Mr. Akinori Ohkubo Profile

Akinori Ohkubo

Principal Optical Engineer

SPIE Involvement:

Author

Area of Expertise:

Optical metorology , Optical simulation , Optical lithography

Publications (13)

Proceedings Article | 28 September 2023 Poster + Paper

Inverse optical design using quasi-two-dimensional partially coherent imaging for photolithography overlay metrology

Akinori Ohkubo, Sungho Jang, Jungchul Lee, Sangwoo Bae

Proceedings Volume 12664, 126640J (2023) https://doi.org/10.1117/12.2676094

KEYWORDS: Overlay metrology, Light sources and illumination, Reflection, Optical alignment, Coherence imaging, Monochromatic aberrations, Optical design, Matrices, Computer simulations, Nanoimprint lithography

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Proceedings Article | 3 October 2022 Poster + Paper

On-machine laser spot diagnostics by scanning linear image sensor for maskless lithography system

Akinori Ohkubo, Jiyoung Chu, Janghwi Lee, Sunghwi Cho, Wondon Joo, Sangwoo Bae

Proceedings Volume 12221, 122211B (2022) https://doi.org/10.1117/12.2631007

KEYWORDS: Diagnostics, Image sensors, Sensors, Geometrical optics, Digital micromirror devices, Calibration, CCD image sensors, Maskless lithography, Micromirrors, Wavefront aberrations

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Proceedings Article | 1 August 2021 Presentation + Paper

Through-focus spot shaping with asymmetric pupil optimization for laser stealth dicing

Akinori Ohkubo, Sungho Jang, Youngchul Kwon, Deoksuk Jang, Jungchul Lee

Proceedings Volume 11818, 118180F (2021) https://doi.org/10.1117/12.2593641

KEYWORDS: Wavefront aberrations, Wafer dicing, Laser beam propagation, Optical filters, Semiconducting wafers, Silicon, Spatial light modulators, Beam shaping, Laser processing, Pulsed laser operation, Semiconductor lasers, Monochromatic aberrations, Modulation

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Proceedings Article | 21 August 2020 Presentation + Paper

Visible upconversion photoluminescence of bulk silicon and mesoscale silicon nanoparticles

Boris Afinogenov, Anton Medvedev, Ilya Antropov, Nikita Filatov, Anton Sofronov, Eunhee Jeang, Sangwoo Bae, Taehyun Kim, Ingi Kim, Akinori Ohkubo, Sangmin Lee, Seulgi Lee, Wondon Joo, Minhwan Seo, Aleksander Shorokhov, Vladimir Bessonov, Maksim Ryabko

Proceedings Volume 11467, 114670Y (2020) https://doi.org/10.1117/12.2570415

KEYWORDS: Nonlinear optics, Silicon, Luminescence, Nanoparticles, Semiconducting wafers, Upconversion, Doping, Visible radiation

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Proceedings Article | 20 August 2020 Poster + Paper

Signal-to-noise ratio evaluation for the nanometer-scale patterned defect inspection using dark-field microscopy with tailored polarization illumination

Akinori Ohkubo, Janghwi Lee, Hyungu Kim, Jiyoung Chu, Sungho Jang, Sangwoo Bae, Wondon Joo

Proceedings Volume 11485, 114850N (2020) https://doi.org/10.1117/12.2567116

KEYWORDS: Signal to noise ratio, Polarization, Scattering, Near field, Cameras, Semiconducting wafers, Ellipsometry

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Proceedings Article | 1 April 2020 Presentation + Paper

Single nanoparticle detection in the far field by nonlinear optical method

EunHee Jeang, Boris Afinogenov, Sangwoo Bae, TaeHyun Kim, Ingi Kim, Kyunghun Han, Akinori Ohkubo, SangMin Lee, MinHwan Seo, Seulgi Lee, Wondon Joo, Hosun Yoo, Anton Medvedev, Aleksandr Shorokhov, Anton Sofronov, Maksim Riabko, Vladimir Bessonov, Ilya Antropov

Proceedings Volume 11358, 1135802 (2020) https://doi.org/10.1117/12.2552708

KEYWORDS: Nanoparticles, Second-harmonic generation, Silicon, Particles, Polarization, Signal to noise ratio, Signal detection, Objectives, Semiconducting wafers, Microscopy

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SPIE Journal Paper | 1 January 2009

Influence of resist blur on resolution of hyper-NA immersion lithography beyond 45-nm half-pitch

Minoru Yoshii, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Seiji Takeuchi, Tokuyuki Honda, Toyohiko Yatagai

JM3, Vol. 8, Issue 01, 013003, (January 2009) https://doi.org/10.1117/12.10.1117/1.3059551

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Polymers, Immersion lithography, Interferometry, Lithography, Image resolution, Optical simulations, Optical lithography

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Proceedings Article | 26 March 2007 Paper

Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography

Yasuhiro Kishikawa, Miyoko Kawashima, Akinori Ohkubo, Yuichi Iwasaki, Seiji Takeuchi, Minoru Yoshii, Tokuyuki Honda

Proceedings Volume 6520, 65203L (2007) https://doi.org/10.1117/12.711420

KEYWORDS: Diffusion, Modulation transfer functions, Photoresist materials, Immersion lithography, Polymers, Interferometry, Lithography, Optical lithography, Optical simulations, Image resolution

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SPIE Journal Paper | 1 October 2006

Influence of resist blur on ultimate resolution of ArF immersion lithography

Tokuyuki Honda, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii

JM3, Vol. 5, Issue 04, 043004, (October 2006) https://doi.org/10.1117/12.10.1117/1.2397018

KEYWORDS: Diffusion, Interferometry, Modulation transfer functions, Immersion lithography, Semiconducting wafers, Refractive index, Extreme ultraviolet lithography, Microfluidic imaging, Microfluidics, Lithography

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Proceedings Article | 15 March 2006 Paper

What determines the ultimate resolution? The critical relationship between exposure tools and photoresists

Tokuyuki Honda, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii

Proceedings Volume 6154, 615422 (2006) https://doi.org/10.1117/12.656123

KEYWORDS: Diffusion, Interferometry, Modulation transfer functions, Photoresist materials, Semiconducting wafers, Immersion lithography, Refractive index, Chemically amplified resists, Extreme ultraviolet lithography, Scanners

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Proceedings Article | 12 May 2005 Paper

Analysis of imaging properties for hyper-NA ArF immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Kenji Yamazoe, Tokuyuki Honda, Akinori Ohkubo, Yasuhiro Kishikawa, Yuichi Iwasaki, Akiyoshi Suzuki

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600500

KEYWORDS: Photomasks, Projection systems, Refractive index, Water, Diffraction, Polarization, Immersion lithography, Critical dimension metrology, Microfluidics, Imaging systems

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Proceedings Article | 18 October 2004 Paper

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Chidane Ouchi, Takayuki Hasegawa, Seima Kato, Akinori Ohkubo, Akiyoshi Suzuki, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

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Proceedings Article | 28 May 2004 Paper

ArF immersion lithography: critical optical issues

Tokuyuki Honda, Yasuhiro Kishikawa, Toshinobu Tokita, Hiroshi Ohsawa, Miyoko Kawashima, Akinori Ohkubo, Minoru Yoshii, Koji Uda, Akiyoshi Suzuki

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534024

KEYWORDS: Semiconducting wafers, Immersion lithography, Photomasks, Diffraction, Water, Liquids, Interferometry, Refractive index, Glasses, Lithography

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Showing 5 of 13 publications

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