYWORDS: Overlay metrology, Tungsten, Scanning electron microscopy, Chemical mechanical planarization, Semiconducting wafers, Oxides, Optical alignment, Polishing, Metrology, Edge detection

Proceedings Article | 14 November 1997 Paper
Proceedings Volume 3241, (1997) https://doi.org/10.1117/12.293500
KEYWORDS: Proteins, Electron beam lithography, Molecules, Lithography, Polymers, Chemistry, Polymethylmethacrylate, Printing, Fabrication, Photomasks

Proceedings Article | 7 July 1997 Paper
Mircea Dusa, Bo Su, Stephen Dellarochetta, Terrence Zavecz
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275989
KEYWORDS: Critical dimension metrology, Calibration, Monochromatic aberrations, Scanning electron microscopy, Electron microscopes, Diffraction

Proceedings Article | 24 July 1996 Paper
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245239
KEYWORDS: Reticles, Critical dimension metrology, Monochromatic aberrations, Semiconducting wafers, Lithography, Tolerancing, Error analysis, Wafer-level optics, Photomasks, Optical proximity correction

Proceedings Article | 14 June 1996 Paper
Dan Nicolau, Takahisa Taguchi, Hiroshi Taniguchi, Susumu Yoshikawa, Mircea Dusa
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241848
KEYWORDS: Optical lithography, Molecules, Photoresist materials, Chemistry, Near infrared, Polymers, Proteins, Glasses, Molecular biology, Photochemistry

Proceedings Article | 7 June 1996 Paper
Mircea Dusa, Stephen Dellarochetta, Allen Fung, Bo Su, Terrence Zavecz
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240922
KEYWORDS: Monochromatic aberrations, Data modeling, Distortion, Critical dimension metrology, Calibration, Scanning electron microscopy, Semiconducting wafers, Error analysis, Overlay metrology, Wavefronts

Proceedings Article | 3 July 1995 Paper
Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212778
KEYWORDS: Confocal microscopy, Edge roughness, Photomasks, Edge detection, Metrology, Imaging systems, Reflectivity, Lithography, Image quality, Critical dimension metrology

Proceedings Article | 22 May 1995 Paper
Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209207
KEYWORDS: Confocal microscopy, Edge roughness, Photomasks, Edge detection, Metrology, Imaging systems, Image quality, Halftones, Phase shifts, Reflectivity

Proceedings Article | 3 November 1994 Paper
Mircea Dusa, Erik Rauch
Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191947
KEYWORDS: Photomasks, Metrology, Lithographic illumination, Critical dimension metrology, Confocal microscopy, Lithography, X-ray technology, Control systems, Optical lithography, X-rays

Proceedings Article | 1 May 1994 Paper
Mircea Dusa, Guoqing Xiao, Erik Rauch, Joseph Pellegrini
Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174153
KEYWORDS: Optical metrology, Optimization (mathematics), Critical dimension metrology, Confocal microscopy, Algorithm development, Cadmium, Metrology

Proceedings Article | 15 February 1994 Paper
Mircea Dusa, Guoqing Xiao, Erik Rauch
Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167257
KEYWORDS: Photomasks, Metrology, Critical dimension metrology, Optical lithography, Image processing, Confocal microscopy, Opacity, Lenses, Software development, Control systems

Proceedings Article | 8 August 1993 Paper
Mircea Dusa, Linard Karklin, Mark Goldmann, William Gouin, George Mirth
Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150460
KEYWORDS: Photomasks, Fiber optic illuminators, Thin films, Image processing, Lithography, Oxides, Optical lithography, Photoresist processing, Statistical analysis, Reflectivity

Proceedings Article | 4 August 1993 Paper
Mircea Dusa, Guoqing Xiao, Frank Menagh, Erik Rauch, William Gouin, George Mirth
Proceedings Volume 1926, (1993) https://doi.org/10.1117/12.149008
KEYWORDS: Metrology, Confocal microscopy, Microscopy, Lithography, 3D metrology, Imaging systems, Oxides, Scanning electron microscopy, Optical lithography, Photomasks

Proceedings Article | 1 June 1992 Paper
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130321
KEYWORDS: Optical alignment, Phase shifts, Etching, Silicon, Diffraction, Semiconducting wafers, Diffraction gratings, Sensors, Fringe analysis, Optical lithography

Proceedings Article | 1 June 1992 Paper
Mircea Dusa, Tony DiBiase, Harris Keston
Proceedings Volume 1673, (1992) https://doi.org/10.1117/12.59781
KEYWORDS: Metrology, Semiconducting wafers, Process control, Critical dimension metrology, Integrated circuits, Inspection, Silicon, Laser processing, Confocal microscopy, Laser scanners

Proceedings Article | 1 February 1992 Paper
Dan Nicolau, Gheorghita Jinescu, Florin Fulga, Mircea Dusa
Proceedings Volume 1593, (1992) https://doi.org/10.1117/12.56916
KEYWORDS: Silicon, Diffusion, Plasma etching, Mathematical modeling, Etching, Polymers, Solids, Dry etching, Photoresist processing, Silver

Proceedings Article | 1 January 1992 Paper
Frank Menagh, Guoqing Xiao, Mircea Dusa
Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56956
KEYWORDS: Confocal microscopy, Photomasks, Optical microscopes, Submicron lithography, Scanning electron microscopy, Metrology, Video, Image resolution, Photoresist processing, Objectives

Proceedings Article | 1 August 1991 Paper
Dan Nicolau, Florin Fulga, Mircea Dusa
Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.28466
KEYWORDS: Diffusion, Polymers, Lithography, Silicon, X-ray lithography, Manganese, X-rays, Manufacturing, Mathematical modeling, Polymethylmethacrylate

Proceedings Article | 1 July 1991 Paper
Mircea Dusa, Christoph Jung, Paul Jung, Detlef Hogenkamp, Klaus-Dieter Roeth
Proceedings Volume 1464, (1991) https://doi.org/10.1117/12.44457
KEYWORDS: Inspection, Edge detection, Image processing, Integrated optics, Metrology, Optical inspection, Integrated circuits, Process control, Coherence (optics), Image quality

Proceedings Article | 1 July 1991 Paper
Jack Kasahara, Mircea Dusa, Thiloma Perera
Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44809
KEYWORDS: Silicon, Photoresist materials, Lithography, Photoresist developing, Oxides, Scanning electron microscopy, Thin films, Manufacturing, Optical lithography, Photomasks

Proceedings Article | 1 June 1991 Paper
Dan Nicolau, Mircea Dusa, Florin Fulga
Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46414
KEYWORDS: Diffusion, Silicon, Submicron lithography, Lithography, Image processing, Polymers, Optical lithography, Mathematical modeling, Independent component analysis, Picture Archiving and Communication System

Proceedings Article | 1 March 1991 Paper
Dan Nicolau, Florin Fulga, Mircea Dusa
Proceedings Volume 1468, (1991) https://doi.org/10.1117/12.45478
KEYWORDS: Optical lithography, Lithography, Artificial intelligence, Manufacturing, Image processing, Photoemission spectroscopy, Semiconductors, Device simulation, Semiconductor manufacturing, Contamination

Proceedings Article | 1 March 1991 Paper
Mircea Dusa, Klaus-Dieter Roeth, Christoph Jung
Proceedings Volume 1496, (1991) https://doi.org/10.1117/12.29754
KEYWORDS: Edge detection, Critical dimension metrology, Inspection, Objectives, Image quality, Silicon, Semiconducting wafers, Optical lithography, Tolerancing, Chromium

Proceedings Article | 1 June 1990 Paper
Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20110
KEYWORDS: Absorption, Lithography, Antireflective coatings, Dysprosium, Optical lithography, Image resolution, Traumatic brain injury, Doping, Chemistry, Picture Archiving and Communication System

Proceedings Article | 1 June 1990 Paper
Mircea Dusa, Dan Nicolau, Florin Fulga
Proceedings Volume 1264, (1990) https://doi.org/10.1117/12.20220
KEYWORDS: Image processing, Opacity, Optical lithography, Photoresist processing, Spectral resolution, Optical resolution, Lithography, Image resolution, Modeling, Simulation of CCA and DLA aggregates

Showing 5 of 133 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 22 March 2011

SPIE Conference Volume | 3 March 2010

SPIE Conference Volume | 13 March 2009

SPIE Conference Volume | 20 March 2008

Conference Committee Involvement (12)
SPIE Advanced Lithography
21 February 2016 | San Jose, United States
SPIE Advanced Lithography
22 February 2015 | San Jose, United States
SPIE Advanced Lithography
23 February 2014 | San Jose, United States
SPIE Advanced Lithography
24 February 2013 | San Jose, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Optical Microlithography XXIV
1 March 2011 | San Jose, California, United States
Optical Microlithography XXIII
23 February 2010 | San Jose, California, United States
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Optical Microlithography XXI
26 February 2008 | San Jose, California, United States
Optical Microlithography XX
27 February 2007 | San Jose, California, United States
Optical Microlithography XVIII
1 March 2005 | San Jose, California, United States
Optical Microlithography XVI
25 February 2003 | Santa Clara, California, United States
Showing 5 of 12 Conference Committees
Course Instructor
SC885: Principles and Practical Implementation of Multiple Patterning
This course provides attendees with a basic working knowledge of the fundamentals and implementation principles of what industry calls with a generic name "double patterning” but in reality it is a multi-patterning technology. This course will tackle the interdisciplinary characteristics of the multipatterning processes examining several pitch division techniques, from double to triple, quadruple or even more split steps, with focus on the key technology components, such as, but not limited to, (a) resolution and lithography options, (b) layout, ground rules and split compliance, (c) process and material, that are combined to create an electrically functional device layer from multiple patterning steps. We will discuss single to multiple patterning pitch-split practical implementations adding complementary and combinatorial techniques based on pitch-divided gratings connected with a cut and/or a block masking layer. The course presents the lithographic and patterning alternatives of various pitch-split techniques, for example, LithoEtch, LEn where n≥2 and multiple SelfAligned spacer film depositions, like SADP and SAQP. It will underline the interactions between layout style, split compliance, layer polarity, feature bias defined by split process characteristics and will draw attention to the constraints to integrate the pitch-split patterning steps into a complete CMOS process flow. In addition, the course provides information on the materials and material combinations used in multiple patterning processes illustrated by recent industry developments to increase the structural robustness of pitch divided high aspect ratio features and the anti-spacer / cut mask-less approach. Special attention is given to the unique characteristics of multiple patterning metrology and process control, in particular to model overlay effects into comprehensive CDU budgets supporting the tight process tolerances of the scaling nodes. The course examines the CDU and overlay budget contributors and defines basic requirements for metrology tools performances to support multipatterning. We will illustrate multipatterning utilization on today’s 3D transistors architecture, FinFet and Nanowires, applied on FEOL and BEOL layers, with unidirectional gratings and cuts or blocks that are needed to create the 2D layout intent. The course offers comprehensive analysis of the combinatorial multiple patterning flows, LE^n, SADP, SAQP with associated cut or block masking layers based on the new Edge Placement Error, EPE, metric, assessing pattern quality for manufacturability. Practical and useful examples from critical device layers of memory and logic devices are included throughout, with particular consideration on how multiple splits operate on device sequential layers using computational lithography optimized splits. The course includes extensive references of relevant publications on double/ multiple patterning processes.
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