Mr. Toshiyuki Yoshihara Profile

Toshiyuki Yoshihara

at Canon Inc Semiconductor Equipment Operations

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 16 March 2009 Paper

Advanced aberration control in projection optics for double patterning

Toshiyuki Yoshihara, Takashi Sukegawa, Nobuhiko Yabu, Masatoshi Kobayashi, Tadashi Arai, Tsuyoshi Kitamura, Atsushi Shigenobu, Yasuo Hasegawa, Kazuhiro Takahashi

Proceedings Volume 7274, 72741L (2009) https://doi.org/10.1117/12.813625

KEYWORDS: Projection systems, Double patterning technology, Monochromatic aberrations, Reticles, Polarization, Wavefront aberrations, Overlay metrology, Distortion, Laser induced plasma spectroscopy, Lithography

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Proceedings Article | 16 March 2009 Paper

Novel approaches to meet the requirements for double patterning

Takeaki Ebihara, Toshiyuki Yoshihara, Hiroshi Morohoshi, Tadamasa Makiyama, Yoshio Kawanobe, Koichiro Tsujita, Toshiyuki Kojima, Kazuhiro Takahashi

Proceedings Volume 7274, 72741J (2009) https://doi.org/10.1117/12.813585

KEYWORDS: Distortion, Semiconducting wafers, Overlay metrology, Double patterning technology, Critical dimension metrology, Control systems, Metrology, Etching, Data processing, Light sources

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Proceedings Article | 1 April 2008 Paper

Optimization procedure of exposure tools with polarization aberrations

Tadashi Arai, Akihiro Yamada, Kenichiro Mori, Yoshinori Osaki, Toshiyuki Yoshihara, Yasuo Hasegawa

Proceedings Volume 6924, 69241I (2008) https://doi.org/10.1117/12.771962

KEYWORDS: Polarization, Projection systems, Birefringence, Jones matrices, Distortion, Metrology, Laser induced plasma spectroscopy, Optical simulations, Wavefront aberrations, Image processing

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Proceedings Article | 26 March 2007 Paper

New projection optics and aberration control system for the 45-nm node

Toshiyuki Yoshihara, Bunsuke Takeshita, Atsushi Shigenobu, Yasuo Hasegawa, Yoshinori Ohsaki, Kazuhiko Mishima, Seiya Miura

Proceedings Volume 6520, 652022 (2007) https://doi.org/10.1117/12.711375

KEYWORDS: Projection systems, Monochromatic aberrations, Wavefront aberrations, Control systems, Sensors, Aberration correction, Optics manufacturing, Metrology, Lithography, Optical properties

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Proceedings Article | 12 May 2005 Paper

Characterization of imaging performance: considering both illumination intensity profile and lens aberration

Takeaki Ebihara, Hideyuki Saito, Takafumi Miyaharu, Shuichi Okada, Yoshihiro Shiode, Takahisa Shiozawa, Toshiyuki Yoshihara

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600481

KEYWORDS: Scanning electron microscopy, Inspection, Metrology, Light sources, Monochromatic aberrations, Photomasks, Reticles, Error analysis, Optical testing, CCD cameras

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Proceedings Article | 12 May 2005 Paper

Analysis of precise CD control for 45nm node and beyond

Yuhei Sumiyoshi, Koji Mikami, Yasuo Hasegawa, Toshiyuki Yoshihara, Yoshiyuki Nagai, Akihiro Yamada, Ken-ichiro Mori, Takahisa Ogawa, Shigeyuki Suda

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600926

KEYWORDS: Critical dimension metrology, Projection systems, Wavefront aberrations, Distortion, Fiber optic illuminators, Transmittance, Chromatic aberrations, Photoresist processing, Wavefronts, Control systems

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Proceedings Article | 5 July 2000 Paper

Realization of very small aberration projection lenses

Toshiyuki Yoshihara, Ryo Koizumi, Kazuhiro Takahashi, Shigeyuki Suda, Akiyoshi Suzuki

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389045

KEYWORDS: Lenses, Wavefront aberrations, Manufacturing, Optics manufacturing, Monte Carlo methods, Lithography, Tolerancing, Chemical elements, Lens manufacturing, Optical components

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Showing 5 of 7 publications

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