Paper
12 July 2006 Catadioptric projection optical system for flat panel exposure tool
Michio Kohno, Kiyoshi Fukami, Hitoshi Yoshioka, Shu Watanabe, Akiyoshi Suzuki
Author Affiliations +
Proceedings Volume 6342, International Optical Design Conference 2006; 63420Y (2006) https://doi.org/10.1117/12.692265
Event: International Optical Design Conference 2006, 2006, Vancouver, BC, Canada
Abstract
An advanced catadioptric projection optics installed on state-of-the-art flat panel exposure tool is introduced. Both scaling up and aspheric lenses added to the conventional two-mirror optics have enlarged off-axis good imaging field, and contributed to increase the productivity of the machine. This paper discusses the optical characteristics of the advanced optics, and refers to its contribution to the performance of a large flat panel display (FPD) exposure tool. Additionally, not only the fabrication technology of large optical parts in the projection optics but also illumination optical system and mask /plate alignment system in the exposure tool are also disclosed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michio Kohno, Kiyoshi Fukami, Hitoshi Yoshioka, Shu Watanabe, and Akiyoshi Suzuki "Catadioptric projection optical system for flat panel exposure tool", Proc. SPIE 6342, International Optical Design Conference 2006, 63420Y (12 July 2006); https://doi.org/10.1117/12.692265
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KEYWORDS
Mirrors

Projection systems

Aspheric lenses

Combined lens-mirror systems

Photomasks

Distortion

Optical alignment

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