Dr. Jörg Butschke
at IMS CHIPS
SPIE Involvement:
Author
Publications (53)

Proceedings Article | 13 May 2016 Presentation + Paper
Mathias Kaschel, Florian Letzkus, Jörg Butschke, Piotr Skwierawski, Marc Schneider, Marc Weber
Proceedings Volume 9891, 98911V (2016) https://doi.org/10.1117/12.2228817
KEYWORDS: Modulators, Waveguides, Multiplexers, Optical design

Proceedings Article | 19 March 2015 Paper
Joerg Butschke, Mathias Irmscher, Corinna Koepernik, Stephan Martens, Holger Sailer, Bernd Schnabel
Proceedings Volume 9423, 94231A (2015) https://doi.org/10.1117/12.2086610
KEYWORDS: Nanoimprint lithography, Diffractive optical elements, Silicon, Semiconducting wafers, Vestigial sideband modulation, Quartz, Electron beam lithography, Photomasks, Holograms, Etching

Proceedings Article | 9 September 2013 Paper
S. Martens, J. Butschke, R. Galler, M. Krüger, H. Sailer, M. Sülzle
Proceedings Volume 8880, 88802H (2013) https://doi.org/10.1117/12.2030822
KEYWORDS: Semiconducting wafers, Photomasks, Line width roughness, Point spread functions, Etching, Silicon, Cadmium sulfide, Resolution enhancement technologies, Chemically amplified resists, Resistance

Proceedings Article | 14 October 2011 Paper
Florian Letzkus, Tarek Zaki, Frederik Ante, Harald Richter, Joachim Burghartz, Jörg Butschke, Hagen Klauck
Proceedings Volume 8166, 81662B (2011) https://doi.org/10.1117/12.899168
KEYWORDS: Photomasks, Silicon, Etching, Gold, Metals, Electron beam lithography, Semiconducting wafers, Scanning electron microscopy, Aluminum, Transistors

Proceedings Article | 23 September 2009 Paper
Elmar Platzgummer, Christof Klein, Peter Joechl, Hans Loeschner, Martin Witt, Wolfgang Pilz, Joerg Butschke, Michael Jurisch, Florian Letzkus, Holger Sailer, Mathias Irmscher
Proceedings Volume 7488, 74881D (2009) https://doi.org/10.1117/12.832156
KEYWORDS: Photomasks, Ions, Semiconducting wafers, Lithography, Nanofabrication, Silicon, Particles, Electronics, Nanostructures, Electron beams

Proceedings Article | 23 September 2009 Paper
J. Gramss, R. Galler, V. Neick, A. Stoeckel, U. Weidenmueller, D. Melzer, M. Suelzle, J. Butschke, U. Baetz
Proceedings Volume 7488, 748827 (2009) https://doi.org/10.1117/12.835880
KEYWORDS: Photomasks, Beam shaping, Data conversion, Magnesium, Electron beam lithography, Data processing, Visualization, Standards development, Lithography, Computer architecture

Proceedings Article | 11 May 2009 Paper
Kosta Selinidis, Ecron Thompson, S. Sreenivasan, Douglas Resnick, Marcus Pritschow, Joerg Butschke, Mathias Irmscher, Holger Sailer, Harald Dobberstein
Proceedings Volume 7379, 73790N (2009) https://doi.org/10.1117/12.824264
KEYWORDS: Photomasks, Inspection, Metals, Defect detection, Lithography, Semiconducting wafers, Scanning electron microscopy, Ultraviolet radiation, Electron beams, Image segmentation

Proceedings Article | 11 May 2009 Paper
Joerg Butschke, Mathias Irmscher, Holger Sailer, Hans Loeschner, Elmar Platzgummer
Proceedings Volume 7379, 73792O (2009) https://doi.org/10.1117/12.824338
KEYWORDS: Photomasks, Line edge roughness, Critical dimension metrology, Line width roughness, Optical lithography, Etching, Nanofabrication, Electrons, Ions, Silver

Proceedings Article | 18 March 2009 Paper
C. Klein, E. Platzgummer, J. Klikovits, W. Piller, H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle, J. Kretz, J. Nogatch, A. Zepka
Proceedings Volume 7271, 72710N (2009) https://doi.org/10.1117/12.813670
KEYWORDS: Semiconducting wafers, Lithography, Electron beams, Electrodes, Prototyping, Electron beam lithography, Electron beam direct write lithography, Silicon, Optical alignment, Photomasks

Proceedings Article | 18 March 2009 Paper
Marcus Pritschow, Joerg Butschke, Mathias Irmscher, Lidia Parisoli, Toshihide Oba, Toshimichi Iwai, Takayuki Nakamura
Proceedings Volume 7271, 72711U (2009) https://doi.org/10.1117/12.814161
KEYWORDS: Quartz, Scanning electron microscopy, Photomasks, Contamination, Process control, Optical lithography, Nanoimprint lithography, Etching, Control systems, Metrology

Proceedings Article | 20 October 2008 Paper
Joerg Butschke, Mathias Irmscher, Holger Sailer, Lorenz Nedelmann, Marcus Pritschow, Hans Loeschner, Elmar Platzgummer
Proceedings Volume 7122, 712236 (2008) https://doi.org/10.1117/12.801402
KEYWORDS: Etching, Electron beam lithography, Line edge roughness, Photoresist processing, Electron beams, Ion beams, Photomasks, Line width roughness, Ions, Nanofabrication

Proceedings Article | 20 October 2008 Paper
Florian Letzkus, Joerg Butschke, Mathias Irmscher, Michael Jurisch, Wolfram Klingler, Elmar Platzgummer, Christof Klein, Hans Loeschner, Reinhard Springer
Proceedings Volume 7122, 712235 (2008) https://doi.org/10.1117/12.801401
KEYWORDS: Etching, Silicon, Electrodes, Semiconducting wafers, Lithography, Aluminum, Mask making, Optical alignment, Switching, Line edge roughness

Proceedings Article | 17 October 2008 Paper
Marcus Pritschow, Volker Boegli, Joerg Butschke, Mathias Irmscher, Douglas Resnick, Holger Sailer, Kosta Selinidis, Ecron Thompson
Proceedings Volume 7122, 71222L (2008) https://doi.org/10.1117/12.801946
KEYWORDS: Etching, Quartz, Photomasks, Nanoimprint lithography, Opacity, Inspection, Ultraviolet radiation, Scanning electron microscopy, Phase shifts, Silicon

Proceedings Article | 28 March 2008 Paper
L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber
Proceedings Volume 6921, 69211S (2008) https://doi.org/10.1117/12.772472
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Manufacturing, Electron beams, Electron beam lithography, Nanofabrication, Computed tomography, Prototyping, Maskless lithography

Proceedings Article | 26 March 2008 Paper
Mathias Irmscher, Joerg Butschke, Ron Carpio, Brook Chao, Wei-Lun Jen, Corinna Koepernik, Lorenz Nedelmann, Jordan Owens, Frank Palmieri, Marcus Pritschow, Christian Reuter, Holger Sailer, Ken Satoodeh, Jeff Wetzel, Bruce Wilks, Grant Willson
Proceedings Volume 6921, 69210D (2008) https://doi.org/10.1117/12.772295
KEYWORDS: Etching, Chromium, Quartz, Manufacturing, Metals, Ultraviolet radiation, Photomasks, Optical lithography, Nanoimprint lithography, Lithography

Proceedings Article | 20 March 2008 Paper
C. Klein, E. Platzgummer, H. Loeschner, G. Gross, P. Dolezel, M. Tmej, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz
Proceedings Volume 6921, 69211O (2008) https://doi.org/10.1117/12.772726
KEYWORDS: Semiconducting wafers, Lithography, Electron beams, Silicon, Electrodes, Polymethylmethacrylate, Maskless lithography, Electron beam lithography, Wafer-level optics, Nanofabrication

Proceedings Article | 1 November 2007 Paper
Joerg Butschke, Mathias Irmscher, Florian Letzkus, Hans Loeschner, Lorenz Nedelmann, Elmar Platzgummer
Proceedings Volume 6730, 673047 (2007) https://doi.org/10.1117/12.742797
KEYWORDS: Photomasks, Etching, Ions, Photoresist processing, Optical lithography, Electron beam lithography, Ion beams, Line edge roughness, Chemically amplified resists, Nanofabrication

Proceedings Article | 30 October 2007 Paper
Marcus Pritschow, Joerg Butschke, Mathias Irmscher, Holger Sailer, Douglas Resnick, Ecron Thompson
Proceedings Volume 6730, 67300G (2007) https://doi.org/10.1117/12.742498
KEYWORDS: Overlay metrology, Quartz, Electron beam lithography, Etching, Metals, Chromium, Nanolithography, Vestigial sideband modulation, Scanning electron microscopy, Chemically amplified resists

Proceedings Article | 14 May 2007 Paper
Joerg Butschke, Mathias Irmscher, Douglas Resnick, Holger Sailer, Ecron Thompson
Proceedings Volume 6607, 66070U (2007) https://doi.org/10.1117/12.728944
KEYWORDS: Etching, Photomasks, Quartz, Nanoimprint lithography, Photoresist processing, Electron beam lithography, Lithography, Printing, Chromium, Scanning electron microscopy

Proceedings Article | 20 October 2006 Paper
Uwe Dersch, Rico Buettner, Christian Chovino, Steffen Franz, Torben Heins, Holger Herguth, Jan Hendrik Peters, Thomas Rode, Florian Letzkus, Joerg Butschke, Mathias Irmscher
Proceedings Volume 6349, 63492G (2006) https://doi.org/10.1117/12.686035
KEYWORDS: Etching, Extreme ultraviolet, Photomasks, Reflectivity, Manufacturing, Extreme ultraviolet lithography, Scanners, Optical lithography, Photoresist processing, Chromium

Proceedings Article | 23 March 2006 Paper
Mathias Irmscher, Joerg Butschke, Guenter Hess, Corinna Koepernik, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson
Proceedings Volume 6151, 615115 (2006) https://doi.org/10.1117/12.656108
KEYWORDS: Etching, Quartz, Nanoimprint lithography, Photoresist processing, Photomasks, Chromium, Manufacturing, Electron beam lithography, Chemically amplified resists, Beam shaping

Proceedings Article | 22 March 2006 Paper
Holger Seitz, Markus Renno, Thomas Leutbecher, Nathalie Olschewski, Torsten Reichardt, Ronny Walter, Helmut Popp, Günter Hess, Florian Letzkus, Jörg Butschke, Mathias Irmscher
Proceedings Volume 6151, 615109 (2006) https://doi.org/10.1117/12.655540
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Multilayers, Dry etching, Polishing, Manufacturing, Reflectivity, Coating

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59923U (2005) https://doi.org/10.1117/12.631526
KEYWORDS: Photomasks, Tantalum, Metrology, Optical lithography, Chromium, Interferometers, Image registration, Quartz, Finite element methods, Lithography

Proceedings Article | 8 November 2005 Paper
Mathias Irmscher, Joerg Butschke, Guenter Hess, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson, Boris Vratzov
Proceedings Volume 5992, 59922E (2005) https://doi.org/10.1117/12.629974
KEYWORDS: Etching, Quartz, Manufacturing, Nanoimprint lithography, Photomasks, Photoresist processing, Electron beam lithography, Chromium, Chemically amplified resists, Printing

Proceedings Article | 8 November 2005 Paper
Proceedings Volume 5992, 59922A (2005) https://doi.org/10.1117/12.628957
KEYWORDS: Etching, Extreme ultraviolet lithography, Wet etching, Photomasks, Dry etching, Chromium, Electron beam lithography, Scanning electron microscopy, Silicon, Manufacturing

Proceedings Article | 28 June 2005 Paper
Corinna Koepernik, H. Becker, J. Butschke, U. Buttgereit, M. Irmscher, L. Nedelmann, F. Schmidt, S. Teuber
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617110
KEYWORDS: Etching, Tantalum, Chromium, Reactive ion etching, Optical lithography, Phase shifts, Dry etching, Diffractive optical elements, Oxygen, Photomasks

Proceedings Article | 10 May 2005 Paper
Uwe Dersch, Arnd Korn, Cornelia Engelmann, Carl Frase, Wolfgang Haessler-Grohne, Harald Bosse, Florian Letzkus, Joerg Butschke
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598644
KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Monte Carlo methods, Extreme ultraviolet, Photomasks, Detection and tracking algorithms, Silicon, Electron beams, Extreme ultraviolet lithography, Signal detection

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599343
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Multilayers, Printing, Scanning electron microscopy, Cadmium, Extreme ultraviolet lithography, Binary data, Imaging systems

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568819
KEYWORDS: Line edge roughness, Etching, Mask making, Electron beam lithography, Critical dimension metrology, Coating, Photoresist processing, Chemically amplified resists, Scanning electron microscopy, Temperature metrology

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569265
KEYWORDS: Etching, Photomasks, Silicon, Dry etching, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Extreme ultraviolet lithography, Chemistry, Mask making

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569289
KEYWORDS: Photomasks, Multilayers, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Reflectors, Cadmium, Critical dimension metrology, Photoresist materials, Scanning electron microscopy

Proceedings Article | 6 December 2004 Paper
Frank Sobel, Lutz Aschke, Markus Renno, Holger Seitz, Hans Becker, Nathalie Olschewski, Torsten Reichardt, Guenter Hess, Ute Buttgereit, Konrad Knapp, Florian Letzkus, Joerg Butschke, Corinna Koepernik
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568787
KEYWORDS: Coating, Reflectivity, Etching, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Dry etching, Inspection, Manufacturing, Multilayers

Proceedings Article | 20 August 2004 Paper
Corinna Koepernik, Joerg Butschke, Dirk Beyer, Mathias Irmscher, Bernd Leibold, Emmanuel Rausa, Rainer Plontke, Jason Plumhoff, Peter Voehringer
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557719
KEYWORDS: Overlay metrology, Photomasks, Etching, Electron beam lithography, Quartz, Scanning electron microscopy, Phase shifts, Lithography, Thin film coatings, Microsystems

Proceedings Article | 20 August 2004 Paper
Mathias Irmscher, Dirk Beyer, Joerg Butschke, Peter Hudek, Corinna Koepernik, Jason Plumhoff, Emmanuel Rausa, Mitsuru Sato, Peter Voehringer
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557686
KEYWORDS: Etching, Opacity, Photoresist processing, Chromium, Scattering, Electron beam lithography, Photomasks, Optical lithography, Calibration, Chemically amplified resists

Proceedings Article | 2 June 2004 Paper
Josef Mathuni, Jenspeter Rau, Frank-Michael Kamm, Guenther Ruhl, Ch. Holfeld, Florian Letzkus, C. Koepernik, Joerg Butschke
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568010
KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Chromium, Tantalum, Critical dimension metrology, Materials processing, Extreme ultraviolet lithography, Reflectivity, Semiconducting wafers

Proceedings Article | 2 June 2004 Paper
Rainer Plontke, Lutz Bettin, Dirk Beyer, Joerg Butschke, Mathias Irmscher, Corinna Koepernik, Bernd Leibold, Armelle Vix, Peter Voehringer
Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568033
KEYWORDS: Quartz, Chromium, Thin film coatings, Electron beam lithography, Photomasks, Distortion, Optical inspection, Overlay metrology, Metrology, Resistance

Proceedings Article | 17 December 2003 Paper
Bernd Leibold, Joerg Butschke, Lutz Bettin, Dirk Beyer, Mathias Irmscher, Corinna Koepernik, Rainer Plontke, Armelle Vix, Peter Voehringer
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518037
KEYWORDS: Quartz, Electron beam lithography, Photomasks, Distortion, Thin film coatings, Overlay metrology, Etching, Phase shifts, Coating, Chemically amplified resists

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518043
KEYWORDS: Opacity, Mask making, Electron beam lithography, Photoresist processing, Etching, Chemically amplified resists, Optical proximity correction, Line edge roughness, Photomasks, Scattering

Proceedings Article | 28 August 2003 Paper
Mathias Irmscher, Lothar Berger, Dirk Beyer, Joerg Butschke, Peter Dress, Thomas Hoffmann, Peter Hudek, Corinna Koepernik, Martin Tschinkl, Peter Voehringer
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504185
KEYWORDS: Photomasks, Etching, Coating, Mask making, Chemically amplified resists, Binary data, Line edge roughness, Photoresist processing, Optical proximity correction, Scanning electron microscopy

SPIE Journal Paper | 1 January 2003
Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce Terris, Wilhelm Bruenger, Gerhard Gross, Olaf Fortagne, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, John Wolfe
JM3, Vol. 2, Issue 01, (January 2003) https://doi.org/10.1117/12.10.1117/1.1528946
KEYWORDS: Ions, Ion beams, Photomasks, Particle beams, Photodynamic therapy, Maskless lithography, Magnetism, Lithography, Semiconducting wafers, Charged particle optics

Proceedings Article | 16 August 2002 Paper
Ernst Haugeneder, A. Chalupka, T Lammer, Hans Loeschner, Frank-Michael Kamm, Thomas Struck, Albrecht Ehrmann, Rainer Kaesmaier, Andreas Wolter, Joerg Butschke, Mathias Irmscher, Florian Letzkus, Reinhard Springer
Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479353
KEYWORDS: Photomasks, Semiconducting wafers, Distortion, Silicon, Ion beams, Electrodes, Ions, Wafer bonding, Manufacturing, Projection lithography

Proceedings Article | 1 August 2002 Paper
Mathias Irmscher, Dirk Beyer, Joerg Butschke, Chris Constantine, Thomas Hoffmann, Corinna Koepernik, Christian Krauss, Bernd Leibold, Florian Letzkus, Dietmar Mueller, Reinhard Springer, Peter Voehringer
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476944
KEYWORDS: Photomasks, Semiconducting wafers, Mask making, Line edge roughness, Etching, Silicon, Coating, Chemically amplified resists, Photoresist processing, Chromium

Proceedings Article | 1 July 2002 Paper
Hans Loeschner, Gerhard Stengl, Herbert Buschbeck, A. Chalupka, Gertraud Lammer, Elmar Platzgummer, Herbert Vonach, Patrick de Jager, Rainer Kaesmaier, Albrecht Ehrmann, Stefan Hirscher, Andreas Wolter, Andreas Dietzel, Ruediger Berger, Hubert Grimm, Bruce Terris, Wilhelm Bruenger, Dieter Adam, Michael Boehm, Hans Eichhorn, Reinhard Springer, Joerg Butschke, Florian Letzkus, Paul Ruchhoeft, John Wolfe
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472336
KEYWORDS: Ions, Magnesium, Lithography, Mendelevium, Printing, Maskless lithography, Neodymium, Nickel, Neon, Ion beams

Proceedings Article | 20 August 2001 Paper
Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436673
KEYWORDS: Photomasks, Semiconducting wafers, Ions, Etching, Projection lithography, Boron, Carbon, Beam controllers, Ion beams, Optical lithography

Proceedings Article | 9 April 2001 Paper
Frank-Michael Kamm, Albrecht Ehrmann, Thomas Struck, Karl Kragler, Joerg Butschke, Florian Letzkus, Reinhard Springer, Ernst Haugeneder, Artur Degen, Jens Voigt, Martin Kratzenberg, Ivo Rangelow
Proceedings Volume 4349, (2001) https://doi.org/10.1117/12.425098
KEYWORDS: Photomasks, Ions, Semiconducting wafers, Carbon, Oxides, Lithography, Beam controllers, Ion beams, Ion implantation, Deposition processes

Proceedings Article | 21 July 2000 Paper
Mathias Irmscher, Joerg Butschke, Klaus Elian, Bernd Hoefflinger, Karl Kragler, Florian Letzkus, Joerg Ochsenhirt, Christian Reuter, Reinhard Springer
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390072
KEYWORDS: Etching, Silicon, Carbon, Photomasks, Photoresist processing, Lithography, Ions, Silicon carbide, Mask making, Semiconducting wafers

Proceedings Article | 21 July 2000 Paper
Albrecht Ehrmann, Annika Elsner, Roman Liebe, Thomas Struck, Joerg Butschke, Florian Letzkus, Mathias Irmscher, Reinhard Springer, Ernst Haugeneder, Hans Loeschner
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390074
KEYWORDS: Photomasks, Silicon, Carbon, Etching, Critical dimension metrology, Inspection, Semiconducting wafers, Silicon carbide, Manufacturing, Particles

Proceedings Article | 21 July 2000 Paper
Albrecht Ehrmann, Thomas Struck, Ernst Haugeneder, Hans Loeschner, Joerg Butschke, Florian Letzkus, Mathias Irmscher, Reinhard Springer
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390075
KEYWORDS: Photomasks, Semiconducting wafers, Etching, Silicon, Pellicles, Carbon, Ions, Projection lithography, Quartz, Manufacturing

Proceedings Article | 21 July 2000 Paper
Artur Degen, Jens Voigt, Martin Kratzenberg, Feng Shi, Joerg Butschke, Hans Loeschner, Rainer Kaesmaier, Albrecht Ehrmann, Ivo Rangelow
Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390076
KEYWORDS: Chemical species, Silicon, Doping, Boron, Photomasks, Diffraction, 3D modeling, Semiconducting wafers, Optical spheres, Crystals

Proceedings Article | 3 February 2000 Paper
Joerg Ochsenhirt, Joerg Butschke, Florian Letzkus, Bernd Hoefflinger, Mathias Irmscher, Christian Reuter, Reinhard Springer, Klaus Elian
Proceedings Volume 3996, (2000) https://doi.org/10.1117/12.377121
KEYWORDS: Silicon, Photoresist processing, Photomasks, Etching, Mask making, Tin, Plasma, Line edge roughness, Statistical analysis, Critical dimension metrology

Proceedings Article | 30 December 1999 Paper
Albrecht Ehrmann, Thomas Struck, Rainer Kaesmaier, Ernst Haugeneder, Hans Loeschner, Joerg Butschke, Florian Letzkus, Mathias Irmscher, Reinhard Springer, Roxann Engelstad
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373376
KEYWORDS: Photomasks, Semiconducting wafers, Distortion, Silicon, Etching, Electron beam lithography, Oxides, Quartz, Semiconductor lasers, Lamps

Proceedings Article | 23 April 1999 Paper
Joerg Butschke, Albrecht Ehrmann, Ernst Haugeneder, Mathias Irmscher, Rainer Kaesmaier, Karl Kragler, Florian Letzkus, Hans Loeschner, Josef Mathuni, Ivo Rangelow, Carsten Reuter, Feng Shi, Reinhard Springer
Proceedings Volume 3665, (1999) https://doi.org/10.1117/12.346224
KEYWORDS: Etching, Semiconducting wafers, Silicon, Photomasks, Oxides, Electrochemical etching, Metals, Lithography, Ions, Wafer bonding

Proceedings Article | 18 December 1998 Paper
Albrecht Ehrmann, Sabine Huber, Rainer Kaesmaier, Andreas Oelmann, Thomas Struck, Reinhard Springer, Joerg Butschke, Florian Letzkus, Karl Kragler, Hans Loeschner, Ivo Rangelow
Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332827
KEYWORDS: Photomasks, Semiconducting wafers, Silicon, Ions, Etching, Carbon, Control systems, Ion beam lithography, Lithography, Inspection

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