Dr. Yasuyuki Unno Profile

Dr. Yasuyuki Unno

General Manager at Canon Inc

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Author

Publications (6)

Proceedings Article | 23 March 2020 Presentation + Paper

Through-the-mask (TTM) optical alignment for high volume manufacturing nanoimprint lithography systems

Takamitsu Komaki, Yasuyuki Unno, Takahiro Matsumoto, Toshiki Iwai, Nozomu Hayashi, Tomokazu Taki, Tohru Kawashima, Satoshi Iino, Shinichirou Hirai, Ken Minoda, Takafumi Miyaharu, Kazuhiro Takahashi, Kazuhiko Mishima

Proceedings Volume 11327, 113270Y (2020) https://doi.org/10.1117/12.2551980

KEYWORDS: Optical alignment, Semiconducting wafers, Photomasks, Nanoimprint lithography, Overlay metrology, Error analysis, Wafer testing, Diffraction, High volume manufacturing, Distortion

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Proceedings Article | 5 April 2011 Paper

Polarization holograms for source-mask optimization

T. Milster, H. Noble, E. Ford, W. Dallas, R. Chipman, I. Matsubara, Y. Unno, S. McClain, P. Khulbe, W. S. T. Lam, D. Hansen

Proceedings Volume 7973, 79731A (2011) https://doi.org/10.1117/12.879534

KEYWORDS: Polarization, Computer generated holography, Lithographic illumination, Diffractive optical elements, Calcite, Holograms, Binary data, Projection systems, Cameras, Optical lithography

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SPIE Journal Paper | 1 April 2005

Impact of mask errors and lens aberrations on the image formation by a vortex mask

Yasuyuki Unno, Takeaki Ebihara, Marc Levenson

JM3, Vol. 4, Issue 02, 023006, (April 2005) https://doi.org/10.1117/12.10.1117/1.1897392

KEYWORDS: Photomasks, Diffraction, Imaging systems, Image acquisition, Electromagnetism, Spiral phase plates, Error analysis, Etching, Photoresist materials, Transmittance

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SPIE Journal Paper | 1 April 2002

Analyses of imaging performance degradation caused by birefringence residual in lens materials

Yasuyuki Unno, Akiyoshi Suzuki

JM3, Vol. 1, Issue 01, (April 2002) https://doi.org/10.1117/12.10.1117/1.1434978

KEYWORDS: Birefringence, Wavefronts, Polarization, Modulation transfer functions, Image acquisition, Projection systems, Optical lithography, Fluorine, Optical components, Coherence imaging

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Proceedings Article | 14 September 2001 Paper

Analyses of imaging performance degradation caused by birefringence residual in lens materials

Yasuyuki Unno, Akiyoshi Suzuki

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435667

KEYWORDS: Birefringence, Wavefronts, Modulation transfer functions, Polarization, Image acquisition, Berkelium, Optical lithography, Coherence imaging, Projection systems, Transmittance

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Proceedings Article | 8 August 1993 Paper

Polarization effect of illumination light

Yasuyuki Unno

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150485

KEYWORDS: Polarization, Phase shifts, Optical lithography, Image quality, Photoresist materials, Photomasks, Diffraction, Coherence imaging, Lithographic illumination, Image acquisition

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Showing 5 of 6 publications

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