Mr. Yoshiyuki Sekine Profile

Yoshiyuki Sekine

at Canon Inc

SPIE Involvement:

Author

SPIE Journal Paper | 1 July 2009

Aerial image back propagation with two-dimensional transmission cross coefficient

Kenji Yamazoe, Yoshiyuki Sekine, Tokuyuki Honda

JM3, Vol. 8, Issue 03, 031406, (July 2009) https://doi.org/10.1117/12.10.1117/1.3206980

KEYWORDS: Fourier transforms, Linear filtering, Image transmission, Resolution enhancement technologies, Computer simulations, Phase shifting, Photomasks, Binary data, Coherence imaging, Lithography

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Proceedings Article | 19 May 2008 Paper

Extension of the 2D-TCC technique to optimize mask pattern layouts

Manabu Hakko, Kenji Yamazoe, Miyoko Kawashima, Yoshiyuki Sekine, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 7028, 70280Z (2008) https://doi.org/10.1117/12.793041

KEYWORDS: Photomasks, Calcium, Optical proximity correction, Curium, Printing, Semiconducting wafers, Resolution enhancement technologies, Model-based design, Scanning electron microscopy, Computer simulations

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Proceedings Article | 7 March 2008 Paper

Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement technique

Miyoko Kawashima, Kenji Yamazoe, Yoshiyuki Sekine, Manabu Hakko, Masakatsu Ohta, Tokuyuki Honda

Proceedings Volume 6924, 69240F (2008) https://doi.org/10.1117/12.771943

KEYWORDS: Optical proximity correction, Resolution enhancement technologies, Source mask optimization, Photomasks, Fourier transforms, Critical dimension metrology, Scattering, Cadmium, Image enhancement, Image transmission

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Proceedings Article | 30 October 2007 Paper

Resolution enhancement by aerial image approximation with 2D-TCC

Kenji Yamazoe, Yoshiyuki Sekine, Miyoko Kawashima, Manabu Hakko, Tomomi Ono, Tokuyuki Honda

Proceedings Volume 6730, 67302H (2007) https://doi.org/10.1117/12.746862

KEYWORDS: Reticles, SRAF, Image enhancement, Fourier transforms, Resolution enhancement technologies, Light sources, Image resolution, Polarization, Printing, Binary data

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Proceedings Article | 26 March 2007 Paper

Feasibility of 37-nm half-pitch with ArF high-index immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Eiji Sakamoto, Keita Sakai, Akihiro Yamada, Tokuyuki Honda

Proceedings Volume 6520, 65201Q (2007) https://doi.org/10.1117/12.711940

KEYWORDS: Refractive index, Transmittance, Silica, Temperature metrology, Projection systems, Semiconducting wafers, Immersion lithography, Microfluidics, Absorption, Water

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Proceedings Article | 12 May 2005 Paper

Analysis of imaging properties for hyper-NA ArF immersion lithography

Yoshiyuki Sekine, Miyoko Kawashima, Kenji Yamazoe, Tokuyuki Honda, Akinori Ohkubo, Yasuhiro Kishikawa, Yuichi Iwasaki, Akiyoshi Suzuki

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600500

KEYWORDS: Photomasks, Projection systems, Refractive index, Water, Diffraction, Polarization, Immersion lithography, Critical dimension metrology, Microfluidics, Imaging systems

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Proceedings Article | 16 June 2003 Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

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Showing 5 of 7 publications

Conference Committee Involvement (4)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

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