Ms. Susan S. MacDonald Profile

Susan S. MacDonald

Senior Applications Engineer at Photronics Inc

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 2 April 2014 Paper

Paper

Improved reticle requalification accuracy and efficiency via simulation-powered automated defect classification

Shazad Paracha, Benjamin Eynon, Ben Noyes, Anthony Nhiev, Anthony Vacca, Peter Fiekowsky, Dan Fiekowsky, Young Mog Ham, Doug Uzzel, Michael Green, Susan MacDonald, John Morgan

Proceedings Volume 9050, 905031 (2014) https://doi.org/10.1117/12.2048622

KEYWORDS: Reticles, Semiconducting wafers, Inspection, Photomasks, Classification systems, Scanning electron microscopy, Critical dimension metrology, Error analysis, Wafer testing, Defect detection

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Proceedings Article | 21 March 2006 Paper

Paper

Printability of quartz defects in a production Cr-less mask process

Gregory Hughes, Susan MacDonald, John Riddick, Anthony Nhiev, Jason Hickethier

Proceedings Volume 6154, 615446 (2006) https://doi.org/10.1117/12.656525

KEYWORDS: Photomasks, Quartz, Inspection, Etching, Printing, Scanning electron microscopy, Lithography, Semiconducting wafers, Chromium, Phase shifts

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Proceedings Article | 9 November 2005 Paper

Paper

Design and fabrication of nano-imprint templates using unique pattern transforms and primitives

Susan MacDonald, David Mellenthin, Kevin Rentzsch, Kenneth Kramer, James Ellenson, Tim Hostetler, Ron Enck

Proceedings Volume 5992, 599242 (2005) https://doi.org/10.1117/12.632269

KEYWORDS: Lithography, Semiconducting wafers, Vestigial sideband modulation, Electron beam lithography, Photomasks, Microelectromechanical systems, Transform theory, Manufacturing, Nanoimprint lithography, Optics manufacturing

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Proceedings Article | 8 November 2005 Paper

Paper

Design and fabrication of highly complex topographic nano-imprint template for dual Damascene full 3-D imprinting

Susan MacDonald, Greg Hughes, Michael Stewart, Frank Palmieri, C. Grant Willson

Proceedings Volume 5992, 59922F (2005) https://doi.org/10.1117/12.632312

KEYWORDS: Metals, Etching, Quartz, Copper, Photomasks, Optical lithography, Manufacturing, Lithography, Semiconducting wafers, Dielectrics

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Proceedings Article | 12 May 2005 Paper

Paper

A novel mask-based approach to improve low-k1 corner and angle definition in alternating-aperture phase-shift mask structures

Kent Nakagawa, David Siefers, Susan MacDonald, Peter Buck

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.597617

KEYWORDS: Photomasks, Semiconducting wafers, Magnetism, Neck, Manufacturing, Scanning electron microscopy, Phase shifts, Optical proximity correction, Quartz, Distortion

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Proceedings Article | 12 May 2005 Paper

Paper

Imaging study of positive and negative tone weak phase-shifted 65 nm node contacts

James Beach, John Petersen, Robert Greenway, Mark Maslow, Susan MacDonald, Lee Margolis, Gregory Hughes

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598535

KEYWORDS: Photomasks, Lithography, Reticles, Phase shifts, Quartz, Etching, Manufacturing, Vestigial sideband modulation, Critical dimension metrology, Nanoimprint lithography

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Proceedings Article | 10 May 2005 Paper

Paper

Advanced mask metrology enabling characterization of imprint lithography templates

L. Myron, Liraz Gershtein, Gidi Gottlieb, Bob Burkhardt, Andrew Griffiths, David Mellenthin, Kevin Rentzsch, Susan MacDonald, Greg Hughes

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.603718

KEYWORDS: Semiconducting wafers, Lithography, Chromium, Photomasks, Quartz, Critical dimension metrology, Etching, Metrology, Photoresist processing, Cadmium

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Proceedings Article | 20 August 2004 Paper

Paper

The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment

William Chou, Shih Yen, J. Wu, W. Shieh, Mars Chuang, George Fan, Chin Chih Tseng, Gregory Hughes, Susan MacDonald, Carrie Holiday, Gong Chen

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557754

KEYWORDS: Semiconducting wafers, Photomasks, Lithography, Printing, Etching, Wafer manufacturing, Quartz, 193nm lithography, Scanners, Computer simulations

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Proceedings Article | 28 May 2004 Paper

Paper

Study of OPC for AAPSM reticles using various mask fabrication techniques

Gregory Hughes, Denny Kamaruddin, Kent Nakagawa, Susan MacDonald, Bill Wilkinson, Craig West, Keuntaek Park

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536138

KEYWORDS: Photomasks, Semiconducting wafers, Data modeling, Optical proximity correction, Etching, Mask making, Photoemission spectroscopy, Image analysis, Chromium, Reticles

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Proceedings Article | 24 May 2004 Paper

Paper

Qualification of a low-cost high-quality reticle process for 90-nm contact layers

Kirk Strozewski, Joe Perez, Rusty Carter, Robert Kiefer, Curt Jackson, Susan MacDonald, Franklin Kalk

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.536712

KEYWORDS: Photomasks, Reticles, Deep ultraviolet, Semiconducting wafers, Electron beam lithography, Mask making, Optical lithography, Semiconductors, Lithography, Inspection

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Proceedings Article | 10 July 2003 Paper

Paper

Design-to-process integration: optimizing 130-nm X architecture manufacturing

Robert Dean, Vinod Malhotra, Nahid King, Michael Sanie, Susan MacDonald, James Jordan, Shigeru Hirukawa

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485258

KEYWORDS: Optical proximity correction, Photomasks, Reticles, Manufacturing, Inspection, Metals, Semiconducting wafers, Lithography, Silicon, Critical dimension metrology

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Proceedings Article | 30 July 2002 Paper

Paper

Aberration determination in early 157-nm exposure system

Bruce Smith, Will Conley, Cesar Garza, Jeff Meute, Daniel Miller, Georgia Rich, Victoria Graffenberg, Kim Dean, Shashikant Patel, Arnie Ford, James Foster, Marco Moers, Kevin Cummings, James Webb, Paul Dewa, Azeddine Zerrade, Susan MacDonald, Greg Hughes, Peter Dirksen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474551

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Image processing, Lithography, Manufacturing, Imaging systems, Wavefronts, Zernike polynomials, Edge detection

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Proceedings Article | 11 March 2002 Paper

Paper

Verification of the effect of mask bias on the mask error enhancement factor of contact holes

Michael Reilly, Stewart Robertson, Colin Parker, Doris Kang, Mircea Dusa, Susan MacDonald, Craig West

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.443111

KEYWORDS: Photomasks, Binary data, Scanning electron microscopy, Optical testing, Nanoimprint lithography, Image quality, Phase shifts, Image enhancement, Metrology, Semiconducting wafers

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Proceedings Article | 14 September 2001 Paper

Paper

Binary halftone chromeless PSM technology for quarter-lambda optical lithography

J. Fung Chen, John Petersen, Robert Socha, Thomas Laidig, Kurt Wampler, Kent Nakagawa, Greg Hughes, Susan MacDonald, Waiman Ng

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435751

KEYWORDS: Halftones, Binary data, Optical proximity correction, Photomasks, Reticles, Scanning electron microscopy, Manufacturing, Printing, Mask making, Lithography

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Proceedings Article | 5 July 2000 Paper

Paper

OPC beyond 0.18 mm: OPC on PSM gates

Franklin Schellenberg, Olivier Toublan, Nicolas Cobb, Emile Sahouria, Greg Hughes, Susan MacDonald, Craig West

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388942

KEYWORDS: Photomasks, Reticles, Optical proximity correction, Phase shifts, Phase shifting, Semiconducting wafers, Lithography, Manufacturing, Phase measurement, Etching

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Showing 5 of 15 publications

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