New alignment system for submicron stepper

Shunichi Uzawa; Akiyoshi Suzuki; Naoki Ayata

doi:10.1117/12.20058

1 June 1990 New alignment system for submicron stepper

Shunichi Uzawa, Akiyoshi Suzuki, Naoki Ayata

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20058
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Recent rapid progress in the semiconductor industry requires much better accuracy for overlay. Today, the overlay accuracy of 0.1 pm is discussed in reality. To guarantee the 0.1 pm overlay for all processes is one target. In order to attain such requirements, the alignment system has been renewed. We have developed a new TV image processing system with high resolution, using real-time twodimentional image processing technology by multi-computer system. Together with TV system, the new alignment system by HeCd and HeNe laser bright field method is implemented, and they showed more extensive flexibility to various types of wafers.

Citation Download Citation

Shunichi Uzawa, Akiyoshi Suzuki, and Naoki Ayata "New alignment system for submicron stepper", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20058

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