Dr. Thomas Franz Karl Scheruebl
Head of Strategic Business Development (SMS) at Carl Zeiss SMT GmbH
SPIE Involvement:
Conference Program Committee | Author
Publications (45)

Proceedings Article | 22 February 2021 Presentation
Rolf Seltmann, Tino Hertzsch, Matthias Ruhm, Ofir Sharoni, Thomas Scheruebl
Proceedings Volume 11611, 1161120 (2021) https://doi.org/10.1117/12.2585642

Proceedings Article | 3 October 2019 Paper
Proceedings Volume 11148, 111480L (2019) https://doi.org/10.1117/12.2536896
KEYWORDS: Photomasks, Semiconducting wafers, Optical lithography, Critical dimension metrology, Failure analysis, Scanners, 3D modeling, Line width roughness, Reticles

Proceedings Article | 5 October 2016 Paper
Proceedings Volume 9985, 99851Q (2016) https://doi.org/10.1117/12.2243620
KEYWORDS: Manufacturing, Reliability, Tolerancing, Image processing, Image enhancement, Error analysis, Inspection, Image analysis, Back end of line, Neodymium

Proceedings Article | 5 October 2016 Paper
Proceedings Volume 9985, 99851W (2016) https://doi.org/10.1117/12.2241498
KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Image registration, Overlay metrology, Deep ultraviolet, Reticles, Databases, Calibration, Lithography

SPIE Journal Paper | 27 October 2014
JM3, Vol. 13, Issue 04, 043006, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.043006
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

Showing 5 of 45 publications
Conference Committee Involvement (24)
Photomask Technology 2025
21 September 2025 | Monterey, California, United States
40th European Mask and Lithography Conference (EMLC 2025)
16 June 2025 | Dresden, Germany
Photomask Technology 2024
30 September 2024 | Monterey, California, United States
Photomask Technology 2023
2 October 2023 | Monterey, California, United States
Photomask Technology 2022
26 September 2022 | Monterey, California, United States
Showing 5 of 24 Conference Committees
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