Front Matter: Volume 7973
Proceedings Volume Optical Microlithography XXIV, 797301 (2011) https://doi.org/10.1117/12.894750
FreeForm and SMO
Proceedings Volume Optical Microlithography XXIV, 797305 (2011) https://doi.org/10.1117/12.883317
Gregory McIntyre, Daniel Corliss, Remco Groenendijk, Rene Carpaij, Ton van Niftrik, Guillaume Landie, Takao Tamura, Thomas Pepin, James Waddell, et al.
Proceedings Volume Optical Microlithography XXIV, 797306 (2011) https://doi.org/10.1117/12.879483
K. Lai, M. Gabrani, D. Demaris, N. Casati, A. Torres, S. Sarkar, P. Strenski, S. Bagheri, D. Scarpazza, et al.
Proceedings Volume Optical Microlithography XXIV, 797308 (2011) https://doi.org/10.1117/12.879787
Source and Mask Optimization I
Proceedings Volume Optical Microlithography XXIV, 797309 (2011) https://doi.org/10.1117/12.879116
Min-Chun Tsai, Stephen Hsu, Luoqi Chen, Yen-Wen Lu, Jiangwei Li, Frank Chen, Hong Chen, Jun Tao, Been-Der Chen, et al.
Proceedings Volume Optical Microlithography XXIV, 79730A (2011) https://doi.org/10.1117/12.881633
Proceedings Volume Optical Microlithography XXIV, 79730B (2011) https://doi.org/10.1117/12.881688
Proceedings Volume Optical Microlithography XXIV, 79730C (2011) https://doi.org/10.1117/12.879703
Proceedings Volume Optical Microlithography XXIV, 79730D (2011) https://doi.org/10.1117/12.878663
Double Patterning I
Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky
Proceedings Volume Optical Microlithography XXIV, 79730E (2011) https://doi.org/10.1117/12.879540
Chiew-seng Koay, Scott Halle, Steven Holmes, Karen Petrillo, Matthew Colburn, Youri van Dommelen, Aiqin Jiang, Michael Crouse, Shannon Dunn, et al.
Proceedings Volume Optical Microlithography XXIV, 79730F (2011) https://doi.org/10.1117/12.879618
Bencherki Mebarki, Hao D. Chen, Yongmei Chen, Aunchan Wang, Jingmei Liang, Kedar Sapre, Tushar Mandrekar, Xiaolin Chen, Ping Xu, et al.
Proceedings Volume Optical Microlithography XXIV, 79730G (2011) https://doi.org/10.1117/12.881574
Proceedings Volume Optical Microlithography XXIV, 79730H (2011) https://doi.org/10.1117/12.879793
L. Lattard, M. McCallum, R. Morton, C. Lapeyre, K. Makino, A. Tokui, N. Takahashi, T. Fujiwara
Proceedings Volume Optical Microlithography XXIV, 79730I (2011) https://doi.org/10.1117/12.878953
Proceedings Volume Optical Microlithography XXIV, 79730J (2011) https://doi.org/10.1117/12.879324
Double Patterning II
Chris Bencher, Huixiong Dai, Liyan Miao, Yongmei Chen, Ping Xu, Yijian Chen, Shiany Oemardani, Jason Sweis, Vincent Wiaux, et al.
Proceedings Volume Optical Microlithography XXIV, 79730K (2011) https://doi.org/10.1117/12.881679
Proceedings Volume Optical Microlithography XXIV, 79730L (2011) https://doi.org/10.1117/12.879508
Proceedings Volume Optical Microlithography XXIV, 79730M (2011) https://doi.org/10.1117/12.879399
Ryoung-Han Kim, Chiew-seng Koay, Sean D. Burns, Yunpeng Yin, John C. Arnold, Christopher Waskiewicz, Sanjay Mehta, Martin Burkhardt, Matthew E. Colburn, et al.
Proceedings Volume Optical Microlithography XXIV, 79730N (2011) https://doi.org/10.1117/12.881701
Mask 3D Modeling
Proceedings Volume Optical Microlithography XXIV, 79730O (2011) https://doi.org/10.1117/12.879053
Tamer H. Coskun, Huixiong Dai, Hsu-Ting Huang, Vishnu Kamat, Chris Ngai
Proceedings Volume Optical Microlithography XXIV, 79730P (2011) https://doi.org/10.1117/12.879704
Tools and Process Control I
Robert Socha, Wenjin Shao, Xu Xie, Youri van Dommelen, Dorothe Oorschot, Henry Megens, Venu Vellanki
Proceedings Volume Optical Microlithography XXIV, 79730Q (2011) https://doi.org/10.1117/12.879619
Proceedings Volume Optical Microlithography XXIV, 79730R (2011) https://doi.org/10.1117/12.881606
Jongwon Jang, Daejin Park, Jeaseung Choi, Areum Jung, Gyun Yoo, Jungchan Kim, Cheol-kyun Kim, Donggyu Yim, Junwei Lu, et al.
Proceedings Volume Optical Microlithography XXIV, 79730S (2011) https://doi.org/10.1117/12.879570
Proceedings Volume Optical Microlithography XXIV, 79730T (2011) https://doi.org/10.1117/12.870753
Tools and Process Control II
Jo Finders, Mircea Dusa, Jan Mulkens, Yu Cao, Maryana Escalante
Proceedings Volume Optical Microlithography XXIV, 79730U (2011) https://doi.org/10.1117/12.881598
Proceedings Volume Optical Microlithography XXIV, 79730V (2011) https://doi.org/10.1117/12.881609
Yasuhiro Ohmura, Taro Ogata, Toru Hirayama, Hisashi Nishinaga, Takeshi Shiota, Satoshi Ishiyama, Susumu Isago, Hidetaka Kawahara, Tomoyuki Matsuyama
Proceedings Volume Optical Microlithography XXIV, 79730W (2011) https://doi.org/10.1117/12.879616
Computational Lithography
Proceedings Volume Optical Microlithography XXIV, 79730X (2011) https://doi.org/10.1117/12.879592
Innovative Lithography Process Control: Joint Session with Conference 7971
Masahiko Yasuda, Shinji Wakamoto, Hiroto Imagawa, Shinya Takubo, Yuuji Shiba, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii
Proceedings Volume Optical Microlithography XXIV, 79730Z (2011) https://doi.org/10.1117/12.879291
Tomoharu Fujiwara, Tsuyoshi Toki, Daishi Tanaka, Junichi Kosugi, Tomohiko Susa, Naruo Sakasai, Akira Tokui
Proceedings Volume Optical Microlithography XXIV, 797310 (2011) https://doi.org/10.1117/12.879348
Martin Ebert, Hugo Cramer, Wim Tel, Michael Kubis, Henry Megens
Proceedings Volume Optical Microlithography XXIV, 797311 (2011) https://doi.org/10.1117/12.881428
Proceedings Volume Optical Microlithography XXIV, 797312 (2011) https://doi.org/10.1117/12.879885
Mask and Layout Optimization
Proceedings Volume Optical Microlithography XXIV, 797314 (2011) https://doi.org/10.1117/12.879522
Chandra Sarma, Todd Bailey, Adam Lyons, Dongbing Shao
Proceedings Volume Optical Microlithography XXIV, 797315 (2011) https://doi.org/10.1117/12.879213
Takashi Matsuda, Shigeo Irie, Tadami Shimizu, Takashi Yuito, Yasuko Tabata, Yuuji Nonami, Akio Misaka, Taichi Koizumi, Masaru Sasago
Proceedings Volume Optical Microlithography XXIV, 797316 (2011) https://doi.org/10.1117/12.878727
Christophe Pierrat
Proceedings Volume Optical Microlithography XXIV, 797317 (2011) https://doi.org/10.1117/12.879230
Sergiy M. Komirenko
Proceedings Volume Optical Microlithography XXIV, 797318 (2011) https://doi.org/10.1117/12.877594
Optical/DFM: Joint Session with Conference 7974
Bradley Morgenfeld, Ian Stobert, Ju j An, Hideki Kanai, Norman Chen, Massud Aminpur, Colin Brodsky, Alan Thomas
Proceedings Volume Optical Microlithography XXIV, 797319 (2011) https://doi.org/10.1117/12.879773
Source and Mask Optimization II
Proceedings Volume Optical Microlithography XXIV, 79731A (2011) https://doi.org/10.1117/12.879534
Proceedings Volume Optical Microlithography XXIV, 79731B (2011) https://doi.org/10.1117/12.879058
Thomas Cecil, Chris Ashton, David Irby, Lan Luan, D. H. Son, Guangming Xiao, Xin Zhou, David Kim, Bob Gleason, et al.
Proceedings Volume Optical Microlithography XXIV, 79731C (2011) https://doi.org/10.1117/12.882814
Hyo-chan Kim, Jeong-Hoon Lee, Jong-Chan Shin, Yong-Kug Bae, Siyoung Choi, Ho-Kyu Kang
Proceedings Volume Optical Microlithography XXIV, 79731E (2011) https://doi.org/10.1117/12.879429
Tools
Jun Ishikawa, Hirotaka Kohno, Shinji Sato, Junichi Kosugi, Yuichi Shibazaki
Proceedings Volume Optical Microlithography XXIV, 79731F (2011) https://doi.org/10.1117/12.879388
Frank Staals, Alena Andryzhyieuskaya, Hans Bakker, Marcel Beems, Jo Finders, Thijs Hollink, Jan Mulkens, Angelique Nachtwein, Rob Willekers, et al.
Proceedings Volume Optical Microlithography XXIV, 79731G (2011) https://doi.org/10.1117/12.880759
Tomoyuki Matsuyama, Naonori Kita, Yasushi Mizuno
Proceedings Volume Optical Microlithography XXIV, 79731H (2011) https://doi.org/10.1117/12.879395
Proceedings Volume Optical Microlithography XXIV, 79731I (2011) https://doi.org/10.1117/12.881607
Hiroshi Umeda, Hiroaki Tsushima, Hidenori Watanabe, Satoshi Tanaka, Masaya Yoshino, Shinich Matsumoto, Hiroshi Tanaka, Akihiko Kurosu, Yasufumi Kawasuji, et al.
Proceedings Volume Optical Microlithography XXIV, 79731K (2011) https://doi.org/10.1117/12.879205
Poster Session: Computational Lithography
Proceedings Volume Optical Microlithography XXIV, 79731L (2011) https://doi.org/10.1117/12.879781
Wei Liu, Tingting Zhou, Shiyuan Liu
Proceedings Volume Optical Microlithography XXIV, 79731M (2011) https://doi.org/10.1117/12.879217
Proceedings Volume Optical Microlithography XXIV, 79731N (2011) https://doi.org/10.1117/12.879440
Hiroshi Nomura, Masanori Takahashi, Suigen Kyoh
Proceedings Volume Optical Microlithography XXIV, 79731O (2011) https://doi.org/10.1117/12.879338
Poster Session: Double Patterning
Yijian Chen, Ping Xu, Liyan Miao, Yongmei Chen, Xumou Xu, Daxin Mao, Pokhui Blanco, Chris Bencher, Raymond Hung, et al.
Proceedings Volume Optical Microlithography XXIV, 79731P (2011) https://doi.org/10.1117/12.881645
Ping Xu, Yongmei Chen, Yijian Chen, Liyan Miao, Shiyu Sun, Sung-Woo Kim, Ami Berger, Daxin Mao, Christ Bencher, et al.
Proceedings Volume Optical Microlithography XXIV, 79731Q (2011) https://doi.org/10.1117/12.881547
Janko Versluijs, Yong Kong Siew, Eddy Kunnen, Diziana Vangoidsenhoven, Steven Demuynck, Vincent Wiaux, Harold Dekkers, Gerald Beyer
Proceedings Volume Optical Microlithography XXIV, 79731R (2011) https://doi.org/10.1117/12.881600
Yijian Chen, Xumou Xu, Yongmei Chen, Liyan Miao, Hao Chen, Pokhui Blanco, Chris S. Ngai
Proceedings Volume Optical Microlithography XXIV, 79731S (2011) https://doi.org/10.1117/12.881658
Yijian Chen, Yongmei Chen, Liyan Miao, Ping Xu, Xumou Xu, Hao Chen, Pokhui Blanco, Raymond Hung, Chris S. Ngai
Proceedings Volume Optical Microlithography XXIV, 79731T (2011) https://doi.org/10.1117/12.881661
Poster Session: FreeForm and SMO
Proceedings Volume Optical Microlithography XXIV, 79731U (2011) https://doi.org/10.1117/12.879492
Robert Sinn, Thuc Dam, Bob Gleason
Proceedings Volume Optical Microlithography XXIV, 79731V (2011) https://doi.org/10.1117/12.879533
Michael C. Smayling, Tamer H. Coskun, Vishnu Kamat
Proceedings Volume Optical Microlithography XXIV, 79731W (2011) https://doi.org/10.1117/12.881662
Thomas Huang, Chun-Yen Huang, Tsann-Bim Chiou, Michael Hsu, Chiang-Lin Shih, Alek Chen, Ming-Kang Wei
Proceedings Volume Optical Microlithography XXIV, 79731X (2011) https://doi.org/10.1117/12.879567
Proceedings Volume Optical Microlithography XXIV, 79731Y (2011) https://doi.org/10.1117/12.881779
Yi-Shiang Chang, Satoshi Ogasawara, Koichi Fujii, Shigeru Hirukawa, Motokatsu Imai, Wan-Lin Kuo, Chia-Chi Lin
Proceedings Volume Optical Microlithography XXIV, 79731Z (2011) https://doi.org/10.1117/12.878887
Proceedings Volume Optical Microlithography XXIV, 797320 (2011) https://doi.org/10.1117/12.879441
Ansgar Teipel, Lutz Aschke
Proceedings Volume Optical Microlithography XXIV, 797321 (2011) https://doi.org/10.1117/12.879640
Proceedings Volume Optical Microlithography XXIV, 797322 (2011) https://doi.org/10.1117/12.879203
Proceedings Volume Optical Microlithography XXIV, 797323 (2011) https://doi.org/10.1117/12.882808
Poster Session: Laser
Kevin O'Brien, Rui Jiang, Nora Han, Efrain Figueroa, Raj Rao, Robert J. Rafac
Proceedings Volume Optical Microlithography XXIV, 797326 (2011) https://doi.org/10.1117/12.881167
Daniel J. Riggs, Kevin O'Brien, Daniel J. W. Brown
Proceedings Volume Optical Microlithography XXIV, 797327 (2011) https://doi.org/10.1117/12.880155
Poster Session: Scanner-Lithography Optimization
Proceedings Volume Optical Microlithography XXIV, 797328 (2011) https://doi.org/10.1117/12.882391
Proceedings Volume Optical Microlithography XXIV, 797329 (2011) https://doi.org/10.1117/12.879207
Jong-Ho Lim, Kyung Kang, Sung-Man Kim, Wenjin Shao, Fei Du, Zhengfan Zhang, Zongchang Yu, John Barbuto, Venu Vellanki, et al.
Proceedings Volume Optical Microlithography XXIV, 79732A (2011) https://doi.org/10.1117/12.881680
K. Mann, A. Bayer, U. Leinhos, M. Schöneck, B. Schäfer
Proceedings Volume Optical Microlithography XXIV, 79732B (2011) https://doi.org/10.1117/12.879806
Arun Kumar Gnanappa, Evangelos Gogolides, Emilien Feuillet, Fabrizio Evangelista, Nina Dziomkina, Michel Riepen
Proceedings Volume Optical Microlithography XXIV, 79732C (2011) https://doi.org/10.1117/12.881605
Lifeng Duan, Jianrui Cheng, Gang Sun, Yonghui Chen
Proceedings Volume Optical Microlithography XXIV, 79732D (2011) https://doi.org/10.1117/12.879376
Karsten Bubke, Matthias Ruhm, Rafael Aldana, Martin Niehoff, Xu Xie, Justin Ghan, Paul van Adrichem, Holger Bald, Paul Luehrmann, et al.
Proceedings Volume Optical Microlithography XXIV, 79732E (2011) https://doi.org/10.1117/12.890501
Poster Session: Mask/Wafer Topography, Layout, and OPC
Proceedings Volume Optical Microlithography XXIV, 79732F (2011) https://doi.org/10.1117/12.879604
Nikolay Voznesenskiy, Hans-Jürgen Stock, Bernd Küchler, Hua Song, James Shiely, Lars Bomholt
Proceedings Volume Optical Microlithography XXIV, 79732G (2011) https://doi.org/10.1117/12.879605
James Moon, Byoung-Sub Nam, Cheol-Kyun Kim, Hyong-Sun Yun, Ji-Young Lee, Donggyu Yim, Sung-Ki Park
Proceedings Volume Optical Microlithography XXIV, 79732H (2011) https://doi.org/10.1117/12.879201
Proceedings Volume Optical Microlithography XXIV, 79732I (2011) https://doi.org/10.1117/12.879577
Christophe Pierrat, Larry Chau, Ingo Bork
Proceedings Volume Optical Microlithography XXIV, 79732J (2011) https://doi.org/10.1117/12.881550
Yuyang Sun, Yee Mei Foong, Yingfang Wang, Jacky Cheng, Dongqing Zhang, Shaowen Gao, Nanshu Chen, Byoung Il Choi, Antoine J. Bruguier, et al.
Proceedings Volume Optical Microlithography XXIV, 79732K (2011) https://doi.org/10.1117/12.881575
Yang Ping, Xiaohai Li, Stephen Jang, Denny Kwa, Yunqiang Zhang, Robert Lugg
Proceedings Volume Optical Microlithography XXIV, 79732M (2011) https://doi.org/10.1117/12.879947
Proceedings Volume Optical Microlithography XXIV, 79732N (2011) https://doi.org/10.1117/12.879206
Proceedings Volume Optical Microlithography XXIV, 79732O (2011) https://doi.org/10.1117/12.879276
Proceedings Volume Optical Microlithography XXIV, 79732P (2011) https://doi.org/10.1117/12.879583
Proceedings Volume Optical Microlithography XXIV, 79732R (2011) https://doi.org/10.1117/12.879841
Yeon-Ah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, et al.
Proceedings Volume Optical Microlithography XXIV, 79732S (2011) https://doi.org/10.1117/12.870704
Youngmi Kim, Jae-Young Choi, Kwangseon Choi, Jung-Hoe Choi, Sooryong Lee
Proceedings Volume Optical Microlithography XXIV, 79732T (2011) https://doi.org/10.1117/12.870707
Poster Session: Modeling
Anatoly Burov, Min Shi, Jiang Yan, Wenfeng Sun
Proceedings Volume Optical Microlithography XXIV, 79732V (2011) https://doi.org/10.1117/12.879369
Proceedings Volume Optical Microlithography XXIV, 79732W (2011) https://doi.org/10.1117/12.880949
Proceedings Volume Optical Microlithography XXIV, 79732X (2011) https://doi.org/10.1117/12.879562
Proceedings Volume Optical Microlithography XXIV, 79732Y (2011) https://doi.org/10.1117/12.879041
Poster Session: Tool and Process Control
Nicolas Spaziani, René-Louis Inglebert, Jean Massin
Proceedings Volume Optical Microlithography XXIV, 79732Z (2011) https://doi.org/10.1117/12.879074
Wan Ho Kim, Ek Jen Yet, Siew Ing Yet, Boon Chun Lee
Proceedings Volume Optical Microlithography XXIV, 797331 (2011) https://doi.org/10.1117/12.879197
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