Dr. Akiyoshi Suzuki
at AS Lithography Consulting
SPIE Involvement:
Conference Program Committee | Author
Publications (30)

Proceedings Article | 2 April 2011 Paper
Proceedings Volume 7970, 797005 (2011) https://doi.org/10.1117/12.881274
KEYWORDS: Reticles, Nanoimprint lithography, Distortion, Extreme ultraviolet lithography, Double patterning technology, Photomasks, Semiconducting wafers, Projection systems, Wavefronts, Lithography

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 69242U (2008) https://doi.org/10.1117/12.771369
KEYWORDS: Optical proximity correction, Polarization, Optical simulations, Scanners, Photomasks, Optimization (mathematics), Optical lithography, Nanoimprint lithography, Image quality, Computer simulations

Proceedings Article | 26 March 2007 Paper
Koichiro Tsujita, Koji Mikami, Ryotaro Naka, Norikazu Baba, Tomomi Ono, Akiyoshi Suzuki
Proceedings Volume 6520, 652036 (2007) https://doi.org/10.1117/12.711048
KEYWORDS: Nanoimprint lithography, Optical proximity correction, Photomasks, Optical simulations, Optimization (mathematics), Electroluminescence, Photoresist processing, Polarization, Binary data, Calibration

Proceedings Article | 12 July 2006 Paper
Michio Kohno, Kiyoshi Fukami, Hitoshi Yoshioka, Shu Watanabe, Akiyoshi Suzuki
Proceedings Volume 6342, 63420Y (2006) https://doi.org/10.1117/12.692265
KEYWORDS: Mirrors, Projection systems, Combined lens-mirror systems, Aspheric lenses, Photomasks, Optical alignment, Distortion, Wavefront aberrations, Iron, Monochromatic aberrations

Proceedings Article | 17 September 2005 Paper
Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676
KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

Showing 5 of 30 publications
Proceedings Volume Editor (1)

Conference Committee Involvement (27)
Optical and EUV Nanolithography XXXVIII
23 February 2025 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2024
30 September 2024 | Monterey, California, United States
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Showing 5 of 27 Conference Committees
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