Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami; Jun Saito; Kazuya Ota; Hiroyuki Kondo; Mikihiko Ishii; Jun Kawakami; Tetsuya Oshino; Katsumi Sugisaki; Yucong Zhu; Masanobu Hasegawa; Yoshiyuki Sekine; Seiji Takeuchi; Chidane Ouchi; Osamu Kakuchi; Yutaka Watanabe; Takayuki Hasegawa; Shinichi Hara; Akiyoshi Suzuki

doi:10.1117/12.484935

16 June 2003 Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484935
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

An experimental extreme UV (EUV) interferometer (EEI) using an undulator light source was designed and constructed for the purpose of developing wavefront measurement technology with the exposure wavelength of the projection optics of EUV lithography systems. EEI has the capability of performing five different EUV wavefront metrology methods.

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Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, and Akiyoshi Suzuki "Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484935

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